US4650741A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive photosensitive composition of cocondensed β-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide
Assignee: Mitsubishi Chemical Corp
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Filing: 1985-10-18
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Granted: 1987-03-17
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Expires: 2005-10-18
Abstract
Abstract Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components beta -naphthol, or alpha -naphthol and p-cresol.
Inventors
- 👤 Konoe Miura
- 👤 Hideki Nagasaka
- 👤 Noriaki Takahashi
- 👤 Tameichi Ochiai
- 👤 Ryuichiro Takasaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 16:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
80 words
A positive photosensitive composition which, after development, exhibits high resistance to dry etching, consisting essentially of: a sensitizing effective amount of a sensitizer component which is solely the photosensitively active tri-ester of 1,2-naphthoquinone-1-diazide-5-sulfonic acid of formula (I): ##STR1## and 2,3,4-trihydroxybenzophenone of formula (II): ##STR2## in admixture with an effectively binding amount of a novolak resin which is the condensation product of an aliphatic aldehyde or aromatic aldehyde with a mixture of 5-70 mole % β-naphthol and 30-95 mole % m-cresol.
Claim 2
Dependent Claim
80 words
A positive photosensitive composition which, after development, exhibits high resistance to dry etching, consisting essentially of: a sensitizing effective amount of a sensitizer component which is solely the photosensitively active tri-ester of 1,2-naphthoquinone-1-diazide-5-sulfonic acid of formula (I): ##STR1## and 2,3,4-trihydroxybenzophenone of formula (II): ##STR2## in admixture with an effectively binding amount of a novolak resin which is the condensation product of an aliphatic aldehyde or aromatic aldehyde with a mixture of 5-70 mole % β-naphthol and 30-95 mole % m-cresol.
Claim 3
Dependent Claim
25 words
The positive photosensitive composition according to claim 1, wherein the weight-average molecular weight of said novolak resin is in the range of 800 to 1000.
Claim 4
Dependent Claim
28 words
The positive photosensitive composition according to claim 1, wherein the amount of β-naphthol ranges from 10-40 mole % and the amount of m-cresol ranges from 60-90 mole %.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-03-16 | 1990-09-15 | 1991-03-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-03-16 | 1994-09-15 | 1995-03-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-03-16 | 1998-09-15 | 1999-03-17 | $7700.00 | Window Closed / Lapsed |