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US5756374A
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Compound semiconductor light emitting device and method of preparing the same
Assignee: Sumitomo Electric Industries Ltd
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Filing: 1997-05-15
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Granted: 1998-05-26
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Expires: 2017-05-15
Abstract
Abstract A compound semiconductor light emitting device of high performance and a method which can industrially prepare the same are provided. The compound semiconductor light emitting device includes a GaAs substrate, a buffer layer consisting of GaN, having a thickness of 10 nm to 80 nm, which is formed on the substrate, an epitaxial layer consisting of Al x Ga 1-x N(0≦x<1) which is formed on the buffer layer, an incommensurate plane which is located on the interface between the buffer layer and the epitaxial layer, a light emitting layer which is formed on the epitaxial layer, and a cladding layer which is formed on the light emitting layer. The buffer layer is formed by organic metal chloride vapor phase epitaxy at a first temperature, while the epitaxial layer is formed by organic metal chloride vapor phase epitaxy at a second temperature which is higher than the first temperature. The light emitting layer preferably consists of In y Ga 1-y N (0<y<1) which is doped with Mg.
Inventors
- 👤 Yoshiki Miura
- 👤 Hideki Matsubara
- 👤 Masato Matsushima
- 👤 Hisashi Seki
- 👤 Akinori Koukitu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 02:17
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/01; H10H20/011; H10H20/013; H10H20/0137; H10H20/80; H10H20/81; H10H20/815; H10H20/822; H10H20/824; H10H20/825; Y; Y10; Y10S; Y10S438/00; Y10S438/914; Y10S438/925
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
190 words
A method of preparing compound semiconductor device, comprising the steps of: placing into a reaction chamber a substrate of a compound semiconductor selected from the group consisting of GaAs, GaPL InAs and InP; forming a buffer layer consisting of GaN on said substrate at a first temperature by introducing a first gas including an organic metal raw material containing hydrogen chloride and gallium and a second gas including ammonia into said reaction chamber while heating said reaction chamber overall from the exterior thereof for achieving said first temperature and carrying out vapor phase epitaxy on said substrate in said reaction chamber; forming an epitaxial layer consisting of Al x Ga 1-x N (0≦x<1) on said buffer layer at a second temperature that is higher than said first temperature by said introducing of said first gas and said second gas into said reaction chamber while heating said reaction chamber overall from the exterior thereof for achieving said second temperature and carrying out vapor phase epitaxy on said substrate in said reaction chamber; forming a light emitting layer on said epitaxial layer; and forming a cladding layer on said light emitting layer.
Claim 2
Independent Claim
190 words
A method of preparing compound semiconductor device, comprising the steps of: placing into a reaction chamber a substrate of a compound semiconductor selected from the group consisting of GaAs, GaPL InAs and InP; forming a buffer layer consisting of GaN on said substrate at a first temperature by introducing a first gas including an organic metal raw material containing hydrogen chloride and gallium and a second gas including ammonia into said reaction chamber while heating said reaction chamber overall from the exterior thereof for achieving said first temperature and carrying out vapor phase epitaxy on said substrate in said reaction chamber; forming an epitaxial layer consisting of Al x Ga 1-x N (0≦x<1) on said buffer layer at a second temperature that is higher than said first temperature by said introducing of said first gas and said second gas into said reaction chamber while heating said reaction chamber overall from the exterior thereof for achieving said second temperature and carrying out vapor phase epitaxy on said substrate in said reaction chamber; forming a light emitting layer on said epitaxial layer; and forming a cladding layer on said light emitting layer.
Claim 3
Dependent Claim
36 words
The method of preparing a compound semiconductor device in accordance with claim 1, wherein said first temperature is in a range from 300° C. to 700° C., and said second temperature is at least 750° C.
Claim 4
Dependent Claim
27 words
The method of preparing a compound semiconductor device in accordance with claim 2, wherein said first temperature is in a range from 400° C. to 600° C.
Claim 5
Dependent Claim
70 words
The method of preparing a compound semiconductor device in accordance with claim 1, wherein said epitaxial layer consists of Al x Ga 1-x N (0≦x<1) having a first conductivity type, said light emitting layer at least substantially consists of In y Ga y-1 N (0<y<1), and said cladding layer consists of Al z Ga 1-z N (0≦z<1) having a second conductivity type that is different from said first conductivity type.
Claim 6
Dependent Claim
36 words
The method of preparing a compound semiconductor device in accordance with claim 4, wherein said first temperature is in a range from 300° C. to 700° C., and said second temperature is at least 750° C.
Claim 7
Dependent Claim
27 words
The method of preparing a compound semiconductor device in accordance with claim 5, wherein said first temperature is in a range from 400° C. to 600° C.
Claim 8
Dependent Claim
35 words
The method of preparing a compound semiconductor device in accordance with claim 4, wherein said light emitting layer that at least substantially consists of In y Ga 1-y N further includes Mg as a dopant.
Claim 9
Dependent Claim
36 words
The method of preparing a compound semiconductor device in accordance with claim 7, wherein said first temperature is in a range from 300° C. to 700° C., and said second temperature is at least 750° C.
Claim 10
Dependent Claim
27 words
The method of preparing a compound semiconductor device in accordance with claim 8, wherein said first temperature is in a range from 400° C to 600° C.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2001-05-25 | 2001-11-24 | 2002-05-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-05-25 | 2005-11-24 | 2006-05-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-05-25 | 2009-11-24 | 2010-05-26 | $7700.00 | Window Closed / Lapsed |