US5100764A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making patterned metal oxide films comprising a sol-gel of metal oxide and a photoactive compound
Assignee: Iowa State University Research Foundation Inc
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Filing: 1989-12-26
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Granted: 1992-03-31
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Expires: 2009-12-26
Abstract
Abstract A method of making patterned metal oxide films on microelectronic wafer substrates. They are prepared by making a sol-gel of a metal oxide in combination with an ultraviolet light sensitive photo-active compound. The sol-gel is applied to a silicon wafer substrate, and the wafer subjected to a predetermined pattern of ultraviolet light to cause the photo-active compound to respond to the ultraviolet light. The wafer is thereafter aqueous alkali metal hydroxide washed to wash away the portions of the metal alkoxide film which have been exposed to UV light.
Inventors
- 👤 Bradley A. Paulson
- 👤 Allen R. Landin
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 07:41
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0047; Y; Y10; Y10S; Y10S428/00; Y10S428/901
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
111 words
A method of making patterned metal oxide films on microelectronic wafer substrates, comprising: (a) preparing a sol-gel of a metal oxide containing a small but effective amount of an ultraviolet light sensitive photo-active compound; (b) applying the thin film of said sol-gel to a wafer substrate; (c) drying the coated wafer; (d) subjecting the wafer to a predetermined pattern of ultraviolet light to cause said photo-active compound to respond to said ultraviolet light; (e) treating the wafer with aqueous alkali metal hydroxide to wash away those portions of the metal alkoxide film which has been exposed to ultraviolet light; and thereafter (f) sintering the gel film to form a ceramic film.
Claim 2
Independent Claim
111 words
A method of making patterned metal oxide films on microelectronic wafer substrates, comprising: (a) preparing a sol-gel of a metal oxide containing a small but effective amount of an ultraviolet light sensitive photo-active compound; (b) applying the thin film of said sol-gel to a wafer substrate; (c) drying the coated wafer; (d) subjecting the wafer to a predetermined pattern of ultraviolet light to cause said photo-active compound to respond to said ultraviolet light; (e) treating the wafer with aqueous alkali metal hydroxide to wash away those portions of the metal alkoxide film which has been exposed to ultraviolet light; and thereafter (f) sintering the gel film to form a ceramic film.
Claim 3
Independent Claim
119 words
A method of making patterned metal oxide films on microelectronic wafer substrates, comprising: (a) preparing a sol-gel of a metal oxide containing a small but effective amount of the ultraviolet light sensitive photo-active compound, which is 1-naphthalenesulfonic acid, 6-diazo-5, 6-dihydro-5-oxo-4-benzoyl-1,2,3 benzene triyl ester, (b) applying the thin film of said sol-gel to a wafer substrate; (c) drying the coated wafer; (d) subjecting the wafer to a predetermined pattern of ultraviolet light to cause said photo-active compound to respond to said ultraviolet light; (e) treating the wafer with aqueous alkali metal hydroxide to wash away those portions of the metal alkoxide film which has been exposed to ultraviolet light; and thereafter (f) sintering the gel film to form ceramic film.
Claim 4
Independent Claim
119 words
A method of making patterned metal oxide films on microelectronic wafer substrates, comprising: (a) preparing a sol-gel of a metal oxide containing a small but effective amount of the ultraviolet light sensitive photo-active compound, which is 1-naphthalenesulfonic acid, 6-diazo-5, 6-dihydro-5-oxo-4-benzoyl-1,2,3 benzene triyl ester, (b) applying the thin film of said sol-gel to a wafer substrate; (c) drying the coated wafer; (d) subjecting the wafer to a predetermined pattern of ultraviolet light to cause said photo-active compound to respond to said ultraviolet light; (e) treating the wafer with aqueous alkali metal hydroxide to wash away those portions of the metal alkoxide film which has been exposed to ultraviolet light; and thereafter (f) sintering the gel film to form ceramic film.
Claim 5
Dependent Claim
37 words
The method of claim 1 wherein the metal oxide is selected from the group consisting of oxides of aluminum, silicon, tungsten, titanium, vanadium, chromium, iron, cobalt, nickel, germanium, yttrium, zirconium, niobium, indium, tin, antimony, tantalum, and lead.
Claim 6
Dependent Claim
12 words
The method of claim 1 wherein the sol-gel includes an alcohol solvent.
Claim 7
Dependent Claim
25 words
The method of claim 3 wherein the alcohol solvent is selected from the group consisting of C 1 to C 3 alcohols and alkoxy alcohols.
Claim 8
Dependent Claim
12 words
The method of claim 1 wherein the photo-active compound is a diazoquinone.
Claim 9
Dependent Claim
23 words
The method of claim 1 wherein the weight ratio of photo-active compound to metal oxide is within the range of 1:1 to 4.5:1.
Claim 10
Dependent Claim
19 words
The method of claim 1 wherein an additional step comprises calcining the wafer to provide the patterned, ready-to-use wafer.
Claim 11
Dependent Claim
15 words
The method of claim 1 wherein the drying of the coated wafer is oven drying.
Claim 12
Dependent Claim
21 words
The method of claim 9 wherein the drying is at a temperature within the range of 80° C. to 120° C.
Claim 13
Dependent Claim
21 words
The method of claim 10 wherein the drying is at a temperature within the range of 90° C. to 110° C.
Claim 14
Dependent Claim
26 words
The method of claim 1 wherein the aqueous metal hydroxide has a concentration within the range of about 5% by weight to about 15% by weight.
Claim 15
Dependent Claim
18 words
The method of claim 12 wherein the weight basis concentration of the aqueous metal hydroxide is about 10%.
Claim 16
Dependent Claim
13 words
The method of claim 13 wherein the alkali metal hydroxide is potassium hydroxide.
Claim 17
Dependent Claim
21 words
The method of claim 12 wherein the wafer is treated with said aqueous hydroxide by dipping said wafer in said solution.
Claim 18
Dependent Claim
18 words
The method of claim 15 wherein said treating is for from about 10 seconds to about 30 seconds.
Claim 19
Dependent Claim
10 words
The method of claim 1 wherein said metal is titanium.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-03-31 | 1995-09-30 | 1996-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-03-31 | 1999-09-30 | 2000-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-03-31 | 2003-09-30 | 2004-03-31 | $7700.00 | Window Closed / Lapsed |