US5789734A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus that compensates for spherical aberration of an image forming device
Assignee: Canon Inc
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Filing: 1994-05-13
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Granted: 1998-08-04
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Expires: 2014-05-13
Abstract
Abstract An exposure apparatus wherein an image forming system forms an image of a pattern upon a photosensitive layer, and a detecting system detects a spherical aberration of the image forming system. The detected spherical aberration of the image forming system is adjusted or controlled in a suitable way, whereby correct pattern transfer operation is assured.
Inventors
- 👤 Makoto Torigoe
- 👤 Akiyoshi Suzuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 13:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70308; G03F7/70241; G03F7/708; G03F7/70858; G03F7/70883; G03F7/70891; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
83 words
An exposure apparatus, comprising: image forming means for forming an image of a pattern upon a photosensitive layer; detecting means for detecting a spherical aberration of said image forming means; changing means for changing the spherical aberration of said image forming means, said changing means comprising means for changing a wavelength of a radiation beam used in image formation by said image forming means; and controlling means for controlling said changing means in accordance with the spherical aberration detected by said detecting means.
Claim 2
Dependent Claim
83 words
An exposure apparatus, comprising: image forming means for forming an image of a pattern upon a photosensitive layer; detecting means for detecting a spherical aberration of said image forming means; changing means for changing the spherical aberration of said image forming means, said changing means comprising means for changing a wavelength of a radiation beam used in image formation by said image forming means; and controlling means for controlling said changing means in accordance with the spherical aberration detected by said detecting means.
Claim 3
Dependent Claim
16 words
An apparatus according to claim 1, wherein said image forming means comprises a projection lens system.
Claim 4
Dependent Claim
18 words
An apparatus according to claim 2, wherein said detecting means comprises a TTL image plane detecting optical system.
Claim 5
Dependent Claim
52 words
An exposure apparatus, comprising: image forming means for forming an image of a pattern on a photosensitive layer with light; spherical aberration detecting means for detecting spherical aberration of said image forming means; and means for changing a spherical aberration of said image forming means by changing a wavelength of the light.
Claim 6
Dependent Claim
52 words
An exposure apparatus, comprising: image forming means for forming an image of a pattern on a photosensitive layer with light; spherical aberration detecting means for detecting spherical aberration of said image forming means; and means for changing a spherical aberration of said image forming means by changing a wavelength of the light.
Claim 7
Independent Claim
104 words
A device manufacturing method comprising: (i) providing an exposure apparatus comprising: image forming means for forming an image of a pattern upon a photosensitive layer; detecting means for detecting a spherical aberration of said image forming means; changing means for changing the spherical aberration of said image forming means, said changing means comprising means for changing a wavelength of a radiation beam used in image formation by said image forming means; and controlling means for controlling said changing means in accordance with the spherical aberration detected by said detecting means; and (ii) exposing a substrate using the provided exposure apparatus, to manufacture a device.
Claim 8
Independent Claim
104 words
A device manufacturing method comprising: (i) providing an exposure apparatus comprising: image forming means for forming an image of a pattern upon a photosensitive layer; detecting means for detecting a spherical aberration of said image forming means; changing means for changing the spherical aberration of said image forming means, said changing means comprising means for changing a wavelength of a radiation beam used in image formation by said image forming means; and controlling means for controlling said changing means in accordance with the spherical aberration detected by said detecting means; and (ii) exposing a substrate using the provided exposure apparatus, to manufacture a device.
Claim 9
Independent Claim
56 words
A device manufacturing method including projecting a device pattern onto a photosensitive layer with light through a projection optical system, said method comprising the steps of: detecting spherical aberration of the projection optical system; and changing a wavelength of the light on the basis of the detection to adjust spherical aberration of the projection optical system.
Claim 10
Independent Claim
56 words
A device manufacturing method including projecting a device pattern onto a photosensitive layer with light through a projection optical system, said method comprising the steps of: detecting spherical aberration of the projection optical system; and changing a wavelength of the light on the basis of the detection to adjust spherical aberration of the projection optical system.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-08-03 | 2002-02-02 | 2002-08-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-08-03 | 2006-02-02 | 2006-08-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-08-03 | 2010-02-02 | 2010-08-04 | $7700.00 | Window Closed / Lapsed |