Atmospheric pressure CVD process for preparing fluorine-doped tungsten oxide films

Claim 2

A process for providing fluorine-doped tungsten oxide on the surface of a substrate, which process comprises reacting together a tungsten alkoxide, an oxygen-containing compound, and a fluorine-containing compound at the surface of the substrate at a temperature and for a time sufficient to form a film of fluorine-doped tungsten oxide on the substrate.

Claim 3

The process according to claim 1, wherein the tungsten alkoxide is selected from the group consisting of tungsten V ethoxide and tungsten VI ethoxide.

Claim 4

The process according to claim 1, wherein the oxygen-containing compound is oxygen gas.

Claim 5

The process according to claim 3, wherein the oxygen gas is mixed with another oxygen-containing compound selected from the group consisting of isopropyl alcohol, ethyl alcohol and t-butyl alcohol.

Claim 6

The process according to claim 1, wherein the fluorine-containing compound is 1,1-difluoroethane.

Claim 7

The process according to claim 1, wherein the temperature is from about 300° C. to about 500° C.

Claim 8

The process according to claim 1, wherein the molar ratio of tungsten alkoxide to oxygen-containing compound is from about 2:1 to about 1:5.

Claim 9

The process according to claim 1, wherein the fluorine-containing compound comprises from about 1% to about 50% by weight of the reaction mixture.

Claim 10

The process according to claim 1, wherein the tungsten alkoxide is selected from the group consisting of tungsten V ethoxide and tungsten VI ethoxide; the oxygen-containing compound is selected from the group consisting of oxygen, isopropyl alcohol, ethyl alcohol, and t-butyl alcohol, and mixtures thereof; and the fluorine-containing compound is 1,1-difluoroethane, the molar ratio of tungsten alkoxide to oxygen-containing compound being from about 2:1 to about 1:3 the 1,1-difluoroethane being from about 5% to about 30% by weight of the reaction mixture, and the temperature is from about 300° C. to about 500° C.

Claim 11

The process according to claim 1, wherein the substrate is glass.

Claim 12

A process for coating glass, comprising the steps of: A) providing a glass substrate, having a surface; and B) reacting at the surface of the substrate tungsten alkoxide, an oxygen-containing compound, and a fluorine-containing compound, at a temperature and for a time sufficient to form a layer of fluorine-doped tungsten oxide on the surface of the glass substrate.

Claim 13

A process for coating glass, comprising the steps of: A) providing a glass substrate, having a surface; and B) reacting at the surface of the substrate tungsten alkoxide, an oxygen-containing compound, and a fluorine-containing compound, at a temperature and for a time sufficient to form a layer of fluorine-doped tungsten oxide on the surface of the glass substrate.

Claim 14

A process according to claim 11, wherein said tungsten alkoxide is selected from tungsten V ethoxide and tungsten VI ethoxide.

Claim 15

A process for coating glass according to claim 11, wherein the oxygen-containing compound is selected from the group consisting of oxygen, isopropyl alcohol and t-butyl alcohol, and mixtures thereof.

Claim 16

The process for coating glass according to claim 11, wherein the fluorine-containing compound is 1,1-difluoroethane.

Claim 17

The process for coating glass according to claim 11, wherein the temperature is from about 300° C. to about 500° C.

Claim 18

The process for coating glass according to claim 11, wherein the molar ratio of tungsten alkoxide to oxygen-containing compound is from about 2:1 to about 1:5.

Claim 19

The process for coating glass according to claim 11, wherein the fluorine-containing compound comprises from about 1% to about 50% by weight of the reaction mixture.

Claim 20

A process for preparing a blue tinted, electrically conductive, infrared radiation reflecting coated glazing for automotive or architectural use, comprising the steps of: A) providing a glass substrate, having a surface; and B) reacting at the surface of the substrate tungsten alkoxide selected from the group consisting of tungsten V ethoxide or tungsten VI ethoxide; an oxygen-containing compound selected from the group consisting of oxygen, isopropyl alcohol, ethyl alcohol, and t-butyl alcohol, and mixtures thereof; and 1,1-difluoroethane; the molar ratio of tungsten alkoxide to oxygen-containing compound being from about 1:1 to about 1:3, the 1,1-difluoroethane being from about 5% to about 30% by weight of the reaction mixture, at a temperature from about 300° C. to about 500° C. and for a time sufficient to form a layer of fluorine-doped tungsten oxide on the surface of the glass substrate.

Claim 21

A process for preparing a blue tinted, electrically conductive, infrared radiation reflecting coated glazing for automotive or architectural use, comprising the steps of: A) providing a glass substrate, having a surface; and B) reacting at the surface of the substrate tungsten alkoxide selected from the group consisting of tungsten V ethoxide or tungsten VI ethoxide; an oxygen-containing compound selected from the group consisting of oxygen, isopropyl alcohol, ethyl alcohol, and t-butyl alcohol, and mixtures thereof; and 1,1-difluoroethane; the molar ratio of tungsten alkoxide to oxygen-containing compound being from about 1:1 to about 1:3, the 1,1-difluoroethane being from about 5% to about 30% by weight of the reaction mixture, at a temperature from about 300° C. to about 500° C. and for a time sufficient to form a layer of fluorine-doped tungsten oxide on the surface of the glass substrate.

Claim 22

A process for incorporating fluorine atoms into tungsten oxide, as the tungsten oxide is being formed by a reaction between tungsten alkoxide and an oxygen-containing compound, comprising reacting with the tungsten alkoxide and the oxygen-containing compound a fluorine-containing compound selected from the group consisting of 1,1-difluoroethane, 1,1,1-chlorodifluoroethane, 1,1-difluoroethylene, chlorotrifluoroethylene, carbonyl fluoride, sulfur hexafluoride, nitrogen trifluoride, trifluoroacetic acid, bromotrifluoromethane, trifluoroacetic anhydride, ethyl trifluoroacetoacetate, trifluoroethanol, ethyl trifluoroacetate, pentafluoropropionic acid, heptafluorobutyryle chloride, 1,1,1-trifluoroacetylacetone, Freon, 2-chloro-1,1,2-trifluoroethylmethyl ether, chlorodifluoroacetic acid, difluoroacetic acid, ethyl chlorofluoroacetate, methyl trifluoroacetate, ethyl-4,4,4-trifluoroacetoacetate, hydrofluoric acid, as well as mixtures and derivatives thereof, to form fluorine-doped tungsten oxide.

Claim 23

A process for incorporating fluorine atoms into tungsten oxide, as the tungsten oxide is being formed by a reaction between tungsten alkoxide and an oxygen-containing compound, comprising reacting with the tungsten alkoxide and the oxygen-containing compound a fluorine-containing compound selected from the group consisting of 1,1-difluoroethane, 1,1,1-chlorodifluoroethane, 1,1-difluoroethylene, chlorotrifluoroethylene, carbonyl fluoride, sulfur hexafluoride, nitrogen trifluoride, trifluoroacetic acid, bromotrifluoromethane, trifluoroacetic anhydride, ethyl trifluoroacetoacetate, trifluoroethanol, ethyl trifluoroacetate, pentafluoropropionic acid, heptafluorobutyryle chloride, 1,1,1-trifluoroacetylacetone, Freon, 2-chloro-1,1,2-trifluoroethylmethyl ether, chlorodifluoroacetic acid, difluoroacetic acid, ethyl chlorofluoroacetate, methyl trifluoroacetate, ethyl-4,4,4-trifluoroacetoacetate, hydrofluoric acid, as well as mixtures and derivatives thereof, to form fluorine-doped tungsten oxide.