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US5079113A Expired / Lapsed US ⏱️ 0.0 years remaining

Photo-mask

Assignee: Sharp Corp
•
Filing: 1989-12-14
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Granted: 1992-01-07
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Expires: 2009-12-14
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Abstract

Abstract A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

Inventors

  • 👤 Kenji Ohta
  • 👤 Junji Hirokane
  • 👤 Akira Shibata
  • 👤 Yoshiyuki Nagahara
  • 👤 Kazuo Van
  • 👤 Michinobu Mieda
  • 👤 Tetsuya Inui

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 19:07
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/38; G03F1/48

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 43 words
A photo-mask comprising a light-permeable substrate, a light-shielding film buried in the light-permeable substrate, and a protective film overlaying the light-shielding film and the substrate, the protective film being made of the same material as that of the light-shielding film to light-permeable thickness.
Claim 2
Dependent Claim 43 words
A photo-mask comprising a light-permeable substrate, a light-shielding film buried in the light-permeable substrate, and a protective film overlaying the light-shielding film and the substrate, the protective film being made of the same material as that of the light-shielding film to light-permeable thickness.
Claim 3
Dependent Claim 18 words
A photo-mask according to claim 1, wherein the light-shielding film and the protective film are made of metal.
Claim 4
Dependent Claim 19 words
A photo-mask according to claim 2, wherein the light-shielding film and the protective film made of Ta or Ti.
Claim 5
Dependent Claim 70 words
A photo-mask comprising: a light-permeable substrate, a light shielding film buried in said substrate so that the top surface of said light-shielding film projects from the top surface of said substrate, said light-shielding film forming a mask pattern, and a light-permeable protective, conductive film overlying the surface of said substrate and said light-shielding film, wherein the conductive light-shielding film and the conductive light-permeable film are made of the same material.
Claim 6
Dependent Claim 70 words
A photo-mask comprising: a light-permeable substrate, a light shielding film buried in said substrate so that the top surface of said light-shielding film projects from the top surface of said substrate, said light-shielding film forming a mask pattern, and a light-permeable protective, conductive film overlying the surface of said substrate and said light-shielding film, wherein the conductive light-shielding film and the conductive light-permeable film are made of the same material.
Claim 7
Dependent Claim 79 words
A photo-mask comprising: a light-permeable substrate, a conductive light-shielding film forming a mask pattern, the top surface of the light-shielding film being lower than the top surface of the substrate, and a conductive light-permeable film overlying the substrate and the conductive light shielding film, wherein the conductive light-shielding film and the conductive light-permeable film are made of the same material, and wherein the light-shielding film is made to light-shielding thickness, and the light-permeable film is made to light-permeable thickness.
Claim 8
Dependent Claim 79 words
A photo-mask comprising: a light-permeable substrate, a conductive light-shielding film forming a mask pattern, the top surface of the light-shielding film being lower than the top surface of the substrate, and a conductive light-permeable film overlying the substrate and the conductive light shielding film, wherein the conductive light-shielding film and the conductive light-permeable film are made of the same material, and wherein the light-shielding film is made to light-shielding thickness, and the light-permeable film is made to light-permeable thickness.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-01-06 1995-07-08 1996-01-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-01-06 1999-07-08 2000-01-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-01-06 2003-07-08 2004-01-07 $7700.00 Window Closed / Lapsed

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