US5930655A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fluorine barrier layer between conductor and insulator for degradation prevention
Assignee: International Business Machines Corp
•
Filing: 1997-09-25
•
Granted: 1999-07-27
•
Expires: 2017-09-25
Abstract
Abstract Method of improving the resistance of a metal against degradation from exposure to fluorine released from a fluorine-containing material by forming a fluorine-barrier layer between the insulator material and the metal. The invention is especially useful in improving corrosion and poisoning resistance of metallurgy, such as aluminum metallurgy, in semiconductor structures. The invention also covers integrated circuit structures made by this method.
Inventors
- 👤 Edward C. Cooney, III
- 👤 Hyun K. Lee
- 👤 Thomas L. McDevitt
- 👤 Anthony K. Stamper
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 08:24
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/418; H10P14/60; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6329; H10P14/6334; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/071; H10W20/074; H10W20/075; H10W20/076; H10W20/077; H10W20/081; H10W20/093; H10W20/096; H10W20/097; Y; Y10; Y10S; Y10S438/00; Y10S438/963
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
65 words
A method of improving degradation resistance of metallurgy, comprising the steps of: providing an insulator film containing fluorine having a surface region; removing fluorine from said surface region of said insulator film by exposing said surface region to an ozone plasma to form a fluorine-free barrier layer on said insulator film; and forming a pattern of metal lines on top of said fluorine-free barrier layer.
Claim 2
Independent Claim
65 words
A method of improving degradation resistance of metallurgy, comprising the steps of: providing an insulator film containing fluorine having a surface region; removing fluorine from said surface region of said insulator film by exposing said surface region to an ozone plasma to form a fluorine-free barrier layer on said insulator film; and forming a pattern of metal lines on top of said fluorine-free barrier layer.
Claim 3
Dependent Claim
20 words
The method of claim 1, wherein said fluorine-free barrier layer has a thickness ranging from 1 nm to 300 nm.
References Cited (Backward Citations)
US4300989A
Cited
US5181985A
Cited
US5821175A
Cited
US5380397A
Cited
US5466638A
Cited
US5306671A
Cited
US5378317A
Cited
US5219791A
Cited
US5397748A
Cited
US5423945A
Cited
US5384281A
Cited
US5527718A
Cited
US5451543A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-07-26 | 2003-01-25 | 2003-07-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-07-26 | 2007-01-25 | 2007-07-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-07-26 | 2011-01-25 | 2011-07-27 | $7700.00 | Window Closed / Lapsed |