US5322986A
Expired / Lapsed
US
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Methods for preparing polymer stripe waveguides and polymer stripe waveguides prepared thereby
Assignee: Eastman Kodak Co
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Filing: 1992-04-06
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Granted: 1994-06-21
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Expires: 2012-04-06
Abstract
Abstract A method for preparing a poled polymer stripe waveguide comprising preparing a polymer waveguide blank, electric field poling the polymer waveguide blank, and photoablating the outline of the stripe waveguide in the waveguide blank. The invention also provides a method for preparing passive polymer stripe waveguides and non-linear optical and passive waveguides produced by the methods of the invention.
Inventors
- 👤 Alan C. G. Nutt
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 13:42
CPC Classifications
G; G02; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/13
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
27 words
A method for preparing a polymer stripe waveguide comprising preparing a planar polymer waveguide blank and photoablating the outline of said stripe waveguide in said waveguide blank.
Claim 2
Independent Claim
27 words
A method for preparing a polymer stripe waveguide comprising preparing a planar polymer waveguide blank and photoablating the outline of said stripe waveguide in said waveguide blank.
Claim 3
Dependent Claim
12 words
The method of claim 1 further comprising poling said planar polymer waveguide.
Claim 4
Dependent Claim
32 words
The method of claim 1 wherein said photoablating further comprises disposing a shadow photomask between said waveguide blank and a laser beam source, and directing a collimated laser beam through said photomask.
Claim 5
Dependent Claim
28 words
The method of claim 3 further comprising attenuating said laser beam to provide a rate of photoablation of said waveguide blank from about 1000 to about 5000 Angstroms/minute.
Claim 6
Dependent Claim
30 words
The method of claim 4 wherein said laser beam has a wavelength of less than 400 nanometers and said shadow mask comprises x-ray opaque material disposed on a quartz support.
Claim 7
Dependent Claim
19 words
The method of claim 5 wherein said laser has a pulse rate between 5 and 100 pulses per second.
Claim 8
Independent Claim
34 words
A method for preparing a poled polymer stripe waveguide comprising preparing a polymer waveguide blank, electric field poling said polymer waveguide blank, and photoablating the outline of said stripe waveguide in said waveguide blank.
Claim 9
Independent Claim
34 words
A method for preparing a poled polymer stripe waveguide comprising preparing a polymer waveguide blank, electric field poling said polymer waveguide blank, and photoablating the outline of said stripe waveguide in said waveguide blank.
Claim 10
Dependent Claim
32 words
The method of claim 7 wherein said photoablating further comprises disposing a shadow mask between said waveguide blank and a laser beam source, and directing a collimated laser beam through said photomask.
Claim 11
Dependent Claim
41 words
The method of claim 8 wherein said laser beam has a wavelength of less than 400 nanometers and a pulse rate between 5 and 100 pulses per second, and said shadow mask comprises x-ray opaque material disposed on a quartz support.
Claim 12
Dependent Claim
19 words
The method of claim 10 wherein said laser has a pulse rate between 5 and 100 pulses per second.
Claim 13
Dependent Claim
45 words
The method of claim 10 wherein said waveguide blank includes a polymeric medium exhibiting a second order polarization susceptibility greater than 10 -9 esu and having organic molecular dipoles containing an electron donor moiety linked through a conjugated x bonding system to an electron acceptor.
Claim 14
Dependent Claim
12 words
The method of claim 8 wherein said waveguide blank includes 4'-[(6-acryloyloxyhexyl) methylamino]-4-methylsulfonylazobenzene.
Claim 15
Independent Claim
57 words
A method for patterning a waveguide layer comprising photoablating an outline in said waveguide layer using a collimated laser beam, said laser beam having a wavelength of less than about 400 nanometers, a pulse rate between 5 and 100 pulses per second, and a beam energy at said waveguide blank greater than about 15 mJ/cm 2 .
Claim 16
Independent Claim
57 words
A method for patterning a waveguide layer comprising photoablating an outline in said waveguide layer using a collimated laser beam, said laser beam having a wavelength of less than about 400 nanometers, a pulse rate between 5 and 100 pulses per second, and a beam energy at said waveguide blank greater than about 15 mJ/cm 2 .
Claim 17
Dependent Claim
31 words
The method of claim 13 further comprising the step of electric field poling said waveguide layer prior to said photoablating step, whereby said polymer stripe waveguide produced is electric field poled.
Claim 18
Dependent Claim
26 words
The method of claim 13 further comprising limiting the duration of said photoablating step to a time interval preselected as correlating with a desired ablation depth.
Claim 19
Dependent Claim
16 words
The method of claim 13 wherein said laser pulse rate is about 10 pulses per second.
Claim 20
Dependent Claim
45 words
The method of claim 13 wherein said waveguide layer includes a polymeric medium exhibiting a second order polarization susceptibility greater than 10 -9 esu and having organic molecular dipoles containing an electron donor moiety linked through a conjugated π bonding system to an electron acceptor.
Claim 21
Dependent Claim
22 words
The method of claim 13 wherein said photoablation of said outline is to less than the full depth of said waveguide layer.
References Cited (Backward Citations)
US4568632A
Cited
US4414059A
Cited
US4481049A
Cited
US4617085A
Cited
US4941093A
Cited
US4826755A
Cited
US4842782A
Cited
US4770739A
Cited
US4868006A
Cited
US4879176A
Cited
US4882200A
Cited
US4877481A
Cited
US4900581A
Cited
US4780177A
Cited
US4842677A
Cited
US4824522A
Cited
US5006285A
Cited
US4915981A
Cited
US4962057A
Cited
US4925523A
Cited
US4889407A
Cited
US4935094A
Cited
US4932738A
Cited
US4940508A
Cited
US5106211A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-06-20 | 1997-12-20 | 1998-06-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-06-20 | 2001-12-20 | 2002-06-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-06-20 | 2005-12-20 | 2006-06-21 | $7700.00 | Window Closed / Lapsed |