Electron beam lithography system and method

Claim 2

An electron beam lithography method, comprising the steps of: emitting an electron beam in a fixed predetermined dosage; repeating drawing a unit pattern with said electron beam on a substrate wherein a plurality of said unit patterns forms a highly integrated device pattern; forming said unit pattern by shaping the electron beam with a first aperture having an aperture pattern matching said unit pattern; and varying a transmittance of the electron beam with at least one second aperture to selectively control an intensity of an exposure dosage of the electron beam on said substrate.

Claim 3

A method of forming a pattern according to claim 1, wherein in said drawing of a unit pattern step that forms a highly integrated device pattern, said highly integrated device pattern has central and peripheral areas and said step of varying a transmittance of the electron beam varies the intensity of the exposure dosage of the electron beam within said central and peripheral areas.

Claim 4

A method of forming a pattern according to claim 1, wherein in said varying step a plurality of said second apertures are used, each said aperture having a different intensity distribution.

Claim 7

A method of forming a pattern according to claim 4, wherein the highly integrated circuit pattern has central and peripheral areas and in the step of controlling the transmitted beam energy, the transmittance is varied to have a high transmittance about said peripheral area and to have a low transmittance about said central area of said integrated device pattern.

Claim 8

A method of forming a pattern according to claim 4, wherein in said controlling step, an electron beam is used as said energy beam and said electron beam is selectively passed through one of a plurality of apertures that includes at least a first aperture having a uniform cross stripe pitch and a second aperture having both a coarse cross stripe pitch and a fine cross stripe pitch.

Claim 9

A method of forming a pattern according to claim 4, wherein further in said controlling step said electron beam is selectively passed through a first centrally disposed aperture having a low transmittance and a plurality of additional apertures disposed peripherally of said centrally disposed aperture having a transmittance that increases from low transmittance in portions near the centrally disposed aperture to high transmittance in portions disposed farthest therefrom.

Claim 10

An electron beam lithography method, comprising the steps of: forming a highly integrated circuit pattern on a resist film coated on a semiconductor substrate from a plurality of unit patterns; emitting an electron beam in a fixed dosage emission of predetermined current density and duration an shaping the beam by passing the beam through a first aperture having a cell projection pattern in the shape of the unit pattern; repeatedly exposing the coated substrate with said shaped electron beam; and controlling said exposing by passing said electron beam through one of a plurality of second apertures to vary an in-plane current distribution of said shaped electron beam for each shot in accordance with predetermined parameters.

Claim 11

An electron beam lithography method, comprising the steps of: forming a highly integrated circuit pattern on a resist film coated on a semiconductor substrate from a plurality of unit patterns; emitting an electron beam in a fixed dosage emission of predetermined current density and duration an shaping the beam by passing the beam through a first aperture having a cell projection pattern in the shape of the unit pattern; repeatedly exposing the coated substrate with said shaped electron beam; and controlling said exposing by passing said electron beam through one of a plurality of second apertures to vary an in-plane current distribution of said shaped electron beam for each shot in accordance with predetermined parameters.

Claim 12

An electron beam lithography method according to claim 8, wherein said controlling step controls an in-plane current distribution to be uniform.

Claim 13

An electron beam lithography method according to claim 8, wherein in said controlling step, said in-plane current distribution is controlled from one side of said shaped electron beam to the other.

Claim 14

An electron beam lithograph method according to claim 8, wherein said controlling step controls the in-plane current distribution in accordance with a material of the semiconductor substrate and a pattern configuration of the cell projection pattern as two of said predetermined parameters.

Claim 15

An electron beam lithography method according to claim 8, wherein in said controlling step said electron beam is selectively passed through a centrally disposed aperture having a low transmittance when said exposing exposes said central area and a plurality of additional apertures disposed peripherally of said centrally disposed aperture having a transmittance that increases from low transmittance in portions near the centrally disposed aperture to high transmittance in portions disposed farthest therefrom when said exposing exposes said peripheral area.

Claim 16

An electron beam lithography method, comprising the steps of: shaping an electron beam emitted from a source in a fixed predetermined dosage and duration by selecting one of a plurality of cell projection patterns each having a like unit pattern that forms part of a highly integrated circuit device pattern and each having a different transmittance affecting an exposure dosage of the electron beam; repeatedly exposing a substrate with the electron beam in the shape of the unit pattern, including exposing a first area of the device pattern with the electron beam shaped by a first one of said plurality of cell projection patterns providing low transmittance and exposing a second area of the device pattern with the electron beam shaped by at least a second one of said plurality of cell projection patterns providing high transmittance.

Claim 17

An electron beam lithography method, comprising the steps of: shaping an electron beam emitted from a source in a fixed predetermined dosage and duration by selecting one of a plurality of cell projection patterns each having a like unit pattern that forms part of a highly integrated circuit device pattern and each having a different transmittance affecting an exposure dosage of the electron beam; repeatedly exposing a substrate with the electron beam in the shape of the unit pattern, including exposing a first area of the device pattern with the electron beam shaped by a first one of said plurality of cell projection patterns providing low transmittance and exposing a second area of the device pattern with the electron beam shaped by at least a second one of said plurality of cell projection patterns providing high transmittance.

Claim 18

An electron beam lithography method according to claim 13, wherein said exposing the substrate step includes exposing a central area of the device pattern as said first area and exposing a peripheral area of the device pattern as said second area.

Claim 19

An electron beam lithography method according to claim 13, wherein in said exposing step said electron beam is selectively passed through said one of the cell projection apertures that is centrally disposed with respect to the electron beam that has high transmittance and through a plurality of additional cell projection apertures, as said at least one second cell projection aperture, that are disposed peripherally of said centrally disposed aperture and that have a transmittance that increases from low transmittance in portions near the centrally disposed aperture to high transmittance in portions disposed farthest therefrom.

Claim 22

A method of forming a highly integrated circuit pattern according to claim 36, wherein in said controlling step said electron beam is selectively passed through one of a plurality of transmittance affecting apertures having different transmittances, respectively.