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US5260150A Expired / Lapsed US ⏱️ 0.0 years remaining

Photo-mask with light shielding film buried in substrate

Assignee: Sharp Corp
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Filing: 1990-12-20
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Granted: 1993-11-09
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Expires: 2010-12-20
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Abstract

Abstract A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

Inventors

  • 👤 Kenji Ohta
  • 👤 Junji Hirokane
  • 👤 Akira Shibata
  • 👤 Yoshiyuki Nagahara
  • 👤 Kazuo Van
  • 👤 Michinobu Mieda
  • 👤 Tetsuya Inui

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 11:50
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/38; G03F1/48; G11; G11B; G11B7/00; G11B7/24; G11B7/26; G11B7/261; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24851; Y10T428/24868; Y10T428/24917

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 63 words
A photo-mask comprising a light-permeable structure, a light-shielding film buried in said substrate so that the top surface of said light-shielding film projects from the top surface of said substrate, said light-shielding film forming a mask pattern, and a light-permeable protective film overlaying the surface of said substrate and said light-shielding film, wherein said light-permeable protective film is made of a dielectric substance.
Claim 2
Dependent Claim 63 words
A photo-mask comprising a light-permeable structure, a light-shielding film buried in said substrate so that the top surface of said light-shielding film projects from the top surface of said substrate, said light-shielding film forming a mask pattern, and a light-permeable protective film overlaying the surface of said substrate and said light-shielding film, wherein said light-permeable protective film is made of a dielectric substance.
Claim 3
Dependent Claim 18 words
A photo-mask according to claim 1, further comprising a conductive film overlaying the substrate and the light-shielding film.
Claim 4
Dependent Claim 17 words
A photo-mask according to claim 1, wherein said light-permeable protective film is made of a conductive substance.
Claim 5
Dependent Claim 26 words
A photo-mask according to claim 3, wherein said conductive substance is one selected from the group consisting of Ta, Ti, Mo, AuCr, and InO 2 .
Claim 6
Dependent Claim 26 words
A photo-mask according to claim 1, wherein said light-shielding film is made of a metal selected from the group consisting of Ta, Ti, Cr, and Mo.
Claim 7
Dependent Claim 23 words
A photo-mask according to claim 1, wherein said light-shielding film is made of Ta and has a thickness of 2 to 10 μm.
Claim 8
Dependent Claim 14 words
A photo-mask according to claim 1, wherein said dielectric substance is SiO 2 .
Claim 9
Dependent Claim 39 words
A photo-mask comprising a light-permeable substrate and a light-shielding film forming a mask-pattern, the light-shielding film being buried in said substrate so that the top surface of said light shielding film projects from the top surface of said substrate.
Claim 10
Dependent Claim 39 words
A photo-mask comprising a light-permeable substrate and a light-shielding film forming a mask-pattern, the light-shielding film being buried in said substrate so that the top surface of said light shielding film projects from the top surface of said substrate.
Claim 11
Dependent Claim 16 words
A photo-mask according to claim 8, wherein said light-shielding film is made of a conductive substance.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-11-08 1997-05-10 1997-11-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-11-08 2001-05-10 2001-11-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-11-08 2005-05-10 2005-11-09 $7700.00 Window Closed / Lapsed

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