Patent US5874368A successfully refreshed from Google Patents.
US5874368A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Silicon nitride from bis(tertiarybutylamino)silane
Assignee: Versum Materials US LLC
•
Filing: 1997-10-02
•
Granted: 1999-02-23
•
Expires: 2017-10-02
Abstract
Abstract A process for the low pressure chemical vapor deposition of silicon nitride from ammonia and a silane of the formula: (t-C4H9NH)2SiH2 provides improved properties of the resulting film for use in the semiconductor industry.
Inventors
- 👤 Ravi Kumar Laxman
- 👤 David Allen Roberts
- 👤 Arthur Kenneth Hochberg
- 👤 Herman Gene Hockenhull
- 👤 Felicia Diane Kaminsky
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:51
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; H; H10; H10P; H10P14/00; H10P14/60; H10P14/66; H10P14/668; H10P14/6681; H10P14/6687; H10P14/6689; C23C16/345; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6336; H10P14/6682; H10P14/69; H10P14/694; H10P14/6943; H10P14/69433
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
42 words
A process for the low pressure chemical vapor deposition of silicon nitride on a substrate, comprising: providing a substrate; contacting ammonia and a silane of the formula (t-C 4 H 9 NH) 2 SiH 2 to deposit silicon nitride on the substrate.
Claim 2
Dependent Claim
42 words
A process for the low pressure chemical vapor deposition of silicon nitride on a substrate, comprising: providing a substrate; contacting ammonia and a silane of the formula (t-C 4 H 9 NH) 2 SiH 2 to deposit silicon nitride on the substrate.
Claim 3
Dependent Claim
21 words
The process of claim 1 wherein the temperature of the substrate is in the range of approximately 500° to 800° C.
Claim 4
Dependent Claim
19 words
The process of claim 1 wherein the pressure is in the range of approximately 20 mTorr to 2 Torr.
Claim 5
Dependent Claim
18 words
The process of claim 1 wherein the molar ratio of ammonia to silane is greater than approximately 2:1.
Claim 6
Dependent Claim
10 words
The process of claim 1 wherein the substrate is silicon.
Claim 7
Dependent Claim
12 words
The process of claim 1 wherein the substrate is an electronic device.
Claim 8
Dependent Claim
13 words
The process of claim 1 wherein the substrate is a flat panel display.
Claim 9
Dependent Claim
98 words
A low temperature chemical vapor deposition of silicon nitride in a reaction zone, comprising the steps of: a) heating a substrate to a temperature in the range of approximately 500°-800° C. in said zone; b) maintaining the substrate in a vacuum at a pressure in the range of approximately 20 mTorr-2 Torr in said zone; c) introducing into said zone ammonia and a silane of the formula: (t-C 4 H 9 NH) 2 SiH 2 ; and d) maintaining the conditions of a) through c) sufficient to cause a film of silicon nitride to deposit on the substrate.
Claim 10
Dependent Claim
98 words
A low temperature chemical vapor deposition of silicon nitride in a reaction zone, comprising the steps of: a) heating a substrate to a temperature in the range of approximately 500°-800° C. in said zone; b) maintaining the substrate in a vacuum at a pressure in the range of approximately 20 mTorr-2 Torr in said zone; c) introducing into said zone ammonia and a silane of the formula: (t-C 4 H 9 NH) 2 SiH 2 ; and d) maintaining the conditions of a) through c) sufficient to cause a film of silicon nitride to deposit on the substrate.
References Cited (Backward Citations)
US3574677A
Cited
US4777205A
Cited
US4992299A
Cited
US5234869A
Cited
JPH06132284A
Cited
US5486589A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-02-22 | 2002-08-24 | 2003-02-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-02-22 | 2006-08-24 | 2007-02-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-02-22 | 2010-08-24 | 2011-02-23 | $7700.00 | Window Closed / Lapsed |