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US4894611A Expired / Lapsed US ⏱️ 0.0 years remaining

System for measuring characteristics of electron emitting sources

Assignee: Canon Inc
•
Filing: 1988-04-27
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Granted: 1990-01-16
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Expires: 2008-04-27
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Abstract

Abstract A measuring system particularly suitably usable with an apparatus having a plurality of electron emitting sources, for measuring the characteristics of the electron emitting sources is disclosed. In the measuring system, the electron emitting sources are driven so that they emit electron flows of predetermined and different frequencies. The emitted electron flows are collected and, thereafter, only those signals having components corresponding to the predetermined frequencies are extracted. Based on the extracted signals, the characteristics of the electron emitting sources are measured at the same time and independently of each other.

Inventors

  • 👤 Isamu Shimoda
  • 👤 Mamoru Miyawaki
  • 👤 Akira Suzuki
  • 👤 Tetsuya Kaneko
  • 👤 Takeo Tsukamoto
  • 👤 Toshihiko Takeda
  • 👤 Masahiko Okunuki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 21:40
CPC Classifications
G; G01; G01R; G01R31/00; G01R31/24

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 99 words
A system for measuring characteristics of electron sources, said system comprising: driving means for driving said electron sources at predetermined frequencies so that each electron source emits an electron flow; collecting means for collecting the electron flows emitted from said electron sources; selecting means for selecting and extracting signals having components corresponding to said predetermined frequencies, out of the electron flows as collected by said collecting means; and measuring means for measuring an operation characteristic of an electron source responsive to the selection of, and corresponding to a signal selected by, said selecting means, independently from other electron sources.
Claim 2
Independent Claim 99 words
A system for measuring characteristics of electron sources, said system comprising: driving means for driving said electron sources at predetermined frequencies so that each electron source emits an electron flow; collecting means for collecting the electron flows emitted from said electron sources; selecting means for selecting and extracting signals having components corresponding to said predetermined frequencies, out of the electron flows as collected by said collecting means; and measuring means for measuring an operation characteristic of an electron source responsive to the selection of, and corresponding to a signal selected by, said selecting means, independently from other electron sources.
Claim 3
Dependent Claim 21 words
A system according to claim 1, wherein said driving means is adapted to set variable frequencies to drive said electron sources.
Claim 4
Dependent Claim 35 words
A system according to claim 1, wherein said system is adapted to measure characteristics of electron sources of an electron emitting element of a type wherein emission of electrons from a cold cathode is used.
Claim 5
Dependent Claim 21 words
A system according to claim 1, wherein said output means includes integrating means for integrating the output of said selecting means.
Claim 6
Dependent Claim 99 words
A multi-electron-beam pattern apparatus, comprising: a plurality of electron sources; driving means for driving said electron sources at predetermined different frequencies so that each electron source emits an electron flow; collecting means for collecting the electron flows emitted from said electron source; selecting means for selecting and extracting signals having components corresponding to said predetermined frequencies, out of the electron flows as collected by said collecting means; and measuring means for measuring an operation characteristic of an electron source responsive to the selection of, and corresponding to a signal selected by, said selecting means, independently from other electron sources.
Claim 7
Dependent Claim 99 words
A multi-electron-beam pattern apparatus, comprising: a plurality of electron sources; driving means for driving said electron sources at predetermined different frequencies so that each electron source emits an electron flow; collecting means for collecting the electron flows emitted from said electron source; selecting means for selecting and extracting signals having components corresponding to said predetermined frequencies, out of the electron flows as collected by said collecting means; and measuring means for measuring an operation characteristic of an electron source responsive to the selection of, and corresponding to a signal selected by, said selecting means, independently from other electron sources.
Claim 8
Dependent Claim 15 words
An apparatus according to claim 5, wherein said different frequencies are not in multiple relation.
Claim 9
Dependent Claim 30 words
An apparatus according to claim 5, wherein each of said electron sources comprises an electron emitting element of a type wherein emission of electrons from a cold cathode is used.
Claim 10
Dependent Claim 21 words
An apparatus according to claim 5, wherein said output means includes integrating means for integrating the output of said selecting means.

References Cited (Backward Citations)

US1406996A Cited
US2782366A Cited
US3324395A Cited
JPS54111272A Cited
US4259678A Cited
US4325084A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-01-15 1993-07-17 1994-01-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-01-15 1997-07-17 1998-01-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-01-15 2001-07-17 2002-01-16 $7700.00 Window Closed / Lapsed

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