US5640039A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Conductive plane beneath suspended microstructure
Assignee: Analog Devices Inc
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Filing: 1994-12-01
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Granted: 1997-06-17
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Expires: 2014-12-01
Abstract
Abstract A method and apparatus for providing a conductive plane beneath a suspended microstructure. A conductive region is diffused into a substrate. A dielectric layer is added, covering the substrate, and then removed from a portion of the conductive region. A spacer layer is deposited over the dielectric and exposed conductive region. A polysilicon layer is deposited over the spacer layer, and formed into the shape of the suspended microstructure. After removal of the spacer layer, the suspended microstructure is left free to move above an exposed conductive plane. The conductive plane is driven to the same potential as the microstructure.
Inventors
- 👤 Kevin Hin-Leung Chau
- 👤 Roger T. Howe
- 👤 Richard S. Payne
- 👤 Yang Zhao
- 👤 Theresa A. Core
- 👤 Steven J. Sherman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:38
CPC Classifications
G; G01; G01P; G01P15/00; G01P15/02; G01P15/08; G01P15/125; G01P15/0802; G01P2015/0805; G01P2015/0808; G01P2015/0811; G01P2015/0814
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
72 words
A micromachined electro-mechanical structure comprising: a substrate; a conductive region diffused into the substrate, having a top surface at least partially exposed; a conductive structure suspended above the exposed surface of the conductive region and movable relative to the substrate, with the potential of the conductive structure variable in response to the position of the conductive structure; and means for driving the conductive region to the same potential as the conductive structure.
Claim 2
Dependent Claim
72 words
A micromachined electro-mechanical structure comprising: a substrate; a conductive region diffused into the substrate, having a top surface at least partially exposed; a conductive structure suspended above the exposed surface of the conductive region and movable relative to the substrate, with the potential of the conductive structure variable in response to the position of the conductive structure; and means for driving the conductive region to the same potential as the conductive structure.
Claim 3
Dependent Claim
30 words
The electro-mechanical structure according to claim 1, wherein the driving means includes a buffer having an input coupled to the conductive structure and an output coupled to the conductive region.
Claim 4
Dependent Claim
13 words
The electro-mechanical structure according to claim 1, wherein the conductive structure includes polysilicon.
Claim 5
Dependent Claim
14 words
The electro-mechanical structure according to claim 3, wherein the substrate includes a p-silicon substrate.
Claim 6
Dependent Claim
16 words
The electro-mechanical structure according to claim 4, wherein the conductive region includes an n+ diffused region.
Claim 7
Dependent Claim
14 words
The electro-mechanical structure according to claim 3, wherein the substrate includes an n-silicon substrate.
Claim 8
Dependent Claim
16 words
The electro-mechanical structure according to claim 6, wherein the conductive region includes a p+ diffused region.
Claim 9
Dependent Claim
28 words
The electro-mechanical structure according to claim 1, further comprising a dielectric covering at least a portion of the substrate other than the exposed portion of the conductive region.
Claim 10
Dependent Claim
13 words
The electro-mechanical structure according to claim 8, wherein the dielectric includes silicon nitride.
Claim 11
Dependent Claim
70 words
A micromachined electro-mechanical structure comprising: a substrate; a conductive region on the substrate, having an at least partially-exposed top surface; a conductive structure suspended above the exposed surface of the conductive region and movable relative to the substrate, with the potential of the conductive structure variable in response to the position of the conductive structure; and means for driving the conductive region to the same potential as the conductive structure.
Claim 12
Dependent Claim
70 words
A micromachined electro-mechanical structure comprising: a substrate; a conductive region on the substrate, having an at least partially-exposed top surface; a conductive structure suspended above the exposed surface of the conductive region and movable relative to the substrate, with the potential of the conductive structure variable in response to the position of the conductive structure; and means for driving the conductive region to the same potential as the conductive structure.
Claim 13
Dependent Claim
13 words
The elctro-mechanical structure according to claim 10, wherein the conductive structure includes polysilicon.
Claim 14
Dependent Claim
15 words
The electro-mechanical structure according to claim 10, wherein the conductive structure includes single crystalline silicon.
Claim 15
Dependent Claim
13 words
The electro-mechanical structure according to claim 10, wherein the conductive region includes polysilicon.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-06-16 | 2000-12-16 | 2001-06-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-06-16 | 2004-12-16 | 2005-06-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-06-16 | 2008-12-16 | 2009-06-17 | $7700.00 | Window Closed / Lapsed |