Patent US5529634A successfully refreshed from Google Patents.
US5529634A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method of manufacturing semiconductor device
Assignee: Toshiba Corp
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Filing: 1995-04-19
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Granted: 1996-06-25
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Expires: 2015-04-19
Abstract
Abstract An evaporation chamber for forming fine metal particles is separated from a film formation chamber in which the substrate having a metal film such as a metal column thereon is placed during metal film deposition. The pressure of the film formation chamber is set to be lower than that of the evaporation chamber, and the fine metal particles are sprayed on the substrate by the pressure difference to form the metal column. Therefore, a wiring layer, a connection electrode for connecting the wiring layer to another wiring layer, and the like can easily be formed by a small number of steps.
Inventors
- 👤 Masahiro Miyata
- 👤 Hidemitsu Egawa
- 👤 Johta Fukuhara
- 👤 Shinzi Takeda
- 👤 Hirokazu Ezawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 09:03
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/228; C23C14/04; H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/063; H10W20/40; H10W20/41; H10W20/42; H10W20/44; H10W20/4403; H10W20/4432; H10W72/00; H10W72/01; H10W72/012; H10W72/01251; H10W72/01255; H10W72/20; H10W72/251; H10W72/90; H10W72/951; H10W72/952
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
127 words
A metal film forming apparatus comprising: a first vacuum chamber in which a crucible for heating and evaporating a material to be melted is arranged; means for supplying an inert gas into said first vacuum chamber; a second vacuum chamber in which a target substrate is arranged; means for feeding said inert gas from said first chamber to said second vacuum chamber; and means, arranged in said first chamber, for regulating a flow of said inert gas in said first chamber such that a normal erected on a central point of a surface of a molten material in said crucible is defined as an axis of symmetry of said flow of said inert gas when the material to be melted is heated and melted by said crucible.
Claim 2
Dependent Claim
127 words
A metal film forming apparatus comprising: a first vacuum chamber in which a crucible for heating and evaporating a material to be melted is arranged; means for supplying an inert gas into said first vacuum chamber; a second vacuum chamber in which a target substrate is arranged; means for feeding said inert gas from said first chamber to said second vacuum chamber; and means, arranged in said first chamber, for regulating a flow of said inert gas in said first chamber such that a normal erected on a central point of a surface of a molten material in said crucible is defined as an axis of symmetry of said flow of said inert gas when the material to be melted is heated and melted by said crucible.
Claim 3
Dependent Claim
44 words
An apparatus according to claim 1, wherein said regulating means feeds said inert gas into said first chamber through a space having an obstacle to a flow direction in a gas supply pipe used when said inert gas is fed into said first chamber.
Claim 4
Dependent Claim
37 words
An apparatus according to claim 2, wherein metal fibers are filled in said gas supply pipe as said obstacle so that said inert gas is supplied into said first chamber through opening area of said metal fiber.
Claim 5
Dependent Claim
20 words
An apparatus according to claim 2, wherein a distal end of said gas supply pipe has a ring-like cylindrical shape.
Claim 6
Dependent Claim
41 words
An apparatus according to claim 1, wherein a flow velocity of regulated inert gas is slower than that of fine particles which are produced by cooling steam evaporated from said surface of said molten material by means of said inert gas.
Claim 7
Dependent Claim
27 words
An apparatus according to claim 2, wherein said obstacle is a filter a main surface of which is made of stainless steel fibers in a mesh form.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-06-25 | 1999-12-25 | 2000-06-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-06-25 | 2003-12-25 | 2004-06-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-06-25 | 2007-12-25 | 2008-06-25 | $7700.00 | Window Closed / Lapsed |