US5334332A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cleaning compositions for removing etching residue and method of using
Assignee: EKC Technology Inc
•
Filing: 1992-07-09
•
Granted: 1994-08-02
•
Expires: 2012-07-09
Abstract
Abstract A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.
Inventors
- 👤 Wai M. Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 18:07
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; B; B24; B24B; B24B37/00; B24B37/04; B24B37/042; C; C09; C09D; C09D9/00; C11; C11D; C11D3/00; C11D3/16; C11D3/20; C11D3/2003; C11D3/2041; C11D3/2058; C11D3/2065; C11D3/2075; C11D3/2086; C11D3/26; C11D3/30; C11D3/34; C11D3/3427; C11D3/3472; C11D3/43; C11D7/00; C11D7/22; C11D7/26; C11D7/261; C11D7/262; C11D7/263; C11D7/265; C11D7/267; C11D7/32; C11D7/3209; C11D7/3218; C11D7/3227; C11D7/3245; C11D7/3254; C11D7/3263; C11D7/3272; C11D7/3281; C11D7/34; C11D7/50; C11D7/5004; C11D7/5013; C23; C23G; C23G1/00; C23G1/02; C23G1/10; C23G1/103; C23G1/14; C23G1/20; C23G1/205; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/423; G03F7/425; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P70/23; H10P70/234; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/063; H10W20/071; H10W20/081; C11D2111/00; C11D2111/10; C11D2111/14; C11D2111/22; C11D2111/24; H10P70/10; H10P70/15
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
67 words
A composition for removing etching residue from a resist-free substrate, said composition consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine and a balance of water wherein said hydroxylamine and said alkanolamine are present in sufficient amounts to remove etching residue from said resist-free substrate and said resist was removed from said substrate by means other than said composition.
Claim 2
Dependent Claim
67 words
A composition for removing etching residue from a resist-free substrate, said composition consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine and a balance of water wherein said hydroxylamine and said alkanolamine are present in sufficient amounts to remove etching residue from said resist-free substrate and said resist was removed from said substrate by means other than said composition.
Claim 3
Dependent Claim
59 words
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of at least one chelating agent, and a balance of water wherein the hydroxylamine, said alkanolamine and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Claim 4
Dependent Claim
59 words
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of at least one chelating agent, and a balance of water wherein the hydroxylamine, said alkanolamine and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Claim 5
Dependent Claim
19 words
A composition according to claim 1 wherein said at least one chelating agent is 1,2-dihydroxybenzene or a derivative thereof.
Claim 6
Dependent Claim
65 words
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of a chelating agent having a formula ##STR7## wherein R═OH or COOH, and a balance of water wherein the hydroxylamine, said alkanolamine, and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Claim 7
Dependent Claim
65 words
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of a chelating agent having a formula ##STR7## wherein R═OH or COOH, and a balance of water wherein the hydroxylamine, said alkanolamine, and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Claim 8
Dependent Claim
86 words
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of a chelating agent having a formula of ##STR8## wherein R 1 , R 2 , R 3 and R 4 ═H or NH 4 , or the ammonium salt of said compound, and a balance of water wherein the hydroxylamine, said alkanolamine, and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Claim 9
Dependent Claim
86 words
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of a chelating agent having a formula of ##STR8## wherein R 1 , R 2 , R 3 and R 4 ═H or NH 4 , or the ammonium salt of said compound, and a balance of water wherein the hydroxylamine, said alkanolamine, and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Claim 10
Dependent Claim
30 words
A composition according to either of claim 1, 2, 3, 4, or 5 wherein the alkanol group of said at least one alkanolamine contains from 1 to 5 carbon atoms.
Claim 11
Dependent Claim
31 words
A composition according to either of claim 1, 2, 3, 4, or 5 wherein said at least one alkanolamine is selected from a group consisting essentially of monoamines, diamines, and triamines.
Claim 12
Dependent Claim
64 words
A composition according to either of claim 1, 2, 3, 4, or 5 wherein said at least one alkanolamine has the formula R 1 R 2 --N--CH 2 CH 2 --O--R 3 wherein R 1 and R 2 can be H, CH 3 , CH 3 CH 2 , or CH 2 CH 2 OH and R 3 is CH 2 CH 2 OH.
References Cited (Backward Citations)
US3160539A
Cited
GB1144481A
Cited
US3649395A
Cited
US3972839A
Cited
US4111767A
Cited
US4155866A
Cited
US4187140A
Cited
US4238275A
Cited
US4279870A
Cited
US4268406A
Cited
US4699868A
Cited
GB2157670A
Cited
US4732887A
Cited
US4786578A
Cited
US4929301A
Cited
US5022926A
Cited
US4941941A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-08-01 | 1998-01-31 | 1998-08-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-08-01 | 2002-01-31 | 2002-08-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-08-01 | 2006-01-31 | 2006-08-02 | $7700.00 | Window Closed / Lapsed |