JPS51139267A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Photo-mask
Assignee: Hitachi Ltd
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Filing: 1975-05-28
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Granted: —
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Expires: 1995-05-28
Abstract
Abstract PURPOSE: To obtain a photo-mask used for obtaining a desired resist pattern. COPYRIGHT: (C)1976,JPO&Japio
Inventors
- 👤 Koji Yamada
- 👤 Hideki Nishida
- 👤 Norikazu Tsumita
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-06 03:28
CPC Classifications
—
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