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US5834366A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for fabricating microbump interconnect for bare semiconductor dice

Assignee: Micron Technology Inc
•
Filing: 1997-08-19
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Granted: 1998-11-10
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Expires: 2017-08-19
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Abstract

Abstract A method for forming an interconnect for making a temporary or permanent electrical connection to a semiconductor dice is provided. The method includes forming a substrate with an insulating layer and a pattern of conductors thereon. The conductors are formed as a bi-metal stack including a barrier layer formed of an inert metal and a conductive layer formed of a highly conductive metal. Microbumps are formed on the conductors by deposition through a mask using an electroplating, electroless plating, screen printing or evaporation process. The interconnect can be used to provide a temporary electrical connection for testing bare semiconductor dice. Alternately the interconnect can be used for flip chip mounting dice for fabricating multi chip modules and other electronic devices.

Inventors

  • 👤 Salman Akram

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 16:03
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/40; H05K3/4007; H10; H10W; H10W70/00; H10W70/099; H10W72/00; H10W72/01; H10W72/012; H10W72/019; H10W72/20; H10W78/00; H10W90/00; H10W90/701; H05K1/00; H05K1/02; H05K1/0271; H05K2201/00; H05K2201/03; H05K2201/0332; H05K2201/0335; H05K2201/0347; H05K2201/0364; H05K2201/0367; H05K2201/10; H05K2201/10613; H05K2201/10742; H05K2201/1075; H05K2201/10848; H05K3/30; H05K3/32; H05K3/325; H05K3/326; H10W72/251; H10W72/252; H10W72/261; H10W72/29; H10W72/851; H10W72/874; H10W72/90; H10W72/941; H10W72/9415; H10W72/951

Claims Analysis

Total Claims: 19
Claim 1
Independent Claim 98 words
A method for fabricating an interconnect for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors corresponding to a pattern of contacts on a die; forming microbumps on the conductors by depositing a metal in the openings, the microbumps configured to electrically engage the contacts on the die and to flex with the polymer layer to accommodate dimensional variations in the microbumps and contacts; and removing the mask.
Claim 2
Independent Claim 98 words
A method for fabricating an interconnect for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors corresponding to a pattern of contacts on a die; forming microbumps on the conductors by depositing a metal in the openings, the microbumps configured to electrically engage the contacts on the die and to flex with the polymer layer to accommodate dimensional variations in the microbumps and contacts; and removing the mask.
Claim 3
Dependent Claim 16 words
The method of claim 1 wherein the substrate comprises silicon and the polymer layer comprises polyimide.
Claim 4
Dependent Claim 17 words
The method of claim 1 wherein the microbumps are configured to flex to accommodate z-direction dimensional variations.
Claim 5
Independent Claim 99 words
A method for fabricating an interconnect for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors corresponding to a pattern of contacts on the die; forming microbumps on the conductors by depositing a metal in the openings, the microbumps configured to electrically enrage the contacts on the die and to flex with the compliant layer to accommodate z-direction dimensional variations in the microbumps and contacts; and removing the mask.
Claim 6
Independent Claim 99 words
A method for fabricating an interconnect for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors corresponding to a pattern of contacts on the die; forming microbumps on the conductors by depositing a metal in the openings, the microbumps configured to electrically enrage the contacts on the die and to flex with the compliant layer to accommodate z-direction dimensional variations in the microbumps and contacts; and removing the mask.
Claim 7
Dependent Claim 13 words
The method of claim 4 further comprising bonding the microbumps to the contacts.
Claim 8
Dependent Claim 19 words
The method of claim 4 further comprising placing the substrate in a test fixture configured to test the die.
Claim 9
Independent Claim 109 words
A method for fabricating an interconnect for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings on the conductors corresponding to a pattern of contacts on the die; depositing a metal in the openings to form a plurality of microbumps configured to electrically engage the contacts on the die and to flex with the polymer layer to accommodate z-direction dimensional variations in the microbumps and contacts; removing the mask; and placing the substrate in a test fixture configured to test the die.
Claim 10
Independent Claim 109 words
A method for fabricating an interconnect for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings on the conductors corresponding to a pattern of contacts on the die; depositing a metal in the openings to form a plurality of microbumps configured to electrically engage the contacts on the die and to flex with the polymer layer to accommodate z-direction dimensional variations in the microbumps and contacts; removing the mask; and placing the substrate in a test fixture configured to test the die.
Claim 11
Dependent Claim 10 words
The method of claim 7 wherein the substrate comprises silicon.
Claim 12
Dependent Claim 16 words
The method of claim 7 wherein the substrate comprises silicon and the polymer layer comprises polyimide.
Claim 13
Independent Claim 103 words
A method for fabricating a multi chip module comprising: providing a die comprising a plurality of contacts; providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors; forming microbumps on the conductors by depositing a metal in the openings; removing the mask; placing the die on the substrate with the microbumps electrically contacting the contacts and flexing with the compliant layer to accommodate z-direction dimensional variations in the microbumps and contacts; and bonding the microbumps to the contacts.
Claim 14
Independent Claim 103 words
A method for fabricating a multi chip module comprising: providing a die comprising a plurality of contacts; providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors; forming microbumps on the conductors by depositing a metal in the openings; removing the mask; placing the die on the substrate with the microbumps electrically contacting the contacts and flexing with the compliant layer to accommodate z-direction dimensional variations in the microbumps and contacts; and bonding the microbumps to the contacts.
Claim 15
Dependent Claim 10 words
The method of claim 10 wherein the metal comprises solder.
Claim 16
Dependent Claim 13 words
The method of claim 10 bonding the microbumps comprises flip chip optical alignment.
Claim 17
Independent Claim 121 words
A method for fabricating a test assembly for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors corresponding to a pattern of contacts on the die; forming microbumps on the conductors by depositing a metal in the openings, each microbump configured to electrically contact a contact on the die and to flex with the polymer layer to accommodate z-direction dimensional variations; removing the masks; providing a test fixture configured to test the die; and placing the substrate in the test fixture with the conductors in electrical communication with the test fixture.
Claim 18
Independent Claim 121 words
A method for fabricating a test assembly for a semiconductor die comprising: providing a substrate; forming an electrically insulating polymer layer on the substrate; forming a plurality of conductors on the polymer layer; forming a mask on the substrate comprising a plurality of openings to the conductors corresponding to a pattern of contacts on the die; forming microbumps on the conductors by depositing a metal in the openings, each microbump configured to electrically contact a contact on the die and to flex with the polymer layer to accommodate z-direction dimensional variations; removing the masks; providing a test fixture configured to test the die; and placing the substrate in the test fixture with the conductors in electrical communication with the test fixture.
Claim 19
Dependent Claim 18 words
The method as claimed in claim 13 wherein the substrate comprises silicon and the polymer layer comprises polyimide.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-11-09 2002-05-11 2002-11-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-11-09 2006-05-11 2006-11-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-11-09 2010-05-11 2010-11-10 $7700.00 Window Closed / Lapsed

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