Abstract An image transferring apparatus using a charged particle beam comprising a projection lens for transferring a pattern formed on a mask onto a target by focusing a charged particle beam passed through the mask, and a deflector for deflecting the charged particle beam passed through the mask toward a predetermined direction (x-axis direction) so that a transfer position of the pattern to the target is changed. In this apparatus, the deflector comprises a deflection coil for generating a deflection magnetic field extending in a direction (y-axis direction) perpendicular to the predetermined direction, and correction coils for generating correction magnetic fields extending in the same direction as the deflection magnetic field at areas spaced apart from the center of the deflection magnetic field along the direction (x-axis direction) perpendicular to the direction of the deflection magnetic field.
A reduction-transferring apparatus using a charged particle beam for reduction-transferring a pattern of a mask onto a target by directing a charged particle beam passed through said mask to first and second projection lenses of a charged particle beam optical system having an optical axis, wherein: when a distance between said mask and said target is L, reduction ratio of pattern from said mask to said target is 1/n, a positive constant number is ε and a point spaced apart from said mask toward said target by an amount of L·n/(n+1) is set as cross-over of said charged particle beam optical system, a central position of said first projection lens along the optical axis is displaced toward said cross-over by an amount of n·ε with respect to the position bisecting the distance between said mask and said cross-over, and a central position of said second projection lens along the optical axis is displaced toward said cross-over by an amount of ε with respect to the position bisecting the distance between said cross-over and said target.
Claim 2
Dependent Claim
175 words
A reduction-transferring apparatus using a charged particle beam for reduction-transferring a pattern of a mask onto a target by directing a charged particle beam passed through said mask to first and second projection lenses of a charged particle beam optical system having an optical axis, wherein: when a distance between said mask and said target is L, reduction ratio of pattern from said mask to said target is 1/n, a positive constant number is ε and a point spaced apart from said mask toward said target by an amount of L·n/(n+1) is set as cross-over of said charged particle beam optical system, a central position of said first projection lens along the optical axis is displaced toward said cross-over by an amount of n·ε with respect to the position bisecting the distance between said mask and said cross-over, and a central position of said second projection lens along the optical axis is displaced toward said cross-over by an amount of ε with respect to the position bisecting the distance between said cross-over and said target.
Claim 3
Dependent Claim
43 words
A reduction-transferring apparatus according to claim 1, wherein the bore radii of said first and second projection lenses on the side of said cross-over are set to be smaller than 1/4 of the bore radii of the projection lenses on the other side.