Patent US5556474A successfully refreshed from Google Patents.
US5556474A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing apparatus
Assignee: Nissin Electric Co Ltd
•
Filing: 1994-12-13
•
Granted: 1996-09-17
•
Expires: 2014-12-13
Abstract
Abstract In a plasma processing apparatus, wherein a power application electrode for generating plasma and an electrode opposed thereto are disposed in a process chamber which can be exhausted to attain a predetermined vacuum pressure, an electric power is applied to the power application electrode to generate the plasma from a process gas introduced between the electrodes, and intended plasma processing is effected on a substrate mounted on one of the electrodes in the plasma, the apparatus includes a particle discharge duct which surrounds a periphery and a rear side of the power application electrode and has an opening at a position neighboring to the periphery of the power application electrode, and an exhaust device connected to the duct at a position corresponding to a central portion of the rear side of the power application electrode.
Inventors
- 👤 Satoshi Otani
- 👤 Hiroya Kirimura
- 👤 Hajime Kuwahara
- 👤 Takao Tabata
- 👤 Takahiro Nakahigashi
- 👤 Hiroshi Murakami
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:31
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/4412; C23C16/50; C23C16/505; C23C16/509; C23C16/5096
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
138 words
In a plasma processing apparatus comprising: a power application electrode for generating plasma, and an electrode opposed thereto disposed in a process chamber which can be set to a vacuum pressure by an exhaust device, means to apply electric power to said power application electrode to generate the plasma from a process gas introduced between said electrodes, and means to process a plasma on a substrate mounted on one of said electrodes in the plasma, the improvement in said apparatus comprising: a particle discharge duct which surrounds a periphery and a rear side of said power application electrode and has an opening at a position neighboring to said periphery of said power application electrode; and exhaust means connected to said duct at a position corresponding to a central portion of said rear side of said power application electrode.
Claim 2
Dependent Claim
138 words
In a plasma processing apparatus comprising: a power application electrode for generating plasma, and an electrode opposed thereto disposed in a process chamber which can be set to a vacuum pressure by an exhaust device, means to apply electric power to said power application electrode to generate the plasma from a process gas introduced between said electrodes, and means to process a plasma on a substrate mounted on one of said electrodes in the plasma, the improvement in said apparatus comprising: a particle discharge duct which surrounds a periphery and a rear side of said power application electrode and has an opening at a position neighboring to said periphery of said power application electrode; and exhaust means connected to said duct at a position corresponding to a central portion of said rear side of said power application electrode.
Claim 3
Dependent Claim
36 words
A plasma processing apparatus according to claim 1, wherein said duct is extended to surround a plasma generation region between said electrodes, and said duct opening is extended to a position confronting said plasma generation region.
Claim 4
Dependent Claim
16 words
A plasma processing apparatus according to claim 1, further comprising a heater associated to said duct.
Claim 5
Dependent Claim
28 words
A plasma processing apparatus according to claim 1, further comprising potential applying means connected to said duct for applying a potential to said opening portion of said duct.
Claim 6
Dependent Claim
28 words
A plasma processing apparatus according to claim 2, further comprising potential applying means connected to said duct for applying a potential to said opening portion of said duct.
Claim 7
Dependent Claim
22 words
A plasma processing apparatus according to claim 1, further comprising a perforated electrically conductive member provided at said opening of said duct.
Claim 8
Dependent Claim
22 words
A plasma processing apparatus according to claim 4, further comprising a perforated electrically conductive member provided at said opening of said duct.
Claim 9
Dependent Claim
22 words
A plasma processing apparatus according to claim 5, further comprising a perforated electrically conductive member provided at said opening of said duct.
Claim 10
Dependent Claim
36 words
A plasma processing apparatus according to claim 1, wherein an edge of the periphery of said power application electrode near the plasma generation region is chamfered along the direction of suction of particles by said duct.
Claim 11
Dependent Claim
39 words
A plasma processing apparatus according to claim 1, wherein an edge of said opening portion of said duct adjacent to said periphery of said power application electrode is chamfered along the direction of suction of particles by said duct.
Claim 12
Dependent Claim
40 words
A plasma processing apparatus according to claim 9, wherein an edge of said opening portion of said duct adjacent to said periphery of said power application electrode is chamfered along the direction of suction of said particles by said duct.
Claim 13
Dependent Claim
49 words
A plasma processing apparatus according to claim 1, wherein said power application electrode has a square pole form, and said duct is provided at a portion corresponding to the corner of said electrode with purge gas introducing means for preventing accumulation of particles at said portion of said duct.
Claim 14
Dependent Claim
18 words
A plasma processing apparatus according to claim 1, wherein said duct is made of an electrically insulating material.
Claim 15
Dependent Claim
32 words
A plasma processing apparatus according to claim 1, wherein said duct is made of an electrically conductive material and is electrically isolated from both of said power application electrode and the ground.
Claim 16
Dependent Claim
34 words
A plasma processing apparatus according to claim 1, wherein said exhaust means for performing exhaust from said duct is formed of said exhaust device for setting said process chamber to the predetermined vacuum pressure.
Claim 17
Dependent Claim
37 words
A plasma processing apparatus according to claim 1, wherein said exhaust means for performing exhaust from said duct is dedicated means provided independently from said exhaust device for setting said process chamber to the predetermined vacuum pressure.
Claim 18
Dependent Claim
20 words
A plasma processing apparatus according to any one of claims 1 to 16, wherein said apparatus is a plasma-CVD apparatus.
Claim 19
Dependent Claim
21 words
A plasma processing apparatus according to any one of claims 1 to 16, wherein said apparatus is a plasma etching apparatus.
References Cited (Backward Citations)
US4579618A
Cited
US4946576A
Cited
JPH01100432A
Cited
JPH01106564A
Cited
US5399254A
Cited
US5113790A
Cited
US5228968A
Cited
GB2272995A
Cited
US5424103A
Cited
US5391252A
Cited
US5423971A
Cited
US5352294A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-09-17 | 2000-03-18 | 2000-09-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-09-17 | 2004-03-18 | 2004-09-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-09-17 | 2008-03-18 | 2008-09-17 | $7700.00 | Window Closed / Lapsed |