Micromechanical component and production method

Claim 1

A method for producing a component having a movable section, arranged at a distance over a substrate, of a micromechanical structure, having spacers on a top side, facing said movable section, of said substrate, between said movable section and said top side, the spacers being dimensioned such that sticking of the movable section to the substrate or to the spacers is prevented, having the steps of: a) applying a sacrificial layer and a structure layer to a substrate; b) structuring said structure layer such that said movable section is produced; c) at least partially removing said sacrificial layer between said section and the substrate, except for residues which remain between that portion of the structure layer which is provided for the movable section and the substrate; d) depositing portions of a spacer layer made of a material provided for the spacers between said section and the substrate, the deposition is carried out as a divergent deposition of fluorocarbon in a plasma reactor under action of an electric field directed toward the substrate; e) etching back said spacer layer to the spacers which do not touch the structural layer; and f) removing the residues of the sacrificial layer.

Claim 2

A method for producing a component having a movable section, arranged at a distance over a substrate, of a micromechanical structure, having spacers on a top side, facing said movable section, of said substrate, between said movable section and said top side, the spacers being dimensioned such that sticking of the movable section to the substrate or to the spacers is prevented, having the steps of: a) applying a sacrificial layer and a structure layer to a substrate; b) structuring said structure layer such that said movable section is produced; c) at least partially removing said sacrificial layer between said section and the substrate, except for residues which remain between that portion of the structure layer which is provided for the movable section and the substrate; d) depositing portions of a spacer layer made of a material provided for the spacers between said section and the substrate, the deposition is carried out as a divergent deposition of fluorocarbon in a plasma reactor under action of an electric field directed toward the substrate; e) etching back said spacer layer to the spacers which do not touch the structural layer; and f) removing the residues of the sacrificial layer.