Patent US1981820A successfully refreshed from Google Patents.
Patent US5985719A successfully refreshed from Google Patents.
US5985719A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming a programmable non-volatile memory cell
Assignee: Round Rock Research LLC
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Filing: 1997-11-24
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Granted: 1999-11-16
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Expires: 2017-11-24
Abstract
Abstract A method of reducing undesired electron depletion through sidewalls of a floating gate of a floating gate transistor comprising providing a non-oxide or oxynitride layer over said sidewalls. Integrated circuitry including a non-volatile field effect transistor includes, a) a floating gate transistor having a gate construction and a pair of opposing source/drain regions, the gate construction having at least one sidewall; b) a shielding layer over the gate sidewall; and c) a dielectric layer on the shielding layer, the dielectric layer being of a different material than the shielding layer. The shielding layer might be provided over an oxide layer previously provided on sidewalls of the gate construction. The shielding layer might be provided over sidewall spacers previously provided relative to sidewalls of the gate construction. Example and preferred shielding layer materials include Si 3 N 4 , oxynitride compounds, and aluminum.
Inventors
- 👤 J. Dennis Keller
- 👤 Roger R. Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:12
CPC Classifications
H; H10; H10W; H10W42/00; H10W42/20; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0411; H10D30/60; H10D30/68; H10D30/6891
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
79 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming a non-oxide layer over the oxide layer; forming sidewall spacers over the non-oxide layer and outwardly of the sidewalls; and forming a dielectric layer over the sidewall spacers, the dielectric layer being of a different material than the non-oxide layer.
Claim 2
Independent Claim
79 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming a non-oxide layer over the oxide layer; forming sidewall spacers over the non-oxide layer and outwardly of the sidewalls; and forming a dielectric layer over the sidewall spacers, the dielectric layer being of a different material than the non-oxide layer.
Claim 3
Independent Claim
66 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming an aluminum shielding layer over the oxide layer; forming a sidewall spacer outwardly of the aluminum shielding layer; and forming a dielectric layer over the sidewall spacer.
Claim 4
Independent Claim
66 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming an aluminum shielding layer over the oxide layer; forming a sidewall spacer outwardly of the aluminum shielding layer; and forming a dielectric layer over the sidewall spacer.
Claim 5
Independent Claim
93 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming a shielding layer of Si 3 N 4 over the oxide layer; forming a sidewall spacer outwardly of the shielding layer of Si 3 N 4 ; and forming a dielectric layer over the sidewall spacer, the dielectric layer being of a different material than the shielding layer of Si 3 N 4 .
Claim 6
Independent Claim
93 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming a shielding layer of Si 3 N 4 over the oxide layer; forming a sidewall spacer outwardly of the shielding layer of Si 3 N 4 ; and forming a dielectric layer over the sidewall spacer, the dielectric layer being of a different material than the shielding layer of Si 3 N 4 .
Claim 7
Independent Claim
89 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming a non-oxide layer over the oxide layer; forming sidewall spacers outwardly of the non-oxide layer; and forming a layer over the sidewall spacers, the layer selected from the group comprising BPSG and SiO 2 , and wherein the layer over the sidewall spacers and non-oxide layer are of different materials.
Claim 8
Independent Claim
89 words
A method of forming a floating gate transistor, comprising: forming a floating gate construction having opposing lateral sidewalls; providing opposing source and drain regions operably adjacent the floating gate construction; forming an oxide layer over the gate sidewalls; forming a non-oxide layer over the oxide layer; forming sidewall spacers outwardly of the non-oxide layer; and forming a layer over the sidewall spacers, the layer selected from the group comprising BPSG and SiO 2 , and wherein the layer over the sidewall spacers and non-oxide layer are of different materials.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-11-15 | 2003-05-17 | 2003-11-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-11-15 | 2007-05-17 | 2007-11-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-11-15 | 2011-05-17 | 2011-11-16 | $7700.00 | Window Closed / Lapsed |