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US5227338A Expired / Lapsed US ⏱️ 0.0 years remaining

Three-dimensional memory card structure with internal direct chip attachment

Assignee: International Business Machines Corp
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Filing: 1991-11-18
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Granted: 1993-07-13
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Expires: 2011-11-18
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Abstract

Abstract Process for producing a card structure having an internal three-dimensional array of semiconductor chips includes providing a thermal conductor plane, applying a first compliant dielectric material on major surfaces of the thermal conductor plane, forming a two-dimensional array of chip wells in the dielectric material on each side of the thermal conductor plane, positioning and securing semiconductor chips in the chip wells, laminating a lead frame mounted on a carrier sheet over the first compliant dielectric material and the semiconductor chips, forming an electrical connection between each of the semiconductor chips and the lead frame, encapsulating the electrical connections with a filler, laminating an insulating layer and a wiring plane over the encapsulated connections, electrically connecting the lead frame and the wiring plane so as to form a chip core, and electrically connecting a power core to the chip core.

Inventors

  • 👤 Bohdan R. Kryzaniwsky

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 18:40
CPC Classifications
G; G11; G11C; G11C5/00; G11C5/06; H; H10; H10W; H10W72/00; H10W72/01; H10W72/0198; H10W72/851; H10W72/874; H10W72/884; H10W90/00; H10W90/701; H10W90/751; H10W90/754; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/4913; Y10T29/49146

