Preparation of chromium mask

Abstract

Abstract PURPOSE:To render a Cr pattern hardly scratchable and to extend a life of the Cr mask by forming a protective film for covering the desired pattern of a Cr film formed on the surface of a mask base and flattening the surface of the protective film. CONSTITUTION:A Cr film 2 is formed on a transparent mask base 1 of glass or the like by the sputtering method or the like, and the unnecessary parts of the film 2 are removed by the photolithographic technique to form a desired pattern of a Cr film 2'. A protective film 3 of silica or the like is formed all over the base 1 by the sputtering method or the like to cover the Cr film 2'. Then, the film 3 is flattened by the abrasion method or the like to remove protuberances. The objective Cr mask thus obtained has no danger of being scratched when used for contact exposure, and cleaning of the mask can be easily operated.

Inventors

• 👤 Yoshiteru Urino
• 👤 売野　芳輝
• 👤 Yoshio Sato
• 👤 良男 佐藤
• 👤 Kiyoshi Matsui
• 👤 清 松井

Bibliographic Details