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US5383354A
Expired / Lapsed
US
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Process for measuring surface topography using atomic force microscopy
Assignee: Apple Inc
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Filing: 1993-12-27
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Granted: 1995-01-24
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Expires: 2013-12-27
Abstract
Abstract Accuracy and repeatability of atomic force microscopy (AFM) are improved by coating a single crystal silicon probe tip with a layer of carbon. The carbon-coated probe tip is brought into contact with a specimen surface, and is scanned across the area of interest. The carbon coating improves the interaction between the probe tip and specimen surface, particularly insulating surfaces, by reducing probe tip damage and minimizing charge build-up.
Inventors
- 👤 Bruce B. Doris
- 👤 Rama I. Hegde
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 10:45
CPC Classifications
G; G01; G01Q; G01Q60/00; G01Q60/24; G01Q60/38; G01Q60/40; Y; Y10; Y10S; Y10S977/00; Y10S977/84; Y10S977/849; Y10S977/85; Y10S977/851; Y10S977/855; Y10S977/857; Y10S977/86; Y10S977/863; Y10S977/875; Y10S977/877; Y10S977/88; Y10S977/881
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
90 words
A process for measuring surface topography using atomic force microscopy, comprising the steps of: providing a specimen having a surface; providing an atomic force microscopy probe having a probe tip, wherein the probe tip is externally coated with a film of carbon; bringing the carbon coated probe tip into contact with the surface of the specimen; and scanning the surface with the carbon coated probe tip to generate an image of the surface topography, wherein the probe tip intentionally contacts the surface of the specimen during the step of scanning.
Claim 2
Dependent Claim
90 words
A process for measuring surface topography using atomic force microscopy, comprising the steps of: providing a specimen having a surface; providing an atomic force microscopy probe having a probe tip, wherein the probe tip is externally coated with a film of carbon; bringing the carbon coated probe tip into contact with the surface of the specimen; and scanning the surface with the carbon coated probe tip to generate an image of the surface topography, wherein the probe tip intentionally contacts the surface of the specimen during the step of scanning.
Claim 3
Dependent Claim
18 words
The process of claim 1 wherein the step of providing a probe comprises providing a silicon probe tip.
Claim 4
Dependent Claim
19 words
The process of claim 1 wherein the step of providing a probe comprises providing a silicon nitride probe tip.
Claim 5
Dependent Claim
27 words
The process of claim 1 wherein the step of providing a probe comprises providing a probe tip wherein the carbon film is between approximately 100-3000 angstroms thick.
Claim 6
Dependent Claim
17 words
The process of claim 1 wherein the step of providing a specimen comprises providing a silicon substrate.
Claim 7
Dependent Claim
26 words
The process of claim 1 wherein the step of providing a specimen comprises providing a specimen having an insulating surface as the surface to be measured.
Claim 8
Dependent Claim
25 words
The process of claim 6 wherein the step of providing a specimen comprises providing a specimen wherein the insulating surface is a surface comprising silicon.
Claim 9
Dependent Claim
27 words
The process of claim 1 wherein the step of scanning the surface further comprises simultaneously tapping the probe tip into and out of contact with the surface.
Claim 10
Dependent Claim
24 words
The process of claim 1 wherein the step of scanning the surface comprises continuously pressing the probe tip against the specimen surface during scanning.
Claim 11
Dependent Claim
30 words
The process of claim 1 wherein the step of providing a specimen comprises providing a specimen wherein the surface has a root mean square roughness of less than 50 angstroms.
Claim 12
Dependent Claim
121 words
A process for measuring surface topography using atomic force microscopy, comprising the steps of: providing a semiconductor substrate having an overlying layer of material, wherein the layer of material has a surface; providing an atomic force microscopy probe having a probe tip with carbon coating; contacting the surface of the layer of material with the probe tip such that the carbon coating is directly in contact with the surface of the layer of material; and scanning the surface of the layer of material with the probe tip in contact with the surface to create an image of the surface topography of the layer of material, wherein the probe tip intentionally contacts the surface of the specimen during the step of scanning.
