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US5486280A
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Process for applying control variables having fractal structures
Assignee: Lockheed Martin Energy Systems Inc
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Filing: 1994-10-20
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Granted: 1996-01-23
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Expires: 2014-10-20
Abstract
Abstract A process and apparatus for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform.
Inventors
- 👤 Jonathan S. Bullock, IV
- 👤 Roger L. Lawson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 19:10
CPC Classifications
C; C25; C25D; C25D5/00; C25D5/18; C25D1/00; C25D5/60; C25D5/605; B; B33; B33Y; B33Y80/00; Y; Y10; Y10S; Y10S204/00; Y10S204/09
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
76 words
A process for applying a fractal pulsed-current waveform across a substrate and an electrode located in an electrolyte to cause the deposition of a material on the substrate, comprising the steps of: applying a first pulsed-current waveform to cause the deposition of the material onto the substrate; applying a second pulsed-current waveform to cause the deposition of the material onto the substrate; the first pulsed-current waveform and the second pulsed-current waveform forming a fractal pulsed-current waveform.
Claim 2
Dependent Claim
76 words
A process for applying a fractal pulsed-current waveform across a substrate and an electrode located in an electrolyte to cause the deposition of a material on the substrate, comprising the steps of: applying a first pulsed-current waveform to cause the deposition of the material onto the substrate; applying a second pulsed-current waveform to cause the deposition of the material onto the substrate; the first pulsed-current waveform and the second pulsed-current waveform forming a fractal pulsed-current waveform.
Claim 3
Dependent Claim
23 words
The process according to claim 1, wherein the first pulsed-current waveform comprises a series of cathodic pulses followed by a first anodic pulsed-current.
Claim 4
Dependent Claim
34 words
The process according to claim 2, wherein the second pulsed-current waveform comprises the first pulsed-current waveform repeated a predetermined number of times followed by a second anodic pulsed-current distinct from the first anodic pulsed-current.
Claim 5
Dependent Claim
20 words
The process according to claim 3, wherein the second anodic pulsed-current has a longer duration than the first anodic pulsed-current.
Claim 6
Dependent Claim
18 words
The process according to claim 2, wherein the first pulsed-current waveform is repeated a predetermined number of times.
Claim 7
Dependent Claim
28 words
The process according to claim 5, wherein the second pulsed-current waveform comprises the first pulsed-current waveform repeated a predetermined number of times followed by a second anodic pulsed-current.
Claim 8
Dependent Claim
20 words
The process according to claim 6, wherein the second anodic pulsed-current has a longer duration than the first anodic pulsed-current.
Claim 9
Dependent Claim
34 words
The process according to claim 1, wherein the second pulsed-current waveform comprises the first pulsed-current waveform repeated a predetermined number of times followed by a secondary pulsed-current waveform distinct from the first pulsed-current waveform.
Claim 10
Dependent Claim
25 words
The process according to claim 1, further comprising the step of applying successive pulsed-current waveforms to cause the deposition of the material onto the substrate.
Claim 11
Dependent Claim
72 words
A process for electroforming, comprising the steps of: applying a pulsed-current waveform across a substrate and an electrode located in an electrolyte to cause the deposition of a material on a surface of the substrate; the pulsed-current waveform having a fractal waveform selected to achieve a desired characteristic of the material deposited on the surface of the substrate, wherein the fractal waveform comprises a first pulsed-current waveform and a second pulsed-current waveform.
Claim 12
Dependent Claim
72 words
A process for electroforming, comprising the steps of: applying a pulsed-current waveform across a substrate and an electrode located in an electrolyte to cause the deposition of a material on a surface of the substrate; the pulsed-current waveform having a fractal waveform selected to achieve a desired characteristic of the material deposited on the surface of the substrate, wherein the fractal waveform comprises a first pulsed-current waveform and a second pulsed-current waveform.
Claim 13
Dependent Claim
23 words
The process according to claim 5, wherein the first pulsed-current waveform comprises a series of cathodic pulses followed by a first anodic pulsed-current.
Claim 14
Dependent Claim
35 words
The process according to claim 11, wherein the second pulsed-current waveform comprises the first pulsed-current waveform repeated a predetermined number of times followed by a second anodic pulsed-current distinct from the first anodic pulsed current.
Claim 15
Dependent Claim
20 words
The process according to claim 12, wherein the second anodic pulsed-current has a longer duration than the first anodic pulsed-current.
Claim 16
Dependent Claim
18 words
The process according to claim 11, wherein the first pulsed-current waveform is repeated a predetermined number of times.
Claim 17
Dependent Claim
28 words
The process according to claim 14, wherein the second pulsed-current waveform comprises the first pulsed-current waveform repeated a predetermined number of times followed by a second anodic pulsed-current.
Claim 18
Dependent Claim
20 words
The process according to claim 15, wherein the second anodic pulsed-current has a longer duration than the first anodic pulsed-current.
Claim 19
Dependent Claim
34 words
The process according to claim 10, wherein the second pulsed-current waveform comprises the first pulsed-current waveform repeated a predetermined number of times followed by a secondary pulsed-current waveform distinct from the first pulsed-current waveform.
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