Insulated gate semiconductor device and method of manufacturing the same

Claim 2

An insulated gate semiconductor device, comprising: a source region, a drain region, a drift region and a channel formation region, formed of a crystal semiconductor; and a gate insulating film and a gate electrode formed on said channel formation region; wherein said channel formation region includes a region in which carriers move, and an impurity region locally formed for pining a depletion layer that extends from said drift region toward said channel formation region and said source region.

Claim 3

An insulated gate semiconductor device, comprising: a source region, a drain region, a drift region and a channel formation region, formed of a crystal semiconductor; and a gate insulating film and a gate electrode formed on said channel formation region; wherein said channel formation region includes a region in which carriers move, and an impurity region locally formed for pining a depletion layer that extends from said drift region toward said channel formation region and said source region, and for regulating a carrier moving path by said impurity region.

Claim 4

An insulated gate semiconductor device, comprising: a source region, a drain region, a drift region and a channel formation region, formed of a crystal semiconductor; and a gate insulating film and a gate electrode formed on said channel formation region; wherein said channel formation region includes a region in which carriers move, and an impurity region locally formed for pining a depletion layer that extends from said drift region toward said channel formation region and said source region, and for regulating a carrier moving path by said impurity region.

Claim 5

An insulated gate semiconductor device, comprising: a first semiconductor layer functioning as a drain region; a second semiconductor layer formed on said first semiconductor layer, said second semiconductor layer including a drift region in contact with said drain region, a channel formation region in an upper portion of said second semiconductor layer, and a source region in contact with said channel formation region wherein said channel formation region is between said source region and said drain region; a gate insulating film formed on an upper surface of said second semiconductor layer; a gate electrode located over said channel formation region with said gate insulating film interposed therebetween wherein said second semiconductor layer is disposed between said gate electrode and said first semiconductor layer, wherein said channel formation region is selectively doped with an impurity in such a manner that a distribution of said impurity periodically changes in a direction perpendicular to a carrier flow direction in said channel formation region.

Claim 6

An insulated gate semiconductor device, comprising: a first semiconductor layer functioning as a drain region; a second semiconductor layer formed on said first semiconductor layer, said second semiconductor layer including a drift region in contact with said drain region, a channel formation region in an upper portion of said second semiconductor layer, and a source region in contact with said channel formation region wherein said channel formation region is between said source region and said drain region; a gate insulating film formed on an upper surface of said second semiconductor layer; a gate electrode located over said channel formation region with said gate insulating film interposed therebetween wherein said second semiconductor layer is disposed between said gate electrode and said first semiconductor layer, wherein said channel formation region is selectively doped with an impurity in such a manner that a distribution of said impurity periodically changes in a direction perpendicular to a carrier flow direction in said channel formation region.

Claim 7

An insulated gate semiconductor device, comprising: a source region, a drain region, a drift region and a channel formation region, formed of a crystal semiconductor; and a gate insulating film and a gate electrode formed on said channel formation region; wherein said channel formation region includes a region in which carriers move, and a plurality of impurity regions locally doped with an impurity, said plurality of impurity regions being arranged in a direction perpendicular to a carrier flow direction in said channel formation region.

Claim 8

An insulated gate semiconductor device, comprising: a source region, a drain region, a drift region and a channel formation region, formed of a crystal semiconductor; and a gate insulating film and a gate electrode formed on said channel formation region; wherein said channel formation region includes a region in which carriers move, and a plurality of impurity regions locally doped with an impurity, said plurality of impurity regions being arranged in a direction perpendicular to a carrier flow direction in said channel formation region.

Claim 9

An insulated gate semiconductor device according to claim 1, 2, or 4, wherein impurity elements that extends an energy band width (Eg) are added in said impurity regions.

Claim 10

An insulated gate semiconductor device according to claim 1, 2, 3 or 4, wherein said impurity is selected from carbon, nitrogen and oxygen.

Claim 11

An insulated gate semiconductor device according to claim 1 or 2 wherein impurity elements which allow an energy band width (Eg) to be shifted are added in said impurity regions.

Claim 12

An insulated gate semiconductor device according to claim 3 or 4, wherein said impurity is selected from the group XIII and group XV elements.

Claim 13

An insulated gate semiconductor device according to claim 3 or 4, wherein said impurity is selected from the group consisting of boron, phosphorus and arsenic.

Claim 14

An insulated gate semiconductor device according to claim 1, 2, or 4, wherein said region where the carriers move includes one of means for preventing impurity scattering of the carriers and means for preventing lowering of a mobility which is caused by a factor other than lattice scattering of the carriers.

Claim 15

An insulated gate semiconductor device according to claim 1, 2, or 4, wherein assuming that a width which is occupied by said impurity regions and the widths between said respective impurity regions in a width W of said channel formation region are defined as Wpi and Wpa, respectively, the respective relations of W, Wpi and Wpa satisfy the following relational expressions: Wpi/W=0.1 to 0.9 Wpa/W=0.1 to 0.9 Wpi/Wpa=1/9 to 9.