Claims Analysis

Total Claims: 35
Claim 1
Independent Claim 249 words
A process for producing a card structure having an internal three dimensional array of semiconductor chips, comprising: providing a thermal conductor plane; applying a first compliant dielectric material on major surfaces of said thermal conductor plane, said first compliant dielectric material having a low dielectric constant and further having a thermal coefficient of expansion compatible with the thermal coefficient of expansion of said semiconductor chips and said thermal conductor plane, whereby thermal expansion stability with said semiconductor chips and said thermal conductor plane is maintained; forming a two dimensional array of chip wells in said dielectric material on each side of said thermal conductor plane; positioning and securing said semiconductor chips in respective ones of said chip wells; laminating a lead frame mounted on a carrier sheet over said first compliant dielectric material and said semiconductor chips; forming an electrical connection between each of said semiconductor chips and said lead frame; encapsulating said electrical connections with a filler; laminating an insulating layer and a wiring plane over said encapsulated connections; electrically connecting said lead frame and said wiring plane so as to form a chip core; and electrically connecting a power core to said chip core, said power core comprising: at least one electrical conductor plane; and a second compliant dielectric material on the major surfaces of said electrical conductor plane, said second compliant dielectric material having a thermal coefficient of expansion compatible with said electrical conductor plane, whereby thermal expansion stability with said electrical conductor plane is maintained.
Claim 2
Dependent Claim 249 words
A process for producing a card structure having an internal three dimensional array of semiconductor chips, comprising: providing a thermal conductor plane; applying a first compliant dielectric material on major surfaces of said thermal conductor plane, said first compliant dielectric material having a low dielectric constant and further having a thermal coefficient of expansion compatible with the thermal coefficient of expansion of said semiconductor chips and said thermal conductor plane, whereby thermal expansion stability with said semiconductor chips and said thermal conductor plane is maintained; forming a two dimensional array of chip wells in said dielectric material on each side of said thermal conductor plane; positioning and securing said semiconductor chips in respective ones of said chip wells; laminating a lead frame mounted on a carrier sheet over said first compliant dielectric material and said semiconductor chips; forming an electrical connection between each of said semiconductor chips and said lead frame; encapsulating said electrical connections with a filler; laminating an insulating layer and a wiring plane over said encapsulated connections; electrically connecting said lead frame and said wiring plane so as to form a chip core; and electrically connecting a power core to said chip core, said power core comprising: at least one electrical conductor plane; and a second compliant dielectric material on the major surfaces of said electrical conductor plane, said second compliant dielectric material having a thermal coefficient of expansion compatible with said electrical conductor plane, whereby thermal expansion stability with said electrical conductor plane is maintained.
Claim 3
Dependent Claim 26 words
A process for producing a card structure according to claim 1, wherein said thermal conductor plane and said electrical conductor plane comprise the same conductive material.
Claim 4
Dependent Claim 18 words
A process for producing a card structure according to claim 2, wherein said same conductive material comprises copper-invar-copper.
Claim 5
Dependent Claim 28 words
A process for producing a card structure according to claim 1, wherein said first compliant dielectric material and said second compliant dielectric material comprise the same dielectric material.
Claim 6
Dependent Claim 18 words
A process for producing a card structure according to claim 4, wherein said same dielectric material comprises polytetrafluoroethylene.
Claim 7
Dependent Claim 28 words
A process for producing a card structure according to claim 1, further including the step of providing conductor means for electrically connecting said card structure to another device.
Claim 8
Dependent Claim 50 words
A process for producing a card structure according to claim 6, wherein said step of providing conductor means, comprises: forming an aperture through said chip core and said power core; filling said aperture with a conductive via, which is insulated from said thermal conductor plane and said electrical conductor plane.
Claim 9
Dependent Claim 30 words
A process for producing a card structure according to claim 7, wherein said conductive via includes an end which comprises metallic dendrite pads for connecting with other metallic dendrite pads.
Claim 10
Dependent Claim 24 words
A process for producing a card structure according to claim 1, further including the step of providing cooling means for cooling said card structure.
Claim 11
Dependent Claim 46 words
A process for producing a card structure according to claim 9, wherein said step of providing cooling means comprises: forming an aperture through said chip core; filling said aperture with a cooling via containing material thermally contacting said thermal conductor plane and said electrical conductor plane.
Claim 12
Dependent Claim 29 words
A process for producing a card structure according to claim 1, wherein said thermal conductor plane is shaped so as to surround the sides of each said semiconductor chip.
Claim 13
Dependent Claim 18 words
A process for producing a card structure according to claim 11, wherein said thermal conductor plane comprises molybdenum.
Claim 14
Dependent Claim 26 words
A process for producing a chip core according to claim 11, wherein said thermal conductor plane and said electrical conductor plane comprise the same conductive material.
Claim 15
Dependent Claim 18 words
A process for producing a chip core according to claim 13, wherein said same conductive material comprises copper-invar-copper.
Claim 16
Dependent Claim 28 words
A process for producing a chip core according to claim 11, wherein said first compliant dielectric material and said second compliant dielectric material comprise the same dielectric material.
Claim 17
Dependent Claim 18 words
A process for producing a chip core according to claim 15, wherein said same dielectric material comprises polytetrafluoroethylene.
Claim 18
Dependent Claim 32 words
A process for producing a chip core according to claim 11, further including the step of providing conductor means for electrically connecting said chip core and/or said power core to another device.
Claim 19
Dependent Claim 50 words
