Novolak containing photoresist stripper composition

Claim 1

A resist stripper composition comprising: (a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of compounds having the formula (I): ##STR5## wherein n and m are each independently an integer ranging from 0-5, inclusive; X is hydrogen, alkyl, or alkoxy group; Y is either --O-- or --NH--; and Z is hydrogen, --OH, or --NH 2 ; (c) about 0.01% to about 1% by weight of novolak resin having a weight average molecular weight (M w ) from about 200 to about 5,000; (d) optionally from about 0 to about 10% by weight of an amino acid selected from the group consisting of compounds having the formula (II): ##STR6## wherein n is an integer ranging from 1-3; R 1 and R 2 are each independently selected from the group consisting of hydrogen and compounds having the formula ##STR7## wherein R 5 , R 6 , and R 7 are each independently selected from hydrogen, --OH, --CH 2 OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups; and R 3 and R 4 are each independently selected from the group consisting of hydroxy and compounds having the formula (IV): ##STR8## wherein X', Y', and Z' are each independently selected from hydrogen, --OH, --CH 2 OH, --CH 2 CH 2 OH, --CH 2 COOH, alkyl, or alkoxy group, and at least one of them is --OH, --CH 2 CH 2 OH, or --CH 2 OH; and (e) optionally from about 0 to about 10% by weight of water.