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US5900672A Expired / Lapsed US ⏱️ 0.0 years remaining

Barrier layer

Assignee: GlobalFoundries Singapore Pte Ltd
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Filing: 1997-06-16
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Granted: 1999-05-04
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Expires: 2017-06-16
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Abstract

Abstract A structure and method for making copper interconnections in an integrated circuit are described. The structure is a damascene copper connector whose upper surface is coplanar with the upper surface of the insulating layer in which it is embedded. Out-diffusion of copper from the connector is prevented by two barrier layers. One is located at the interface between the connector and the insulating layer while the second barrier is an insulating layer which covers the upper surface of the connector. The damascene process involves filling a trench in the surface of the insulator with copper and then removing the excess by chem.-mech. polishing. Since photoresist is never in direct contact with the copper the problem of copper oxidation during resist ashing has been effectively eliminated.

Inventors

  • 👤 Lap Chan
  • 👤 Jia Zhen Zheng

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 22:08
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/074; H10W20/077; H10W20/031; H10W20/032; H10W20/033; H10W20/40; H10W20/41; H10W20/425

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 128 words
An electrical connector in an integrated circuit comprising: a silicon substrate; a first insulating layer, having upper and lower surfaces, on said substrate; a copper connector, having upper and lower surfaces, in said first insulating layer such that the upper surface of said copper connector is at the level of the upper surface of said first insulating layer and the lower surface of said copper connector is a distance above the lower surface of said first insulating layer; an interface between said copper connector and said first insulating layer; a first barrier layer at said interface; a second, insulating, barrier layer on the upper surface of said copper connector and the upper surface of said first insulating layer; and a second insulating layer on said second barrier layer.
Claim 2
Dependent Claim 128 words
An electrical connector in an integrated circuit comprising: a silicon substrate; a first insulating layer, having upper and lower surfaces, on said substrate; a copper connector, having upper and lower surfaces, in said first insulating layer such that the upper surface of said copper connector is at the level of the upper surface of said first insulating layer and the lower surface of said copper connector is a distance above the lower surface of said first insulating layer; an interface between said copper connector and said first insulating layer; a first barrier layer at said interface; a second, insulating, barrier layer on the upper surface of said copper connector and the upper surface of said first insulating layer; and a second insulating layer on said second barrier layer.
Claim 3
Dependent Claim 26 words
The connector described in claim 1 wherein said second barrier layer comprises material taken from the group consisting of aluminum oxide, tantalum oxide, and silicon nitride.
Claim 4
Dependent Claim 21 words
The connector described in claim 1 wherein the thickness of said second barrier layer is between about 200 and 2,000 Angstroms.
Claim 5
Dependent Claim 32 words
The connector described in claim 1 further comprising a via hole through said second insulating layer and said second barrier layer down to the level of said upper surface of said connector.
Claim 6
Dependent Claim 29 words
The connector described in claim 1 wherein the distance between the lower surfaces of said copper connector and said first insulating layer is between about 4,000 and 8,000 Angstroms.

References Cited (Backward Citations)

US4910169A Cited
US4985750A Cited
US4931410A Cited
US5084412A Cited
US5447599A Cited
US5447887A Cited
US5656860A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2002-05-03 2002-11-02 2003-05-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2006-05-03 2006-11-02 2007-05-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2010-05-03 2010-11-02 2011-05-04 $7700.00 Window Closed / Lapsed

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