A process for producing a chip core according to claim 17, wherein said step of providing conductor means, comprises: forming an aperture through said chip core and said power core; filling said aperture with a conductive via, which is insulated from said thermal conductor plane and said electrical conductor plane.
Claim 20
Dependent Claim 30 words
A process for producing a chip core according to claim 18, wherein said conductive via includes an end which comprises metallic dendrite pads for connecting with other metallic dendrite pads.
Claim 21
Dependent Claim 28 words
A process for producing a chip core according to claim 11, further including the step of providing cooling means for cooling said chip core and said power core.
Claim 22
Dependent Claim 50 words
A process for producing a chip core according to claim 20, wherein said step of providing cooling means comprises: forming an aperture through said chip core and said power core; filling said aperture with a cooling via containing material thermally contacting said thermal conductor plane and said electrical conductor plane.
Claim 23
Dependent Claim 233 words
A process for producing a card structure having an internal three dimensional array of semiconductor chips, comprising: providing a thermal conductor plane; applying a first compliant dielectric material to said thermal conductor plane, said first compliant dielectric material having a low dielectric constant and further having a thermal coefficient of expansion compatible with the thermal coefficient of expansion of said semiconductor chips and said thermal conductor plane, whereby thermal expansion stability with said semiconductor chips and said thermal conductor plane is maintained; forming chip wells in said dielectric material; positioning and securing said semiconductor chips in respective ones of said chip wells; laminating a lead frame mounted on a carrier sheet over said first compliant dielectric material and said semiconductor chips; forming an electrical connection between each of said semiconductor chips and said lead frame; encapsulating said electrical connections with a filler; laminating an insulating layer and a wiring plane over said encapsulated connections; electrically connecting said lead frame and said wiring plane so as to form a chip core; and electrically connecting a power core to said chip core, said power core comprising: at least one electrical conductor plane; and a second compliant dielectric material on the major surfaces of said electrical conductor plane, said second compliant dielectric material having a thermal coefficient of expansion compatible with said electrical conductor plane, whereby thermal expansion stability with said electrical conductor plane is maintaine.
Claim 24
Dependent Claim 233 words
A process for producing a card structure having an internal three dimensional array of semiconductor chips, comprising: providing a thermal conductor plane; applying a first compliant dielectric material to said thermal conductor plane, said first compliant dielectric material having a low dielectric constant and further having a thermal coefficient of expansion compatible with the thermal coefficient of expansion of said semiconductor chips and said thermal conductor plane, whereby thermal expansion stability with said semiconductor chips and said thermal conductor plane is maintained; forming chip wells in said dielectric material; positioning and securing said semiconductor chips in respective ones of said chip wells; laminating a lead frame mounted on a carrier sheet over said first compliant dielectric material and said semiconductor chips; forming an electrical connection between each of said semiconductor chips and said lead frame; encapsulating said electrical connections with a filler; laminating an insulating layer and a wiring plane over said encapsulated connections; electrically connecting said lead frame and said wiring plane so as to form a chip core; and electrically connecting a power core to said chip core, said power core comprising: at least one electrical conductor plane; and a second compliant dielectric material on the major surfaces of said electrical conductor plane, said second compliant dielectric material having a thermal coefficient of expansion compatible with said electrical conductor plane, whereby thermal expansion stability with said electrical conductor plane is maintaine.
Claim 25
Dependent Claim 26 words
A process for producing a card structure according to claim 22, wherein said thermal conductor plane and said electrical conductor plane comprise the same conductive material.
Claim 26
Dependent Claim 18 words
A process for producing a card structure according to claim 23, wherein said same conductive material comprises copper-invar-copper.
Claim 27
Dependent Claim 28 words
A process for producing a card structure according to claim 22, wherein said first compliant dielectric material and said second compliant dielectric material comprise the same dielectric material.
Claim 28
Dependent Claim 18 words
A process for producing a card structure according to claim 25, wherein said same dielectric material comprises polytetrafluoroethylene.
Claim 29
Dependent Claim 28 words
A process for producing a card structure according to claim 22, further including the step of providing conductor means for electrically connecting said card structure to another device.
Claim 30
Dependent Claim 50 words
A process for producing a card structure according to claim 27, wherein said step of providing conductor means, comprises: forming an aperture through said chip core and said power core; filling said aperture with a conductive via, which is insulated from said thermal conductor plane and said electrical conductor plane.
Claim 31
Dependent Claim 30 words
A process for producing a card structure according to claim 28, wherein said conductive via includes an end which comprises metallic dendrite pads for connecting with other metallic dendrite pads.
Claim 32
Dependent Claim 24 words
A process for producing a card structure according to claim 22, further including the step of providing cooling means for cooling said card structure.
Claim 33
Dependent Claim 46 words
A process for producing a card structure according to claim 3, wherein said step of providing cooling means comprises: forming an aperture through said chip core; filling said aperture with a cooling via containing material thermally contacting said thermal conductor plane and said electrical conductor plane.
Claim 34
Dependent Claim 29 words
A process for producing a card structure according to claim 22, wherein said thermal conductor plane is shaped so as to surround the sides of each said semiconductor chip.
Claim 35
Dependent Claim 18 words
A process for producing a card structure according to claim 32, wherein said thermal conductor plane comprises molybdenum.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-07-12 1997-01-11 1997-07-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-07-12 2001-01-11 2001-07-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-07-12 2005-01-11 2005-07-13 $7700.00 Window Closed / Lapsed

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