US4920028A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
Assignee: EMD Performance Materials Corp
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Filing: 1988-08-02
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Granted: 1990-04-24
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Expires: 2008-08-02
Abstract
Abstract Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
Inventors
- 👤 Richard M. Lazarus
- 👤 Randall Kautz
- 👤 Sunit S. Dixit
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:05
CPC Classifications
C; C08; C08G; C08G8/00; C08G8/04; G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
99 words
In a positive photoresist comprising an admixture of a bindingly effective amount of a novolak resin and a photoimaging amount of diazoquinone photosensitizer the improvement comprising employing as the novolak resin the condensation product of (a) a mixture of m- and p-cresol and (b) a mixture of aldehydes comprising formaldehyde or a formaldehyde precursor and a monohydroxy aromatic aldehyde selected from the group consisting of 2-hydroxybenzaldehyde, 3-hydroxybenzaldehyde and 4-hydroxybenzaldehyde, wherein the cresol and aldehyde components of the novolak resin are present in the following amounts: ##EQU3## and wherein the m- and p-cresol are present in the following amounts: ##EQU4##
Claim 2
Dependent Claim
99 words
In a positive photoresist comprising an admixture of a bindingly effective amount of a novolak resin and a photoimaging amount of diazoquinone photosensitizer the improvement comprising employing as the novolak resin the condensation product of (a) a mixture of m- and p-cresol and (b) a mixture of aldehydes comprising formaldehyde or a formaldehyde precursor and a monohydroxy aromatic aldehyde selected from the group consisting of 2-hydroxybenzaldehyde, 3-hydroxybenzaldehyde and 4-hydroxybenzaldehyde, wherein the cresol and aldehyde components of the novolak resin are present in the following amounts: ##EQU3## and wherein the m- and p-cresol are present in the following amounts: ##EQU4##
Claim 3
Dependent Claim
93 words
A positive photoresist composition comprising an admixture of: A. a bindingly effective amount of a novolak resin comprising the condensation product of (a) a mixture of m- and p-cresol and (b) a mixture of aldehydes comprising formaldehyde or a formaldehyde precursor and a monohydroxy aromatic aldehyde selected from the group consisting of 2-hydroxybenzaldehyde 3-hydroxybenzaldehyde and 4-hydroxybenzaldehyde, wherein the cresol and aldehyde components of the novolak resin are present in the following amounts: ##EQU5## and wherein the m- and p-cresol are present in the following amounts: ##EQU6## B. a photoimaging amount of diazoquinone photosensitizer.
Claim 4
Dependent Claim
93 words
A positive photoresist composition comprising an admixture of: A. a bindingly effective amount of a novolak resin comprising the condensation product of (a) a mixture of m- and p-cresol and (b) a mixture of aldehydes comprising formaldehyde or a formaldehyde precursor and a monohydroxy aromatic aldehyde selected from the group consisting of 2-hydroxybenzaldehyde 3-hydroxybenzaldehyde and 4-hydroxybenzaldehyde, wherein the cresol and aldehyde components of the novolak resin are present in the following amounts: ##EQU5## and wherein the m- and p-cresol are present in the following amounts: ##EQU6## B. a photoimaging amount of diazoquinone photosensitizer.
Claim 5
Dependent Claim
20 words
The positive photoresist of claim 2 wherein the photosensitizer is a naphthoquinone diazide sensitizer or mixture of naphthoquinone diazide sensitizers.
Claim 6
Dependent Claim
29 words
The positive photoresist of claim 3 wherein the naphthoquinone diazide sensitizer is selected from the group consisting of esters of 1,2-naphthoquinone-2-diazo-4-sulfonic acid, esters of 1,2-naphthoquinone-2-diazo-5-sulfonic acid, and mixtures thereof.
Claim 7
Dependent Claim
30 words
The positive photoresist of claim 4 wherein the naphthoquinone diazide sensitizer is selected from the group consisting of 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid monoester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid diester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid triester and mixtures thereof.
Claim 8
Dependent Claim
30 words
The positive photoresist of claim 4 wherein the naphthoquinone diazide sensitizer is selected from the group consisting of 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-5-sulfonic acid monoester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-5-sulfonic acid diester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-5-sulfonic acid triester and mixtures thereof.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-04-23 | 1993-10-23 | 1994-04-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-04-23 | 1997-10-23 | 1998-04-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-04-23 | 2001-10-23 | 2002-04-24 | $7700.00 | Window Closed / Lapsed |