Light guide type optical control device

Abstract

Abstract PURPOSE:To permit control of guided light with a low voltage by forming a 2nd thin PLZT film layer so as to have the refractive index larger than the refractive index of a 1st thin PLZT film layer and using the 2nd thin PLZT film layer as a light guide and executing the control of the guided light. CONSTITUTION:A spinel layer 12 and PLZT buffer layer 13 are formed as a buffer layer on an Si substrate 11 and a PLZT light guide layer 14 is formed thereon. Grating electrodes 15 are formed on the PLZT light guide layer 14. An electric field 19 is generated in the direction perpendicular to the PLZT light guide layer 14 and periodic changes in refractive index arise when a voltage is applied between the electrodes 15 and the low-resistance Si substrate 11. As a result, the PLZT light guide layer 14 acts as a grating of a refractive index modulation type so that incident light 16 can be taken to the outside and exit light 17 is obtd. Said layer acts as an ordinary light guide and the incident light 16 is guided as it is when no voltage is applied therebetween. Since the electric field 9 is perpendicularly applied, the change in the refractive index in the depth direction is uniform and the diffraction efficiency of the grating is extremely higher than in the case of applying the electric field in the horizontal direction.

Inventors

• 👤 Masaaki Iwasaki
• 👤 正明 岩崎
• 👤 Toshiya Miyagawa
• 👤 俊哉 宮川

Bibliographic Details