Process for fabricating two loads having different resistance levels in a common layer of polysilicon

Claim 1

A method of forming a first load having a first resistance level and a second load having a second resistance level in a common layer of polysilicon formed in a semiconductor device structure, the method comprising the steps of: (a) forming a layer of polysilicon having said first resistance level on said semiconductor device structure; (b) forming a mask on said layer of polysilicon to define selected areas of said polysilicon layer to be implanted with a dopant; (c) implanting said selected areas of said polysilicon layer with said dopant to modify the resistance of said selected areas so that said selected areas have said second resistance level; and (d) etching away selected regions of said polysilicon layer to form first load regions having said first resistance level and second load regions having said second resistance level.

Claim 2

A method of forming a first load having a first resistance level and a second load having a second resistance level in a common layer of polysilicon formed in a semiconductor device structure, the method comprising the steps of: (a) forming a layer of polysilicon having said first resistance level on said semiconductor device structure; (b) forming a mask on said layer of polysilicon to define selected areas of said polysilicon layer to be implanted with a dopant; (c) implanting said selected areas of said polysilicon layer with said dopant to modify the resistance of said selected areas so that said selected areas have said second resistance level; and (d) etching away selected regions of said polysilicon layer to form first load regions having said first resistance level and second load regions having said second resistance level.

Claim 3

A method of forming a semiconductor device structure having a first load resistor having a first resistance level and a second load resistor having a second resistance level, which is substantially lower than said first resistance level, said method comprising the steps of: (a) forming N-wells, P-wells, field oxide regions, N+ and P+ source and drain regions, and polysilicon gate regions in said semiconductor device, said polysilicon gate regions formed from a first polysilicon layer; (b) forming a layer of silicon dioxide on the structure resulting from step (a); (c) forming a mask on said silicon dioxide layer to define contact openings in said silicon dioxide layer; (d) etching said silicon dioxide layer to form said contact openings; (e) depositing a second layer of polysilicon, which has a first conductance level, so that said second layer of polysilicon covers said contact openings; (f) masking said second polysilicon layer to define selected exposed areas of said select polysilicon layer; (g) implanting said exposed areas of said second polysilicon layer with a dopant to increase the conductivity of said selected areas of said second polysilicon layer to a second conductance level; (h) masking areas of said second polysilicon layer to define said first load resistor and said second load resistor, said first load resistor being formed from an area of said second polysilicon layer masked by step (f) and said second load resistor being formed from an area of said second polysilicon layer implanted with said dopant of step (g); and (i) etching away unmasked areas of said second polysilicon layer to form said first and second load resistors.

Claim 4

A method of forming a semiconductor device structure having a first load resistor having a first resistance level and a second load resistor having a second resistance level, which is substantially lower than said first resistance level, said method comprising the steps of: (a) forming N-wells, P-wells, field oxide regions, N+ and P+ source and drain regions, and polysilicon gate regions in said semiconductor device, said polysilicon gate regions formed from a first polysilicon layer; (b) forming a layer of silicon dioxide on the structure resulting from step (a); (c) forming a mask on said silicon dioxide layer to define contact openings in said silicon dioxide layer; (d) etching said silicon dioxide layer to form said contact openings; (e) depositing a second layer of polysilicon, which has a first conductance level, so that said second layer of polysilicon covers said contact openings; (f) masking said second polysilicon layer to define selected exposed areas of said select polysilicon layer; (g) implanting said exposed areas of said second polysilicon layer with a dopant to increase the conductivity of said selected areas of said second polysilicon layer to a second conductance level; (h) masking areas of said second polysilicon layer to define said first load resistor and said second load resistor, said first load resistor being formed from an area of said second polysilicon layer masked by step (f) and said second load resistor being formed from an area of said second polysilicon layer implanted with said dopant of step (g); and (i) etching away unmasked areas of said second polysilicon layer to form said first and second load resistors.