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US5597766A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for detaching chips from a wafer

Assignee: Infineon Technologies AG
•
Filing: 1994-05-20
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Granted: 1997-01-28
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Expires: 2014-05-20
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Abstract

Abstract Method for detaching chips in the silicon layer of a SOI substrate, wherein trenches are etched between the chips down to the insulating layer of the SOI substrate. Spacers for the passivation of SiO 2 layers of the chips are produced. Finally, the chips are detached by etching the insulating layer off.

Inventors

  • 👤 Franz Neppl

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 00:20
CPC Classifications
H; H10; H10P; H10P54/00; Y; Y10; Y10S; Y10S148/00; Y10S148/028; Y10S148/05; Y10S148/135; Y10S438/00; Y10S438/977

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 74 words
Method for detaching chips produced in a silicon layer of an SOI substrate wafer from said wafer, comprising the steps of: etching trenches between said chips proceeding from a side of said wafer on which said chips are disposed to remove material that carries said chips, said trenches extending down to an insulating layer of said SOI substrate; and selectively etching said insulating layer, thereby removing same to detach said chips from one another.
Claim 2
Dependent Claim 74 words
Method for detaching chips produced in a silicon layer of an SOI substrate wafer from said wafer, comprising the steps of: etching trenches between said chips proceeding from a side of said wafer on which said chips are disposed to remove material that carries said chips, said trenches extending down to an insulating layer of said SOI substrate; and selectively etching said insulating layer, thereby removing same to detach said chips from one another.
Claim 3
Dependent Claim 41 words
Method according to claim 1, further comprising the step of covering uncovered surfaces of said chips with a passivation layer so that said insulating layer can be selectively etched and such that said trenches are not filled with said passivation layer.
Claim 4
Dependent Claim 30 words
Method according to claim 2, wherein said step of covering the uncovered surfaces of said chips with a passivation layer is further defined by providing SiN for said passivation layer.
Claim 5
Dependent Claim 49 words
Method according to claims 1, further comprising the steps of: filling said trenches with the same material as said insulating layer before selectively etching said insulating layer; and removing said SOI substrate down to said insulating layer at the side of said insulating layer facing away from said chips.
Claim 6
Dependent Claim 37 words
Method according to claim 4, wherein said step of filling said trenches with the same material as said insulating layer before selectively etching said insulating layer is further defined by filling said trenches with SiO 2 .
Claim 7
Dependent Claim 38 words
Method according to claim 1, further comprising the step of removing said material carrying said chips to thin said wafer from a side lying opposite said chips to uncover said trenches from said side lying opposite said chips.
Claim 8
Dependent Claim 23 words
Method according to claim 6, further comprising the steps of: filling said etched trenches with filler; thinning said wafer; and removing said filler.
Claim 9
Dependent Claim 26 words
Method according to claim 7, wherein said step of filling said etched trenches with filler is further defined by filling said trenches with SiO 2 .
Claim 10
Dependent Claim 21 words
Method according to claim 7, wherein said step of thinning said wafer is further defined by thinning said wafer by thin-grinding.
Claim 11
Dependent Claim 15 words
Method according to claim 1, further comprising the step of thinning said wafer by thin-grinding.

References Cited (Backward Citations)

US4104786A Cited
US4978639A Cited
US5064771A Cited
US5071792A Cited
JPH04223356A Cited
US5057450A Cited
US5244830A Cited
US5270265A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-01-28 2000-07-29 2001-01-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-01-28 2004-07-29 2005-01-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-01-28 2008-07-29 2009-01-28 $7700.00 Window Closed / Lapsed

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