US5403695A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
Assignee: Toshiba Corp
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Filing: 1992-04-30
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Granted: 1995-04-04
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Expires: 2012-04-30
Abstract
Abstract Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.
Inventors
- 👤 Rumiko Hayase
- 👤 Yasunobu Onishi
- 👤 Hirokazu Niki
- 👤 Naohiko Oyasato
- 👤 Yoshihito Kobayashi
- 👤 Shuzi Hayase
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 20:15
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/039; G03F7/0392; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/111; Y10S430/146
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
66 words
A resist for forming patterns, comprising in admixture: (a) an acid-generating compound which generates an acid when exposed to ultraviolet rays or ionizing radiation; and (b) a compound which has an acid decomposable substituent group and which is represented by the following formula (I): ##STR73## where m and n are each a positive number, and where m and n have a relationship of: n/(m+n)=0.17 to 0.60.
Claim 2
Dependent Claim
66 words
A resist for forming patterns, comprising in admixture: (a) an acid-generating compound which generates an acid when exposed to ultraviolet rays or ionizing radiation; and (b) a compound which has an acid decomposable substituent group and which is represented by the following formula (I): ##STR73## where m and n are each a positive number, and where m and n have a relationship of: n/(m+n)=0.17 to 0.60.
Claim 3
Dependent Claim
89 words
A resist for forming patterns, comprising in admixture: (a) a compound having an acid decomposable substituent group and which is represented by the following formula (I): ##STR74## where m and n are each a positive number, and where m and n have a relationship of: n/(m+n)=0.17 to 0.60; (b1) a first acid-generating compound which generates a strong acid when exposed to ultraviolet rays or ionizing radiation; and (b2) a second acid-generating compound which generates an acid weaker than said strong acid, when exposed to ultraviolet rays or ionizing radiation.
Claim 4
Dependent Claim
89 words
A resist for forming patterns, comprising in admixture: (a) a compound having an acid decomposable substituent group and which is represented by the following formula (I): ##STR74## where m and n are each a positive number, and where m and n have a relationship of: n/(m+n)=0.17 to 0.60; (b1) a first acid-generating compound which generates a strong acid when exposed to ultraviolet rays or ionizing radiation; and (b2) a second acid-generating compound which generates an acid weaker than said strong acid, when exposed to ultraviolet rays or ionizing radiation.
Claim 5
Dependent Claim
14 words
The resist according to claim 1, wherein said acid-generating compound is an o-quinonediazide compound.
Claim 6
Dependent Claim
13 words
The resist according to claim 3, wherein said o-quinonediazide compound is 1-naphthoquinone-2-diazo-4-ester sulfonate.
Claim 7
Dependent Claim
33 words
The resist according to claim 1, wherein said acid-generating compound is used in an amount of 0.1 to 30 wt %, based on the total weight of the solid components of the resist.
Claim 8
Dependent Claim
11 words
The resist according to claim 1, further comprising a carboxylic acid.
Claim 9
Dependent Claim
33 words
The resist according to claim 6, wherein said carboxylic acid is used in an amount of 0.5 to 20 wt %, based on the total weight of the solid components of the resist.
Claim 10
Dependent Claim
11 words
The resist according to claim 1, further comprising an alkali-soluble polymer.
Claim 11
Dependent Claim
39 words
The resist according to claim 8, wherein said alkali-soluble polymer is used in an amount of 90 parts by weight or less, where the total amount of said acid-decomposable compound and said alkali-soluble polymer is 100 parts by weight.
Claim 12
Dependent Claim
15 words
The resist according to claim 2, wherein said first acid-generating compound is an o-quinonediazide compound.
Claim 13
Dependent Claim
13 words
The resist according to claim 10, wherein said o-quinonediazide compound is 1-naphthoquinone-2-diazo-4-ester sulfonate.
Claim 14
Dependent Claim
34 words
The resist according to claim 2, wherein said first acid-generating compound is used in an amount of 0.1 to 30 wt %, based on the total weight of the solid components of the resist.
Claim 15
Dependent Claim
30 words
The resist according claim 2, wherein said second acid-generating compound is one selected from the group consisting of 1,2-naphtoquinonediazide-5-ester sulfonate, 5-diazo meldrum's acid, any derivative thereof, and a diazodimedone derivative.
Claim 16
Dependent Claim
34 words
The resist according to claim 2, wherein said second acid-generating compound is used in an amount of 1 to 30 wt %, based on the total weight of the solid components of the resist.
Claim 17
Dependent Claim
11 words
The resist according to claim 2, further comprising an alkali-soluble polymer.
Claim 18
Dependent Claim
39 words
The resist according to claim 15, wherein said alkali-soluble polymer is used in an amount of 90 parts by weight or less, where the total amount of said acid-decomposable compound and said alkali-soluble polymer is 100 parts by weight.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-04-03 | 1998-10-03 | 1999-04-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-04-03 | 2002-10-03 | 2003-04-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-04-03 | 2006-10-03 | 2007-04-04 | $7700.00 | Window Closed / Lapsed |