Semiconductor laser device, and a method for producing a compound semiconductor device including the semiconductor laser device

Claim 1

A method for producing a compound semiconductor device comprising the steps of: forming on a GaAs substrate an (Al Y Ga 1-Y ) 0 .5 In 0 .5 P crystal layer (0≦Y≦1) which lattice-matches with the GaAs substrate; radiating As molecular beams on the surface of the crystal layer while heating the layered substrate to a temperature at which In in the crystal layer evaporates so as to change the surface of the crystal layer to an Al Y Ga 1-Y As crystal layer (0≦Y≦1) of a thickness of several molecules; and forming a AlXGa 1-X As crystal layer (0≦X≦1) on the Al Y Ga 1-Y As crystal layer.

Claim 2

A method for producing a compound semiconductor device comprising the steps of: forming on a GaAs substrate an (Al Y Ga 1-Y ) 0 .5 In 0 .5 P crystal layer (0≦Y≦1) which lattice-matches with the GaAs substrate; radiating As molecular beams on the surface of the crystal layer while heating the layered substrate to a temperature at which In in the crystal layer evaporates so as to change the surface of the crystal layer to an Al Y Ga 1-Y As crystal layer (0≦Y≦1) of a thickness of several molecules; and forming a AlXGa 1-X As crystal layer (0≦X≦1) on the Al Y Ga 1-Y As crystal layer.

Claim 6

A method for producing a semiconductor laser device comprising the steps of: forming a double hereto structure composed of AlGaInP crystals on a GaAs substrate, forming an (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer (0≦X≦1) on the double hereto structure, the etching stop layer having a band gap energy greater than an optical energy generated within the double hereto structure, forming a GaAs optical absorption layer on the etching stop layer, forming a stripe groove extending through the GaAs optical absorption layer to reach the etching stop layer, radiating As molecular beams on the layered substrate in a MBE apparatus while heating the layered substrate to exceed a temperature at which In and P in the etching stop layer evaporate so as to change the exposed portion near the surface of the etching stop layer in the stripe groove into an Al X Ga 1-X As layer of a thickness of several molecules, and forming an AlGaAs layer on the Al X Ga 1-X As layer and the GaAs optical absorption layer in such a manner so as to fill up the stripe groove in the MBE apparatus, the AlGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 7

A method for producing a semiconductor laser device comprising the steps of: forming a double hereto structure composed of AlGaInP crystals on a GaAs substrate, forming an (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer (0≦X≦1) on the double hereto structure, the etching stop layer having a band gap energy greater than an optical energy generated within the double hereto structure, forming a GaAs optical absorption layer on the etching stop layer, forming a stripe groove extending through the GaAs optical absorption layer to reach the etching stop layer, radiating As molecular beams on the layered substrate in a MBE apparatus while heating the layered substrate to exceed a temperature at which In and P in the etching stop layer evaporate so as to change the exposed portion near the surface of the etching stop layer in the stripe groove into an Al X Ga 1-X As layer of a thickness of several molecules, and forming an AlGaAs layer on the Al X Ga 1-X As layer and the GaAs optical absorption layer in such a manner so as to fill up the stripe groove in the MBE apparatus, the AlGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 8

A method for producing a semiconductor laser device comprising the steps of: forming a double hereto structure composed of AlGaInP crystals on a GaAs substrate, forming an (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer (0≦X≦1) on the double hetero structure, the etching stop layer having a band gap energy greater than an optical energy generated within the double hereto structure, forming a GaAs optical absorption layer on the (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer, forming an (Al Y Ga 1-Y ) 0 .5 In 0 .5 P etching stop layer (0≦Y≦1) on the GaAs optical absorption layer, forming a stripe groove extending through the (Al Y Ga 1-Y ) 0 .5 In 0 .5 P etching stop layer and the GaAs optical absorption layer to reach the (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer, radiating As molecular beams on the layered substrate in a MBE apparatus while heating the layered substrate to exceed a temperature at which In and P in the etching stop layers evaporate so as to change the exposed portions near the surface of the etching stop layers into an Al X Ga 1-X As layer and an Al Y Ga 1-Y As layer of a thickness of several molecules, and forming an AlGaAs layer on the Al X Ga 1-X As layer and the Al Y Ga 1-Y As layer in such a manner so as to fill up the stripe groove in the MBE apparatus, the AlGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 9

A method for producing a semiconductor laser device comprising the steps of: forming a double hereto structure composed of AlGaInP crystals on a GaAs substrate, forming an (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer (0≦X≦1) on the double hetero structure, the etching stop layer having a band gap energy greater than an optical energy generated within the double hereto structure, forming a GaAs optical absorption layer on the (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer, forming an (Al Y Ga 1-Y ) 0 .5 In 0 .5 P etching stop layer (0≦Y≦1) on the GaAs optical absorption layer, forming a stripe groove extending through the (Al Y Ga 1-Y ) 0 .5 In 0 .5 P etching stop layer and the GaAs optical absorption layer to reach the (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer, radiating As molecular beams on the layered substrate in a MBE apparatus while heating the layered substrate to exceed a temperature at which In and P in the etching stop layers evaporate so as to change the exposed portions near the surface of the etching stop layers into an Al X Ga 1-X As layer and an Al Y Ga 1-Y As layer of a thickness of several molecules, and forming an AlGaAs layer on the Al X Ga 1-X As layer and the Al Y Ga 1-Y As layer in such a manner so as to fill up the stripe groove in the MBE apparatus, the AlGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 10