Claim 13
Dependent Claim
121 words
A process for measuring surface topography using atomic force microscopy, comprising the steps of: providing a semiconductor substrate having an overlying layer of material, wherein the layer of material has a surface; providing an atomic force microscopy probe having a probe tip with carbon coating; contacting the surface of the layer of material with the probe tip such that the carbon coating is directly in contact with the surface of the layer of material; and scanning the surface of the layer of material with the probe tip in contact with the surface to create an image of the surface topography of the layer of material, wherein the probe tip intentionally contacts the surface of the specimen during the step of scanning.
Claim 14
Dependent Claim
28 words
The process of claim 11 wherein the step of providing a semiconductor substrate comprises providing a semiconductor substrate wherein the overlying layer of material is an insulating layer.
Claim 15
Dependent Claim
33 words
The process of claim 12 wherein the step of providing a semiconductor substrate comprises providing a semiconductor substrate having an overlying layer of material having a thickness of less than approximately 150 angstroms.
Claim 16
Dependent Claim
37 words
The process of claim 11 wherein the step of providing a semiconductor substrate comprises providing a semiconductor substrate wherein the surface of the layer of material has a root mean square roughness of less than 50 angstroms.
Claim 17
Dependent Claim
64 words
The process of claim 11 wherein the step of providing a semiconductor substrate comprises providing a plurality of semiconductor wafers each having a critical dimension, and further comprising the steps of selecting a wafer from the plurality of wafers and measuring the critical dimension of the selected wafer using the carbon coated probe tip to monitor the critical dimensions of the plurality of wafers.
Claim 18
Dependent Claim
38 words
The process of claim 11 wherein the step of scanning comprises scanning the surface of the layer of material while repeatedly bringing the probe tip into and out of contact with the surface of the layer of material.
Claim 19
Dependent Claim
21 words
The process of claim 16 wherein the step of providing a probe comprises providing a probe having a silicon probe tip.
Claim 20
Dependent Claim
21 words
The process of claim 11 wherein the step of providing a probe comprises providing a probe having a silicon probe tip.
Claim 21
Dependent Claim
22 words
The process of claim 11 wherein the step of providing a probe comprises providing a probe having a silicon nitride probe tip.
Claim 22
Dependent Claim
91 words
A process for measuring surface topography using atomic force microscopy, comprising the steps of: providing a specimen having a surface; providing an atomic force microscopy system having a cantilever probe with a probe tip formed near an end of the cantilever probe; coating the probe tip with carbon; bringing the carbon coated probe tip into contact with the surface of the specimen; scanning the surface with the probe tip; and detecting the deflection of the cantilever probe as the surface is scanned to generate a representative image of the surface topography.
Claim 23
Dependent Claim
91 words
A process for measuring surface topography using atomic force microscopy, comprising the steps of: providing a specimen having a surface; providing an atomic force microscopy system having a cantilever probe with a probe tip formed near an end of the cantilever probe; coating the probe tip with carbon; bringing the carbon coated probe tip into contact with the surface of the specimen; scanning the surface with the probe tip; and detecting the deflection of the cantilever probe as the surface is scanned to generate a representative image of the surface topography.
Claim 24
Dependent Claim
20 words
The process of claim 20 wherein the step of coating comprises evaporating a layer of carbon on the probe tip.
Claim 25
Dependent Claim
30 words
The process of claim 20 wherein the step of coating comprises coating the probe tip with a layer of carbon having a thickness approximately in the range of 100-3000 angstroms.
Claim 26
Dependent Claim
19 words
The process of claim 20 wherein the step of providing a probe tip comprises providing a silicon probe tip.
Claim 27
Dependent Claim
27 words
The process of claim 20 further comprising the step of tapping the probe tip against the surface of the layer of material during the step of scanning.
Claim 28
Dependent Claim
22 words
The process of claim 20 the step of providing a specimen comprises providing a specimen wherein the surface is an insulating surface.
Claim 29
Dependent Claim
16 words
The process of claim 20 the step of providing a specimen comprises providing a semiconductor substrate.
Claim 30
Dependent Claim
30 words
The process of claim 20 wherein the step of providing a specimen comprises providing a specimen wherein the surface has a root mean square roughness of less than 50 angstroms.
Claim 31
Dependent Claim
27 words
The process of claim 20 further comprising the step of coating the cantilever probe with carbon simultaneously with the step of coating the probe tip with carbon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-01-23 | 1998-07-25 | 1999-01-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-23 | 2002-07-25 | 2003-01-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-23 | 2006-07-25 | 2007-01-24 | $7700.00 | Window Closed / Lapsed |