US4863828A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive-working o-quinone diazide photoresist composition
Assignee: Fujifilm Holdings Corp
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Filing: 1988-01-20
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Granted: 1989-09-05
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Expires: 2008-01-20
Abstract
Abstract A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3',4',5'-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.
Inventors
- 👤 Yasumasa Kawabe
- 👤 Kazuya Uenishi
- 👤 Tadayoshi Kokubo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 23:29
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/72; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/039
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
73 words
A positive-working photoresist composition comprising: (A) a light-sensitive amount of an ester obtained by reaction of a 1,2-naphthoquinonediazide-4-sulfonyl compound, a 1,2-naphthoquinonediazide-5-sulfonyl compound, or a mixture thereof, with 2,3,4,3',4',5 -hexahydroxybenzxophenone, and (B) an alkali-soluble novolak resin, wherein components (A) and (B) are dissolved in solution with ethyl lactate or methyl lactate, wherein component (A) is present in an amount of 5 to 100 parts by weight per 100 parts by weight of component (B).
Claim 2
Dependent Claim
73 words
A positive-working photoresist composition comprising: (A) a light-sensitive amount of an ester obtained by reaction of a 1,2-naphthoquinonediazide-4-sulfonyl compound, a 1,2-naphthoquinonediazide-5-sulfonyl compound, or a mixture thereof, with 2,3,4,3',4',5 -hexahydroxybenzxophenone, and (B) an alkali-soluble novolak resin, wherein components (A) and (B) are dissolved in solution with ethyl lactate or methyl lactate, wherein component (A) is present in an amount of 5 to 100 parts by weight per 100 parts by weight of component (B).
Claim 3
Dependent Claim
39 words
The positive-working photoresist composition of claim 1, wherein component (A) is represented by the formula (A): ##STR3## wherein the R's may be the same or different and each represents a hydrogen atom, a 1,2-naphthoquinonediazide-4-sulfonyl group or a 1,2-naphthoquinonediazide-5-sulfonyl group.
Claim 4
Dependent Claim
19 words
The positive-working photoresist composition of claim 1, wherein component (A) has an esterification ratio of not less than 40%.
Claim 5
Dependent Claim
20 words
The positive-working photoresist composition of claim 1, wherein the alkali-soluble novolak resin has a molecular weight of 1,000 to 50,000.
Claim 6
Dependent Claim
35 words
The positive-working photoresist composition of claim 1, wherein the alkali-soluble novolak resin is the acid catalyzed addition condensation product of a phenol with 0.6 to 1.0 mol of an aldehyde per mol of the phenol.
Claim 7
Dependent Claim
30 words
The positive-working photoresist composition of claim 1, wherein component (A) is present in an amount of 10 to 50 parts by weight per 100 parts by weight of component (B).
Claim 8
Dependent Claim
31 words
The positive-working photoresist composition of claim 1, wherein the solid content of the composition is from about 10 to about 50% by weight based on the total weight of the composition.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-09-04 | 1993-03-06 | 1993-09-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-09-04 | 1997-03-06 | 1997-09-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-09-04 | 2001-03-06 | 2001-09-05 | $7700.00 | Window Closed / Lapsed |