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US5801414A Expired / Lapsed US ⏱️ 0.0 years remaining

Non-volatile semiconductor memory having programming region for injecting and ejecting carriers into and from a floating gate

Assignee: Renesas Electronics Corp
•
Filing: 1996-12-24
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Granted: 1998-09-01
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Expires: 2016-12-24
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Abstract

Abstract An electrically erasable and programmable read only memory device includes a plurality of memory cells, each of which has a drain region, a source region, and a programming region, a first gate insulating film covering a part of the drain region, a second gate insulating film covering a part of the programming region, and a floating gate having a first portion overlapping the first gate insulating film to form a first capacitance therebetween and a second portion overlapping the second gate insulating film to form a second capacitance. The first capacitance is designed to be larger than the second capacitance, so that the injection and extraction of carriers take place between the programming region and the floating gate.

Inventors

  • 👤 Masahiro Shinmori

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 09:39
CPC Classifications
H; H10; H10B; H10B41/00; H10B41/10; H10B69/00; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0411; H10D30/60; H10D30/68; H10D30/681; H10D30/683; H10D30/6891; H10D30/6892

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 171 words
A semiconductor memory device comprising: a semiconductor substrate and a plurality of memory cells, each of said memory cells including a first region, a second region and a programming region selectively formed in said semiconductor substrate, a first gate insulating film covering a part of said first region, a second gate insulating film covering a part of said programming region, said first gate insulating film and said second gate insulating film, wherein carriers move between a floating gate and said programming region, being of substantially equal thickness, said floating gate having a first portion overlapping said part of said first region to form a first capacitance therebetween and a second portion overlapping said part of said programming region to form a second capacitance, an area of said first portion being larger than an area of said second portion, such that said first capacitance is larger than said second capacitance, and an additional gate provided on an insulating layer covering said floating gate, said additional gate being connected to said first region.
Claim 2
Dependent Claim 171 words
A semiconductor memory device comprising: a semiconductor substrate and a plurality of memory cells, each of said memory cells including a first region, a second region and a programming region selectively formed in said semiconductor substrate, a first gate insulating film covering a part of said first region, a second gate insulating film covering a part of said programming region, said first gate insulating film and said second gate insulating film, wherein carriers move between a floating gate and said programming region, being of substantially equal thickness, said floating gate having a first portion overlapping said part of said first region to form a first capacitance therebetween and a second portion overlapping said part of said programming region to form a second capacitance, an area of said first portion being larger than an area of said second portion, such that said first capacitance is larger than said second capacitance, and an additional gate provided on an insulating layer covering said floating gate, said additional gate being connected to said first region.
Claim 3
Dependent Claim 51 words
The device as claimed in claim 1, further comprising a third region selectively formed in said semiconductor substrate apart from said second region, a third gate insulating film covering a portion of said semiconductor substrate between said second and third regions, and a selector gate provided on said third insulating film.

References Cited (Backward Citations)

US4019197A Cited
US4425631A Cited
JPS59155968A Cited
EP0120303A2 Cited
EP0133667A2 Cited
FR2562707A1 Cited
US4823316A Cited
US4924278A Cited
US5656838A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-08-31 2002-03-02 2002-09-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-08-31 2006-03-02 2006-09-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-08-31 2010-03-02 2010-09-01 $7700.00 Window Closed / Lapsed

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