Light-sensitive naphthoquinone diazide composition and material containing an alkali insoluble polymer

Claim 1

IN AN ALKALI-DEVELOPABLE PHOTO-SENSITIVE COATING COMPOSITION COMPRISING A LIQUID DISPERSION OF A NAPHTHOQUINONE-(1,2)-DIAZIDE-SULFONIC ACID ESTER AS PHOTO-SENSITIZER AND AN ALKALI SOLUBLE RESIN, THE IMPROVMENT CHARACTERIZED IN THAT SAID COMPOSITION INCLUDES MEANS IN AN AMOUNT NOT GREATER THAN THE WEIGHT AMOUNT OF THE ALKALI SOLUBLE SOLIDS CONTENT FOR INCREASING THE THICKNESS, CHEMICAL AND ELECTRICAL RESISTANCES OF THE COATING, SAID MEANS COMPRISING AN ELECTRICALLY INSULATING FILM-FORMING MATERIAL WHICH IS ALKALI RESISTANT, SUBSTANTIALLY INSENSITIVE TO LIGHT AT A WAVE LENGTH BETWEEN 3000 AND 5000 ANGSTROMS, FORMS A NON-TACKY DRIED FILM WITHIN 10 MINUTES AT 100* C., IS COMPATIBLE WITH THE PHOTO-SENSITIZER COMPOSITION AND HAS A MOLECULAR WEIGHT IN THE RANGE OF 500 TO 12,000, SAID MEANS BEING SELECTED FROM THE GROUP CONSISTING OF POLYSTYRENE; COPOLYMERS OF ALPHA-METHYL STYRENE AND VINYL TOLUENE; THE POLYMERIC REACTION PRODUCT OF MELAMINE, FORMALDEHYDE AND A LOWER ALKYL MONOALCOHOL; THE POLYMERIC REACTION PRODUCT OF BENZOGUANAMINE, FORMALDEHYDE AND A LOWER ALKYL MONOALCOHOL; AND SUCROSE BENZOATE, SAID COMPOSITION BEING ESPECIALLY ADAPTED FOR USE AS A RESIST IN ELECTROPLATING AND METAL ETCHING.