US5238877A
Expired / Lapsed
US
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Conformal method of fabricating an optical waveguide on a semiconductor substrate
Assignee: United States Department of the Navy
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Filing: 1992-04-30
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Granted: 1993-08-24
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Expires: 2012-04-30
Abstract
Abstract A method for fabricating a conformal optical waveguide on a semiconductor substrate which results in an improved conformal processing method of producing ferroelectic ceramic waveguides that is integratable with conventional electronic and optoelectronic devices. First, a patterning of a desired waveguide configuration is made on a desired semiconductor substrate. A conformal confinement layer is fabricated in the pattern of the desired waveguide configuration on the semiconductor substrate. The conformal confinement layer has an index of refraction. Next, the method calls for a placing of a sol-gel waveguide precursor in the conformal confinement layer. Next the spin casting of a sol-gel waveguide precursor shapes a sol-gel conformal waveguide layer in the conformal confinement layer on the semiconductor substrate. The annealing of the spin cast sol-gel conformal waveguide layer forms the conformal optical waveguide which has an index of refraction that is greater than the refractive index of the conformal confinement layer.
Inventors
- 👤 Stephen D. Russell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 08:57
CPC Classifications
G; G02; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/13; G02B6/136; G02B6/132
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
127 words
A method of fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate; patterning a desired waveguide configuration on said semiconductor substrate; fabricating a confinement layer conformably covering said semiconductor substrate having said desired waveguide configuration in the pattern of said desired waveguide configuration on the semiconductor substrate, said confinement layer replicating said desired waveguide configuration and said confinement layer having an index of refraction; spin casting a sol-gel waveguide precursor on said confinement layer in said desired waveguide configuration on said semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said confinement layer.
Claim 2
Independent Claim
127 words
A method of fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate; patterning a desired waveguide configuration on said semiconductor substrate; fabricating a confinement layer conformably covering said semiconductor substrate having said desired waveguide configuration in the pattern of said desired waveguide configuration on the semiconductor substrate, said confinement layer replicating said desired waveguide configuration and said confinement layer having an index of refraction; spin casting a sol-gel waveguide precursor on said confinement layer in said desired waveguide configuration on said semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said confinement layer.
Claim 3
Dependent Claim
19 words
A method according to claim 1 in which the step of fabricating is the depositing of the confining layer.
Claim 4
Dependent Claim
36 words
A method according to claim 1 in which the step of annealing is a low temperature annealing to volatize organics and a high temperature annealing to densify and crystalize said waveguide precursor into said optical waveguide.
Claim 5
Dependent Claim
26 words
A method according to claim 3 further including: repeating the steps of spin casting and annealing to provide a conformal optical waveguide of the desired dimensions.
Claim 6
Independent Claim
130 words
A method of fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate; patterning a desired waveguide configuration on said semiconductor substrate; fabricating a confinement layer conformably covering said semiconductor substrate having said desired waveguide configuration in the pattern of said desired waveguide configuration on the semiconductor substrate, said confinement layer replicating said desired waveguide configuration and said confinement layer having an index of refraction; fabricating said semiconductor substrate and a sol-gel waveguide precursor on said confinement layer in said desired waveguide configuration on said semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said confinement layer.
Claim 7
Independent Claim
130 words
A method of fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate; patterning a desired waveguide configuration on said semiconductor substrate; fabricating a confinement layer conformably covering said semiconductor substrate having said desired waveguide configuration in the pattern of said desired waveguide configuration on the semiconductor substrate, said confinement layer replicating said desired waveguide configuration and said confinement layer having an index of refraction; fabricating said semiconductor substrate and a sol-gel waveguide precursor on said confinement layer in said desired waveguide configuration on said semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said confinement layer.
Claim 8
Independent Claim
99 words
A method for fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate having an index of refraction; patterning a desired waveguide configuration on said semiconductor substrate; placing a sol-gel waveguide precursor in the desired waveguide configuration on the semiconductor substrate; spin casting a sol-gel waveguide precursor in said desired waveguide configuration on the semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said semiconductor substrate.
Claim 9
Independent Claim
99 words
A method for fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate having an index of refraction; patterning a desired waveguide configuration on said semiconductor substrate; placing a sol-gel waveguide precursor in the desired waveguide configuration on the semiconductor substrate; spin casting a sol-gel waveguide precursor in said desired waveguide configuration on the semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said semiconductor substrate.
Claim 10
Dependent Claim
36 words
A method according to claim 6 in which the step of annealing is a low temperature annealing to volatize organics and a high temperature annealing to densify and crystalize said waveguide precursor into said optical waveguide.
Claim 11
Dependent Claim
26 words
A method according to claim 7 further including: repeating the steps of spin casting and annealing to provide a conformal optical waveguide of the desired dimensions.
Claim 12
Independent Claim
85 words
A method of fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate having an index of refraction; patterning a desired waveguide configuration on said semiconductor substrate; spin casting a sol-gel waveguide precursor in said desired waveguide configuration on said semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said semiconductor substrate.
Claim 13
Independent Claim
85 words
A method of fabricating a conformal optical waveguide on a semiconductor substrate comprising: providing a semiconductor substrate having an index of refraction; patterning a desired waveguide configuration on said semiconductor substrate; spin casting a sol-gel waveguide precursor in said desired waveguide configuration on said semiconductor substrate; and annealing said waveguide precursor to form said optical waveguide conformably covering said desired waveguide configuration on said semiconductor substrate, said optical waveguide having an index of refraction that is greater than the refractive index of said semiconductor substrate.
Claim 14
Dependent Claim
43 words
A method according to claim 1 in which the step of patterning includes photolithographically creating a masking layer, etching said semiconductor substrate in the exposed region of the masking layer thereby defining said desired waveguide configuration, and subsequent removal of the masking layer.
Claim 15
Dependent Claim
29 words
A method according to claim 10 in which the etching is anisotropicaly applied to said semiconductor substrate and selective to one or more crystallographic planes of said semiconductor substrate.
Claim 16
Dependent Claim
26 words
A method according to claim 1 in which said semiconductor substrate is (100)-oriented silicon and said etching is the chemical dissolution in a potassium hydroxide solution.
Claim 17
Dependent Claim
25 words
A method according to claim 11 in which said semiconductor substrate is (100-oriented silicon and said etching is the chemical dissolution in a potassium hydroxide
Claim 18
Dependent Claim
31 words
A method according to claim 3 in which said low temperature heating is no higher than about 400° C. and said high temperature heating is no higher than about 700° C.
Claim 19
Dependent Claim
20 words
A method according to claim 4 where each of said conformal layers has a thickness of less than ten micrometers.
Claim 20
Dependent Claim
35 words
A method according to claim 1 further including: fabricating a confinement capping layer on said waveguide layer, said confinement capping layer having an index of refraction less than the refractive index of said waveguide layer.
Claim 21
Dependent Claim
26 words
A method according to claim 1 further including: repeating the steps of spin casting and annealing to provide a conformal optical waveguide of the desired dimensions.
References Cited (Backward Citations)
US3997690A
Cited
US4344980A
Cited
US4939793A
Cited
US4861128A
Cited
JPS63221306A
Cited
US5028455A
Cited
US5116643A
Cited
US4801184A
Cited
US4902086A
Cited
US4934774A
Cited
JPH0341406A
Cited
JPH0359603A
Cited
US5137749A
Cited
US5100764A
Cited
US5139820A
Cited
US5059475A
Cited
US5052771A
Cited
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