US4824522A
Expired / Lapsed
US
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Fabrication of polydiacetylene waveguides
Assignee: STANFORD UNIVERSITY OTL LLC
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Filing: 1988-04-01
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Granted: 1989-04-25
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Expires: 2008-04-01
Abstract
Abstract Novel optical waveguides and methods for their fabrication are provided. The waveguides are made from polydiacetylene materials. The waveguides are made by a bilayer process wherein a film made from a soluble polydiacetylene material is applied to a substrate and a silicon-containing imaging layer is applied atop the polyacetylene layer. Thereafter a pattern is produced in the imaging layer, for example, by photolithographic methods, and the pattern is transferred to the underlying polydiacetylene layer by exposure to an oxygen plasma. Polydiacetylene waveguides greater than 0.4 microns thickness are thereby produced.
Inventors
- 👤 Gregory L. Baker
- 👤 Cynthia F. Klausner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 12:25
CPC Classifications
G; G02; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/13
Claims Analysis
Total Claims: 34
Claim 1
Independent Claim
76 words
A process for the manufacture of optical waveguides comprising applying a first layer of an optical material made from a soluble polydiacetylene to a substrate, applying a second layer atop said first layer, producing a pattern in said second layer, and transferring said pattern to said first layer by exposing said second layer to a reactive ion etching environment, said second layer being made from a material which is resistant to said reactive ion etching environment.
Claim 2
Dependent Claim
76 words
A process for the manufacture of optical waveguides comprising applying a first layer of an optical material made from a soluble polydiacetylene to a substrate, applying a second layer atop said first layer, producing a pattern in said second layer, and transferring said pattern to said first layer by exposing said second layer to a reactive ion etching environment, said second layer being made from a material which is resistant to said reactive ion etching environment.
Claim 3
Dependent Claim
54 words
The method of claim 1 wherein said optical material is a soluble polydiacetylene having the general formula ═[C(R)--C═C--C(R')]═ wherein R and R' are C 1 -C 50 aliphatic groups, aromatic groups, or a combination of aliphatic and aromatic groups, with or without heteroatoms, and wherein R and R' may be the same or different.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein said optical material is poly(4BCMU), poly(3BCMU), or poly(TS12).
Claim 5
Dependent Claim
11 words
The method of claim 1 wherein said optical material is poly(4BCMU).
Claim 6
Dependent Claim
15 words
The method of claim 1 wherein said reactive ion etching environment comprises an oxygen plasma.
Claim 7
Dependent Claim
15 words
The method of claim 1 wherein said second layer is made from a silicon-containing material.
Claim 8
Dependent Claim
15 words
The method of claim 1 wherein said second layer is made from a silicon-containing polyacetylene.
Claim 9
Dependent Claim
15 words
The method of claim 1 wherein said second layer is made from a trimethylsilyl-substituted polyacetylene.
Claim 10
Dependent Claim
19 words
The method of claim 1 wherein said pattern is developed in said second layer by a positive photolithographic process.
Claim 11
Dependent Claim
16 words
The method of claim 1 wherein said first layer has a thickness of about 0.8-2 microns.
Claim 12
Dependent Claim
26 words
The method of claim 1 wherein said pattern on said first layer comprises strips having a width and a depth of about 0.8 to 2 microns.
Claim 13
Dependent Claim
28 words
The method of claim 1 further comprising applying a barrier layer between said first and second layers, said barrier layer preventing intermixing of said first and second layers.
Claim 14
Dependent Claim
13 words
The method of claim 12 wherein said barrier layer is a carbon-containing substrate.
Claim 15
Dependent Claim
10 words
The method of claim 12 wherein said barrier is poly(vinylalcohol).
