Plastic package type semiconductor device having a rolled metal substrate

Claim 2

A semiconductor device comprising a rolled metal substrate made of metal selected from the group consisting of copper and a copper alloy composed of copper as a matrix and at least one other element in an amount of 50 wt % or less, wherein the surface of said metal substrate has a roughness of Rmax≧0.1 micron, an insulating film provided on a portion of the top surface of said metal substrate leaving a portion of the metal substrate exposed, which insulating film has a thickness of from 3 microns to 10 microns inclusive, wherein said insulating film is made by the plasma CDV method, a semiconductor element mounted on one of said insulating film and an exposed surface of said metal substrate, and at least one of signal film wirings and power film wirings, and passive elements selected from the group consisting of a film resistor and a film capacitor, mounted on said insulating film, said insulating film selected from the group consisting of (1) a single-layer film made of a mixture of silicon oxide and silicon nitride and (2) a multi-layered film having two or more layers laminated one on another and comprising (a) a silicon oxide layer and at least one of (b) a layer made of a mixture of silicon oxide and silicon nitride and (c) a silicon nitride layer, said insulating film having a nitrogen to silicon content of 0.3 to 0.8 and wherein the insulating film has an intrinsic stress measured as a comprehensive or tensile stress of not more than 8×10 9 dyne/cm 2 .

Claim 3

A semiconductor device as claimed in claim 1, wherein said insulating film contains hydrogen, the amount of said hydrogen satisfying at least one of the following formulas (1) and (2) in terms of the absorption peak by infrared absorption spectrum, 0.001≦I11/IM1≦0.3 (1) 0.01≦I21/IM1≦1.5 (2) wherein, IM1=max (IO1, IN1), greater one of IO1 and IN1: I11: maximum absorption height by Si--H bond in a wave number range of 2150-2350 cm -1 I21: maximum absorption height by Si--OH bond in a wave number range of 860-980 cm -1 IO1: maximum absorption height by Si--O bond in a wave number range of 1020-1200 cm -1 IN1: maximum absorption height by Si--N bond in a wave number range of 840-920 cm -1 .

Claim 4

A semiconductor device as claimed in claim 1, wherein the intrinsic stress that occurs while forming the film is a compressive stress of 8×10 9 dyne/cm 2 or less or a tensile stress of 3×10 9 dyne/cm 2 or less.

Claim 5

A semiconductor device as claimed in claim 1, wherein the entire surface of said metal substrate is polished with a mechanical or electrical means.

Claim 6

A semiconductor device as claimed in claim 1, wherein said insulating film contains at least one element selected from a group consisting of F, C, B, S, P, Al, Se, As, Ge, Ga, Zn, Te, Sb, Sn and In, the content thereof being 10% or less in terms of the atomic ratio to Si.

Claim 7

A semiconductor device as claimed in claim 1, wherein said insulating film has a moisture-resistant protective film made of non-conductive carbon, SiC, Al 2 O 3 , Zr 2 O, AlN, or Bn or a composite thereof at least an uppermost layer and a lowermost layer.

Claim 8

A semiconductor device comprising a rolled metal substrate made of a metal selected from the group consisting of copper and a copper alloy composed of copper as a matrix and at least one other element in an amount of 50 wt % or less, wherein the surface of said metal substrate has a roughness of Rmax≧0.1 micron, an insulating film provided on a portion of the top surface of said metal substrate leaving a portion of the metal substrate exposed, which insulating film has a thickness of from 3 microns to 10 microns inclusive, wherein said insulating film is made by the plasma CVD method, a semiconductor element mounted on one of said insulating film and on an exposed surface of said metal substrate, and at least one of signal film wiring and power film wirings, and passive elements selected from the group consisting of film resistors and film capacitors, mounted on said insulating film, said insulating film having at least two layers laminated one on another and comprising (a) a silicon oxide layer and (b) a layer made of a mixture of silicon oxide and silicon nitride, the nitrogen content of the latter layer continuously increasing or decreasing in the direction of thickness of said film so that the highest nitrogen content will be 0.3 or more in terms of atomic ratio to silicon.