Claim 16

An insulated gate semiconductor device according to claim 1, 2, or 4, wherein at least one cross-section of said channel formation region which is perpendicular to the channel direction is substantially regarded as an assembly consisting of a plurality of channel formation regions which are divided by said impurity regions.

Claim 17

An insulated gate semiconductor device according to claim 1, 2, or 4, wherein the lowering of the threshold value voltage in said channel formation region, which is caused by the short channel effect during driving operation, is relieved by an increase of the threshold value voltage which is caused by the narrow channel effect obtained by using said impurity region.

Claim 18

An insulated gate semiconductor device according to claim 1, wherein said impurity region is shaped in a dot pattern.

Claim 19

An insulated gate semiconductor device according to claim 2 or 4, wherein said impurity region is shaped in a linear pattern which is substantially in parallel with the channel direction.

Claim 20

An insulated gate semiconductor device according to claim 1, 2, 3 or 4, wherein said insulated gate semiconductor device is a large-power control device which is called "power MOS device".

Claim 21

An insulated gate field effect semiconductor device comprising: a semiconductor layer; a channel forming region in said semiconductor layer; a pair of first impurity regions in said semiconductor layer with said channel forming region therebetween wherein carriers flow between said pair of first impurity regions through said channel forming region; a plurality of second impurity doped regions in said channel forming region, wherein said plurality of second impurity doped regions are arranged in a direction perpendicular to a carrier flow direction.

Claim 22

An insulated gate field effect semiconductor device comprising: a semiconductor layer; a channel forming region in said semiconductor layer; a pair of first impurity regions in said semiconductor layer with said channel forming region therebetween wherein carriers flow between said pair of first impurity regions through said channel forming region; a plurality of second impurity doped regions in said channel forming region, wherein said plurality of second impurity doped regions are arranged in a direction perpendicular to a carrier flow direction.

Claim 23

An insulated gate field effect semiconductor device according to claim 17 wherein each of said second impurity doped regions extends in parallel with said carrier flow direction.

Claim 24

An insulated gate field effect semiconductor device according to claim 17 wherein said plurality of second impurity regions are doped with an impurity selected from the group consisting of carbon, nitrogen and oxygen.

Claim 25

An insulated gate field effect semiconductor device according to claim 17 wherein said plurality of second impurity regions are doped with an element selected from the group XIII element and group XV elements.

Claim 26

An insulated gate field effect semiconductor device according to claim 1 wherein said device is a power transistor.

Claim 27

An insulated gate field effect semiconductor device comprising: a semiconductor layer; a channel forming region in said semiconductor layer; a pair of first impurity regions in said semiconductor layer with said channel forming region therebetween wherein carriers flow between said pair of first impurity regions through said channel forming region; a plurality of second impurity doped regions in said channel forming region, wherein said plurality of second impurity doped regions are arranged two dimensionally.

Claim 28

An insulated gate field effect semiconductor device comprising: a semiconductor layer; a channel forming region in said semiconductor layer; a pair of first impurity regions in said semiconductor layer with said channel forming region therebetween wherein carriers flow between said pair of first impurity regions through said channel forming region; a plurality of second impurity doped regions in said channel forming region, wherein said plurality of second impurity doped regions are arranged two dimensionally.

Claim 29

An insulated gate field effect semiconductor device according to claim 17 wherein said plurality of second impurity doped regions are in a form of dots.

Claim 30

An insulated gate field effect semiconductor device according to claim 22 wherein said device is a power transistor.

Claim 31

An insulated gate field effect semiconductor device comprising: a semiconductor layer; a channel forming region in said semiconductor layer; a drift region and a source region in said semiconductor layer with said channel forming region therebetween wherein carriers flow from said source region to said drift region through said channel forming region, wherein said channel forming region has a width W in a direction perpendicular to a carrier flow direction; a plurality of impurity doped regions in said channel forming region wherein each of said impurity doped regions has a width Wpi in a channel width direction and a distance between adjacent impurity doped regions is Wpa, wherein Wpi/W=0.1 to 0.9, Wpa/W=0.1 to 0.9 and Wpi/Wpa=1/9 to 9.

Claim 32

An insulated gate field effect semiconductor device comprising: a semiconductor layer; a channel forming region in said semiconductor layer; a drift region and a source region in said semiconductor layer with said channel forming region therebetween wherein carriers flow from said source region to said drift region through said channel forming region, wherein said channel forming region has a width W in a direction perpendicular to a carrier flow direction; a plurality of impurity doped regions in said channel forming region wherein each of said impurity doped regions has a width Wpi in a channel width direction and a distance between adjacent impurity doped regions is Wpa, wherein Wpi/W=0.1 to 0.9, Wpa/W=0.1 to 0.9 and Wpi/Wpa=1/9 to 9.

Claim 33

An insulated gate field effect semiconductor device according to claim 25 wherein said device is a power transistor.