Abstract Actinic (deep ultraviolet, ultraviolet and visible) light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of CO--NH--CO groups, such as maleimide and especially maleimide--substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or α-methylstyrene in a 1:1 molar ratio. The preferred methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-B in Table I. The present invention also comtemplates photosensitive elements and thermally stable phtochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photo-chemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230° C. and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.
A method of preparing a photochemical image which comprises (a) depositing on the face of a substrate a solution of a positive photoresist composition comprising a mixture of about 65-99 weight percent of a copolymer prepared from ##STR46## wherein the maleimide moiety is present in an amount of at least 10 mol percent based on the mol amount of co-monomers in the copolymer so as to render the copolymer soluble in an aqueous alkaline developer solution wherein R 1 to R 4 are independently H or (C 1 -C 5 ) alkyl, and about 1-35 weight percent of a photoactive compound, which, upon exposure to actinic radiation, is transformed into compounds containing acidic groups that are more soluble in aqueous alkaline developers than the photoactive compound before exposure, and an organic solvent in an amount sufficient to produce a uniform deposit having a thickness on the order of about 0.1 micron to about 20 microns of the composition on a face of the substrate; (b) treating said deposit under conditions of temperature and pressure sufficient to remove substantially all the organic solvent and thereby forming a film on the substrate; (c) image wise exposing through a mask said film to actinic radiation in the range of about 200-700 nm for a time sufficient to render the exposed areas of the film soluble in alkaline solution; and (d) contacting the exposed film with a developer solution comprising an alkaline material having a pH greater than about 10 for a time sufficient to remove the exposed areas of the film.
Claim 2
Independent Claim
258 words
A method of preparing a photochemical image which comprises (a) depositing on the face of a substrate a solution of a positive photoresist composition comprising a mixture of about 65-99 weight percent of a copolymer prepared from ##STR46## wherein the maleimide moiety is present in an amount of at least 10 mol percent based on the mol amount of co-monomers in the copolymer so as to render the copolymer soluble in an aqueous alkaline developer solution wherein R 1 to R 4 are independently H or (C 1 -C 5 ) alkyl, and about 1-35 weight percent of a photoactive compound, which, upon exposure to actinic radiation, is transformed into compounds containing acidic groups that are more soluble in aqueous alkaline developers than the photoactive compound before exposure, and an organic solvent in an amount sufficient to produce a uniform deposit having a thickness on the order of about 0.1 micron to about 20 microns of the composition on a face of the substrate; (b) treating said deposit under conditions of temperature and pressure sufficient to remove substantially all the organic solvent and thereby forming a film on the substrate; (c) image wise exposing through a mask said film to actinic radiation in the range of about 200-700 nm for a time sufficient to render the exposed areas of the film soluble in alkaline solution; and (d) contacting the exposed film with a developer solution comprising an alkaline material having a pH greater than about 10 for a time sufficient to remove the exposed areas of the film.
Claim 3
Dependent Claim
16 words
The method of claim 1 wherein the photoactive compound is a naphthoquinone diazide sulfonic acid ester.
Claim 4
Dependent Claim
20 words
The method of claim 1 which further comprises heating said developed film at a temperature of at about 250° C.
Claim 5
Dependent Claim
23 words
The method of claim 1 wherein in step (c) the wavelength of the actinic radiation is in the range of about 250-300 nm.
Claim 6
Dependent Claim
44 words
The method of claim 1 in which the copolymer is a terpolymer that includes from about 10 to about 50 mol percent based on the mol amount of co-monomers in the copolymer of ##STR47## wherein R 5 is (C 1 -C 5 ) alkyl.