Claim 16
Independent Claim
88 words
A method for applying a film pattern of small geometry to a substrate, comprising applying a first layer comprising an optical material to a substrate, said optical material being made from a soluble polydiacetylene, applying a second layer atop said first layer, producing a pattern of small geometry in said second layer, and transferring said pattern to said first layer by exposing said second layer to a reactive ion etching environment, said second layer being made from a material which is resistant to said reactive ion etching environment.
Claim 17
Independent Claim
88 words
A method for applying a film pattern of small geometry to a substrate, comprising applying a first layer comprising an optical material to a substrate, said optical material being made from a soluble polydiacetylene, applying a second layer atop said first layer, producing a pattern of small geometry in said second layer, and transferring said pattern to said first layer by exposing said second layer to a reactive ion etching environment, said second layer being made from a material which is resistant to said reactive ion etching environment.
Claim 18
Dependent Claim
54 words
The method of claim 15 wherein said optical material is a soluble polydiacetylene having the general formula ═[C(R)--C═C--C(R')]═ wherein R and R' are C 1 -C 50 aliphatic groups, aromatic groups, or a combination of aliphatic and aromatic groups, with or without heteroatoms, and wherein R and R' may be the same or different.
Claim 19
Dependent Claim
14 words
The method of claim 15 wherein said optical material is poly(4BCMU), poly(3BCMU) or poly(TS12).
Claim 20
Dependent Claim
11 words
The method of claim 15 wherein said optical material is poly(4BCMU).
Claim 21
Dependent Claim
15 words
The method of claim 15 wherein said reactive ion etching environment comprises an oxygen plasma.
Claim 22
Dependent Claim
15 words
The method of claim 15 wherein said second layer is made from a silicon-containing material.
Claim 23
Dependent Claim
15 words
The method of claim 14 wherein said second layer is made from a silicon-containing polyacetylene.
Claim 24
Dependent Claim
16 words
The method of claim 15 wherein said second layer is made from a trimethyl silyl-substituted polyacetylene.
Claim 25
Dependent Claim
21 words
The method of claim 15 wherein said pattern is produced by irradiating said second layer with ultraviolet light through a photomask.
Claim 26
Dependent Claim
19 words
The method of claim 15 wherein said pattern is produced in said second layer by a positive photolithographic process.
Claim 27
Dependent Claim
59 words
An optical waveguide, comprising a substrate, a film layer on said substrate, and a top layer on said film layer, said film layer having an index of refraction greater than that of said substrate and said top layer, said film layer having a thickness of about 0.8 to 2 microns, said film layer being made from a soluble polydiacetylene.
Claim 28
Dependent Claim
59 words
An optical waveguide, comprising a substrate, a film layer on said substrate, and a top layer on said film layer, said film layer having an index of refraction greater than that of said substrate and said top layer, said film layer having a thickness of about 0.8 to 2 microns, said film layer being made from a soluble polydiacetylene.
Claim 29
Dependent Claim
56 words
The optical waveguide of claim 25, wherein said film is made from a soluble polydiacetylene having the general formula ═[C(R)--C═C--C(R')]═ wherein R and R' are C 1 -C 50 aliphatic groups, aromatic groups, or a combination of aliphatic and aromatic groups, with or without heteroatoms, and wherein R and R' may be the same or different.
Claim 30
Dependent Claim
16 words
The optical waveguide of claim 25, wherein said film is made from poly(4BCMU), poly(3BCMU), or poly(TS12).
Claim 31
Dependent Claim
13 words
The optical waveguide of claim 25, wherein said film is made from poly(4BCMU).
Claim 32
Dependent Claim
11 words
The optical waveguide of claim 25, wherein said film comprises strips.
Claim 33
Dependent Claim
23 words
The optical waveguide of claim 25, wherein said film comprises strips having a width and a depth of about 0.8 to 2 microns.
Claim 34
Dependent Claim
21 words
The optical waveguide of claim 25, wherein said film comprises strips having a width and a depth of about 1.5 microns.
References Cited (Backward Citations)
US4609252A
Cited
US4610502A
Cited
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