A method for producing a semiconductor laser device comprising the steps of: forming a double hetero structure composed of AlGaInP crystals on a GaAs substrate, forming an (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer (0≦X≦1) on the double hereto structure, the etching stop layer having a band gap energy greater than an optical energy generated within the double hereto structure, forming a GaAs optical absorption layer on the etching stop layer, forming a stripe groove on the GaAs optical absorption layer having a depth not to reach the etching stop layer, radiating As molecular beams on the multi-layered substrate in a MBE apparatus while heating the substrate to exceed a temperature at which GaAs in the GaAs layer remaining on the surface of the optical absorption layer evaporates so that the etching stop layer is exposed inside the stripe groove and the portion near the exposed surface of the etching layer is changed into an AlAs layer of a thickness of several molecules, and forming an AlgaAs layer on the AlAs layer and the GaAs optical absorption layer in such a manner so as to fill up the stripe groove in the MBE apparatus, the AlgaAs layer having a band GaP energy greater than an optical energy generated within the double hereto structure.

Claim 11

A method for producing a semiconductor laser device comprising the steps of: forming a double hetero structure composed of AlGaInP crystals on a GaAs substrate, forming an (Al X Ga 1-X ) 0 .5 In 0 .5 P etching stop layer (0≦X≦1) on the double hereto structure, the etching stop layer having a band gap energy greater than an optical energy generated within the double hereto structure, forming a GaAs optical absorption layer on the etching stop layer, forming a stripe groove on the GaAs optical absorption layer having a depth not to reach the etching stop layer, radiating As molecular beams on the multi-layered substrate in a MBE apparatus while heating the substrate to exceed a temperature at which GaAs in the GaAs layer remaining on the surface of the optical absorption layer evaporates so that the etching stop layer is exposed inside the stripe groove and the portion near the exposed surface of the etching layer is changed into an AlAs layer of a thickness of several molecules, and forming an AlgaAs layer on the AlAs layer and the GaAs optical absorption layer in such a manner so as to fill up the stripe groove in the MBE apparatus, the AlgaAs layer having a band GaP energy greater than an optical energy generated within the double hereto structure.

Claim 12

A method for producing a semiconductor laser device comprising the steps of: forming on a GaAs substrate a double hereto structure composed of AlGaInP crystal layers which lattice-matches the GaAs substrate, forming a GaInP etching stop layer on the double hereto structure, forming an optical absorption layer on the GaInP etching stop layer, radiating As molecular beams on the GaInP etching stop layer inside the stripe groove in a MBE apparatus while heating the layered substrate to a temperature at which In and P in the GaInP etching stop layer evaporate so as to change the portion near the surface of the GaInP etching stop layer on which the As molecular beams were radiated into a GaAs layer of a thickness of several molecules, and forming an AlGaAs layer on the GaAs layer and on the optical absorption layer in the MBE apparatus, the AsGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 13

A method for producing a semiconductor laser device comprising the steps of: forming on a GaAs substrate a double hereto structure composed of AlGaInP crystal layers which lattice-matches the GaAs substrate, forming a GaInP etching stop layer on the double hereto structure, forming an optical absorption layer on the GaInP etching stop layer, radiating As molecular beams on the GaInP etching stop layer inside the stripe groove in a MBE apparatus while heating the layered substrate to a temperature at which In and P in the GaInP etching stop layer evaporate so as to change the portion near the surface of the GaInP etching stop layer on which the As molecular beams were radiated into a GaAs layer of a thickness of several molecules, and forming an AlGaAs layer on the GaAs layer and on the optical absorption layer in the MBE apparatus, the AsGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 14

A method for producing a semiconductor laser device comprising the steps of: forming on a GaAs substrate a double hereto structure composed of AlGaInP crystal layers which lattice-matches the GaAs substrate, forming a first GaInP etching stop layer on the double hereto structure, forming an optical absorption layer on the first GaInP etching stop layer, forming a second GaInP etching stop layer on the optical absorption layer and a stripe groove by etching selectively the second GaInP etching stop layer and the optical absorption layer to reach the first GaInP etching stop layer, radiating As molecular beams on the first and second GaInP etching stop layers in a MBE apparatus while heating the layered substrate to a temperature at which In and P in the first and second GaInP etching stop layers evaporate so as to change the portion near the surface of each GaInP etching stop layer on which the As molecular beams were radiated into a GaAs layer of a thickness of several molecules, and forming an AlGaAs layer on the GaAs layer in the MBE apparatus, the AsGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.

Claim 15

A method for producing a semiconductor laser device comprising the steps of: forming on a GaAs substrate a double hereto structure composed of AlGaInP crystal layers which lattice-matches the GaAs substrate, forming a first GaInP etching stop layer on the double hereto structure, forming an optical absorption layer on the first GaInP etching stop layer, forming a second GaInP etching stop layer on the optical absorption layer and a stripe groove by etching selectively the second GaInP etching stop layer and the optical absorption layer to reach the first GaInP etching stop layer, radiating As molecular beams on the first and second GaInP etching stop layers in a MBE apparatus while heating the layered substrate to a temperature at which In and P in the first and second GaInP etching stop layers evaporate so as to change the portion near the surface of each GaInP etching stop layer on which the As molecular beams were radiated into a GaAs layer of a thickness of several molecules, and forming an AlGaAs layer on the GaAs layer in the MBE apparatus, the AsGaAs layer having a band gap energy greater than an optical energy generated within the double hereto structure.