Claim 9

A semiconductor device comprising a rolled metal substrate made of a metal selected from the group consisting of copper and a copper alloy composed of copper as a matrix and at least one other element in an amount of 50 wt % or less, wherein the surface of said metal substrate has a roughness of Rmax≧0.1 micron, an insulating film provided on a portion of the top surface of said metal substrate leaving a portion of the metal substrate exposed, which insulating film has a thickness of from 3 microns to 10 microns inclusive, wherein said insulating film is made by the plasma CVD method, a semiconductor element mounted on one of said insulating film and on an exposed surface of said metal substrate, and at least one of signal film wiring and power film wirings, and passive elements selected from the group consisting of film resistors and film capacitors, mounted on said insulating film, said insulating film having at least two layers laminated one on another and comprising (a) a silicon oxide layer and (b) a layer made of a mixture of silicon oxide and silicon nitride, the nitrogen content of the latter layer continuously increasing or decreasing in the direction of thickness of said film so that the highest nitrogen content will be 0.3 or more in terms of atomic ratio to silicon.

Claim 10

A semiconductor device as claimed in claim 7, wherein said insulating film contains hydrogen in an amount satisfying at least one of the following formulas (5) and (6) at the absorption peak by infrared absorption spectrum, 0.001≦I13/IM3≦0.3 (5) 0.01≦I23/IM3≦1.5 (6) wherein, IM3=max (IO3, IN3), greater one of IO3 and IN3: I13: maximum absorption height by Si--H bond in a wave number of 2150-2350 cm -1 I23: maximum absorption height by Si--OH bond in a wave number range of 860-980 cm -1 IO3: maximum absorption height by Si--O bond in a wave number range of 1020-1200 cm -1 IN3: maximum absorption height by Si--N bond in a wave number range of 840-920 cm -1 .

Claim 11

A semiconductor device comprising a rolled metal substrate made of metal selected from the group consisting of copper and a copper alloy composed of copper as a matrix and at least one other element in an amount of 50 wt % or less, wherein the surface of said metal substrate has a roughness of Rmax≧0.1 micron, one of a single-layer metal film and a multilayer metal film on a portion of the top surface of said metal substrate leaving a portion of the metal substrate exposed, which metal film is made of at least one element selected from the group consisting of Ni, Cr, Al, Ti, Au, Pt and Ag or a multi-layered film thereof or an alloy film made of at least two elements selected from said group, an insulating film provided on the top surface of said metal film and having a thickness of from 3 microns to 10 microns inclusive, wherein said insulating film is made by the plasma CVD method, a semiconductor element mounted on one of said insulating film and an exposed surface of said metal substrate, and at least one of signal film wirings, power film wirings, and passive elements selected from the group consisting of a film resistor and a film capacitor, mounted on said insulating film, said insulating film selected from the group consisting of (1) a single-layer film made of a mixture of silicon oxide and silicon nitride and (2) a multi-layered film having two or more layers laminated one on another and comprising (a) a silicon oxide layer and at least one of (b) a layer made of a mixture of silicon oxide and silicon nitride and (c) a silicon nitride layer, said insulating film having a nitrogen to silicon content of 0.3 to 0.8 and wherein the insulating film has an intrinsic stress measured as a compressive or tensile stress of not more than 8×10 9 dyne/cm 2 .

Claim 12

A semiconductor device comprising a rolled metal substrate made of metal selected from the group consisting of copper and a copper alloy composed of copper as a matrix and at least one other element in an amount of 50 wt % or less, wherein the surface of said metal substrate has a roughness of Rmax≧0.1 micron, one of a single-layer metal film and a multilayer metal film on a portion of the top surface of said metal substrate leaving a portion of the metal substrate exposed, which metal film is made of at least one element selected from the group consisting of Ni, Cr, Al, Ti, Au, Pt and Ag or a multi-layered film thereof or an alloy film made of at least two elements selected from said group, an insulating film provided on the top surface of said metal film and having a thickness of from 3 microns to 10 microns inclusive, wherein said insulating film is made by the plasma CVD method, a semiconductor element mounted on one of said insulating film and an exposed surface of said metal substrate, and at least one of signal film wirings, power film wirings, and passive elements selected from the group consisting of a film resistor and a film capacitor, mounted on said insulating film, said insulating film selected from the group consisting of (1) a single-layer film made of a mixture of silicon oxide and silicon nitride and (2) a multi-layered film having two or more layers laminated one on another and comprising (a) a silicon oxide layer and at least one of (b) a layer made of a mixture of silicon oxide and silicon nitride and (c) a silicon nitride layer, said insulating film having a nitrogen to silicon content of 0.3 to 0.8 and wherein the insulating film has an intrinsic stress measured as a compressive or tensile stress of not more than 8×10 9 dyne/cm 2 .

Claim 13

A semiconductor device as claimed in claim 9, wherein said single-layer or multi-layered metal film has a thickness of 0.1-10 microns.