Patent JPH0348927A successfully refreshed from Google Patents.
Patent US5212043A successfully refreshed from Google Patents.
US5212043A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent
Assignee: Happinet Corp
•
Filing: 1989-02-17
•
Granted: 1993-05-18
•
Expires: 2009-02-17
Abstract
Abstract PCT No. PCT/JP89/00159 Sec. 371 Date Oct. 17, 1989 Sec. 102(e) Date Oct. 17, 1989 PCT Filed Feb. 17, 1989.A photoresist composition comprising: a resin soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; and a photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.
Inventors
- 👤 Takashi Yamamoto
- 👤 Masaaki Todoko
- 👤 Toru Seita
- 👤 Kyoko Nagaoka
- 👤 Kosaburo Matsumura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:46
CPC Classifications
G; G03; G03C; G03C7/00; G03C7/04; G03C7/06; G03C7/10; G03C7/12; G03F; G03F7/00; G03F7/004; G03F7/008; G03F7/012; G03F7/0125; G03F7/022; G03F7/023; G03F7/0233; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/108; Y10S430/111
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
136 words
A photoresist composition for far ultraviolet or excimer laser lithography, which comprises in admixture: a non-aromatic resin having no aromatic structure, soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; and a photosensitive agent selected from the group consisting of a naphthoquinone diazide type positive photosensitive agent, a bis-azide type negative photosensitive agent and a diazo type positive photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.
Claim 2
Dependent Claim
136 words
A photoresist composition for far ultraviolet or excimer laser lithography, which comprises in admixture: a non-aromatic resin having no aromatic structure, soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; and a photosensitive agent selected from the group consisting of a naphthoquinone diazide type positive photosensitive agent, a bis-azide type negative photosensitive agent and a diazo type positive photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.
Claim 3
Dependent Claim
34 words
The photoresist composition according to claim 1, wherein said resin soluble in an aqueous alkaline solution is a copolymer of an aliphatic cyclic hydrocarbon having at least one unsaturated double bond, with maleic anhydride.
Claim 4
Dependent Claim
34 words
The photoresist composition according to claim 1, wherein said resin soluble in an aqueous alkaline solution is a copolymer of an aliphatic cyclic hydrocarbon having at least one unsaturated double bond, with a maleimide.
Claim 5
Dependent Claim
47 words
The photoresist composition according to claim 1, wherein said resin soluble in an aqueous alkaline solution is a resin obtained by hydrolyzing acid anhydride rings in maleic anhydride units of a copolymer of an aliphatic cyclic hydrocarbon having ar least one unsaturated double bond, with maleic anhydride.
Claim 6
Dependent Claim
54 words
The photoresist composition according to claim 1, wherein said resin soluble in an aqueous alkaline solution is a resin obtained by ring-opening acid anhydride rings in maleic anhydride units of a copolymer of an aliphatic cyclic hydrocarbon having at least one unsaturated double bond, with maleic anhydride, by a compound having a hydroxyl group.
Claim 7
Dependent Claim
55 words
The photoresist composition according to claim 1, wherein said resin soluble in an aqueous alkaline solution is a resin obtained by ring-opening an acid anhydride rings in maleic anhydride units of a copolymer of an aliphatic cyclic hydrocarbon having at least one unsaturated double bond, with maleic anhydride, by a compound having an amino group.
Claim 8
Dependent Claim
74 words
The photoresist composition according to claim 1, wherein said resin soluble in an aqueous alkaline solution is a resin obtained by ring-opening acid anhydride rings in maleic anhydride units of a copolymer of an aliphatic cyclic hydrocarbon having at least one unsaturated double bond, with maleic anhydride, by a compound having an amino group, followed by imido-ring closure of a part or whole of maleic acid units formed by the ring-opening in the copolymer.
Claim 9
Dependent Claim
55 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (1): ##STR26## wherein each of R 1 to R 4 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 10
Dependent Claim
55 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocanbon is a compound of the formula (2): ##STR27## wherein each of R 5 to R 10 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 11
Dependent Claim
55 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (3): ##STR28## wherein each of R 11 to R 17 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 12
Dependent Claim
55 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (4): ##STR29## wherein each of R 18 to R 21 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 13
Dependent Claim
48 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (5): ##STR30## wherein each of R 22 to R 25 is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 14
Dependent Claim
100 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (6): ##STR31## wherein each of R 26 to R 37 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms, provided that R 34 or R 35 may, together with R 36 or R 37 , form a ring, n is an integer of 0 or at least 1, and when R 30 to R 33 are repeated, they may be the same or different.
Claim 15
Dependent Claim
55 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (7): ##STR32## wherein each of R 38 to R 44 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 16
Dependent Claim
55 words
The photoresist composition according to any one of claims 2 to 7, wherein said aliphatic cyclic hydrocarbon is a compound of the formula (8): ##STR33## wherein each of R 45 to R 52 which may be the same or different, is a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms.
Claim 17
Dependent Claim
93 words
The photoresist composition according to claim 5, wherein said compound having a hydroxyl group is a compound of the formula (9): HO--R.sup.53 ( 9) wherein R 53 is an alkyl group, a cycloalkyl group or a group of the formula (10), (11) or (12): ##STR34## wherein each of R 54 and R 55 is an alkylene group, R 56 is a hydrogen atom, an alkyl group or a cycloalkyl group, and R 57 is a hydrogen atom, an alkyl group, a carboxyl group, an alkoxy group, a nitro group or an amino group.
Claim 18
Dependent Claim
95 words
The photoresist composition according to claim 6 or 7, wherein said compound having an amino group is a compound of the formula (13): H.sub.2 N--R.sup.58 ( 13) wherein R 58 is an alkyl group, a cycloalkyl group or a group of the formula (14), (15) or (16): ##STR35## each of R 59 and R 60 is an alkylene group, R 61 is a hydrogen atom, an alkyl group or a cycloalkyl group, and R 62 is a hydrogen atom, an alkyl group, a carboxyl group, an alkoxy group, a nitro group or an amino group.
Claim 19
Dependent Claim
42 words
The photoresist composition according to any one of claims 1 to 7, wherein said photoresistive agent is in an amount of from 1 to 100 parts by weight per 100 parts by weight of said resin soluble in an aqueous alkaline solution.
Claim 20
Dependent Claim
30 words
The photoresist composition according to any one of claims 1 to 7, wherein said resin soluble in an aqueous alkaline solution has a molecular weight of from 1,000 to 20,000.
References Cited (Backward Citations)
US3188303A
Cited
GB1243963A
Cited
US3984381A
Cited
US4217407A
Cited
US4106943A
Cited
US4126738A
Cited
US4309519A
Cited
FR2477294A1
Cited
US4407926A
Cited
US4454521A
Cited
EP0099949A1
Cited
US4525523A
Cited
JPS59170836A
Cited
EP0140319A2
Cited
US5059513A
Cited
US4643963A
Cited
US4880873A
Cited
US4663268A
Cited
US4980264A
Cited
US4720445A
Cited
US4935330A
Cited
US5081000A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-05-17 | 1996-11-16 | 1997-05-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-05-17 | 2000-11-16 | 2001-05-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-05-17 | 2004-11-16 | 2005-05-18 | $7700.00 | Window Closed / Lapsed |