← Back to Patent Explorer
US5225311A Expired / Lapsed US ⏱️ 0.0 years remaining

Positive photoresist composition

Assignee: Mitsubishi Chemical Corp
•
Filing: 1991-04-05
•
Granted: 1993-07-06
•
Expires: 2011-04-05
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A positive photoresist composition is disclosed, comprising (a) from 50 to 99 parts by weight of a polyhydric phenol compound which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound. The composition is excellent in sensitivity, resolving power, heat resistance, and resistance to dry etching.

Inventors

  • 👤 Toshitomo Nakano
  • 👤 Masumi Kada

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:44
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 63 words
A positive photoresist composition comprising (a) from 50 to 99 parts by weight of a polyhydric phenol resin which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound.
Claim 2
Dependent Claim 63 words
A positive photoresist composition comprising (a) from 50 to 99 parts by weight of a polyhydric phenol resin which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound.
Claim 3
Dependent Claim 22 words
A positive photoresist composition as claimed in claim 1, wherein said polyhydric phenol compound has a number average molecular weight exceeding 1,500.
Claim 4
Dependent Claim 14 words
A positive photoresist composition as claimed in claim 1, wherein said aldehyde is formaldehyde.
Claim 5
Dependent Claim 14 words
A positive photoresist composition as claimed in claim 2, wherein said aldehyde is formaldehyde.
Claim 6
Dependent Claim 17 words
A positive photoresist composition as claimed in claim 1, wherein said aldehyde is a hydroxy aromatic aldehyde.
Claim 7
Dependent Claim 17 words
A positive photoresist composition as claimed in claim 2, wherein said aldehyde is a hydroxy aromatic aldehyde.
Claim 8
Dependent Claim 25 words
A positive photoresist composition as claimed in claim 1, wherein the polyhydric phenol resin and the quinone diazide compound are chemically bonded to each other.
Claim 9
Dependent Claim 23 words
The photoresist composition of claim 1, wherein the mixed phenol consists essentially of o-cresol and at least one of 2,5- dimethylphenol and 3,5-dimethylphenol.
Claim 10
Dependent Claim 25 words
The photoresist composition of claim 8, wherein the molar ratio of o-cresol to at least one of 2,5- dimethylphenol and 3,5-dimethylphenol is 90/10 to 10/90.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-07-05 1997-01-04 1997-07-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-07-05 2001-01-04 2001-07-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-07-05 2005-01-04 2005-07-06 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag