Patent US5225311A successfully refreshed from Google Patents.
US5225311A
Expired / Lapsed
US
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Positive photoresist composition
Assignee: Mitsubishi Chemical Corp
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Filing: 1991-04-05
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Granted: 1993-07-06
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Expires: 2011-04-05
Abstract
Abstract A positive photoresist composition is disclosed, comprising (a) from 50 to 99 parts by weight of a polyhydric phenol compound which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound. The composition is excellent in sensitivity, resolving power, heat resistance, and resistance to dry etching.
Inventors
- 👤 Toshitomo Nakano
- 👤 Masumi Kada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:02
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
63 words
A positive photoresist composition comprising (a) from 50 to 99 parts by weight of a polyhydric phenol resin which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound.
Claim 2
Dependent Claim
63 words
A positive photoresist composition comprising (a) from 50 to 99 parts by weight of a polyhydric phenol resin which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound.
Claim 3
Dependent Claim
22 words
A positive photoresist composition as claimed in claim 1, wherein said polyhydric phenol compound has a number average molecular weight exceeding 1,500.
Claim 4
Dependent Claim
14 words
A positive photoresist composition as claimed in claim 1, wherein said aldehyde is formaldehyde.
Claim 5
Dependent Claim
14 words
A positive photoresist composition as claimed in claim 2, wherein said aldehyde is formaldehyde.
Claim 6
Dependent Claim
17 words
A positive photoresist composition as claimed in claim 1, wherein said aldehyde is a hydroxy aromatic aldehyde.
Claim 7
Dependent Claim
17 words
A positive photoresist composition as claimed in claim 2, wherein said aldehyde is a hydroxy aromatic aldehyde.
Claim 8
Dependent Claim
25 words
A positive photoresist composition as claimed in claim 1, wherein the polyhydric phenol resin and the quinone diazide compound are chemically bonded to each other.
Claim 9
Dependent Claim
23 words
The photoresist composition of claim 1, wherein the mixed phenol consists essentially of o-cresol and at least one of 2,5- dimethylphenol and 3,5-dimethylphenol.
Claim 10
Dependent Claim
25 words
The photoresist composition of claim 8, wherein the molar ratio of o-cresol to at least one of 2,5- dimethylphenol and 3,5-dimethylphenol is 90/10 to 10/90.
References Cited (Backward Citations)
GB1227602A
Cited
US4499171A
Cited
US4650741A
Cited
US4551409A
Cited
US5023311A
Cited
EP0227487A2
Cited
US4812551A
Cited
US4863828A
Cited
US4871645A
Cited
DE3839714A1
Cited
US4920028A
Cited
EP0336604A2
Cited
US4959292A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-07-05 | 1997-01-04 | 1997-07-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-05 | 2001-01-04 | 2001-07-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-05 | 2005-01-04 | 2005-07-06 | $7700.00 | Window Closed / Lapsed |