US3964908A
Expired / Lapsed
US
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Positive resists containing dimethylglutarimide units
Assignee: International Business Machines Corp
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Filing: 1975-09-22
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Granted: 1976-06-22
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Expires: 1995-09-22
Abstract
Abstract A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.
Inventors
- 👤 Joachim Bargon
- 👤 Edward Gipstein
- 👤 Hiroyuki Hiraoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 14:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; C; C08; C08F; C08F8/00; C08F8/30; C08F8/32; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
46 words
A process for forming an image with a positive resist, said process comprising the steps of: 1. forming on a substrate a film of a composition comprising a polymer containing the structural unit ##EQU3## wherein R is H, CH 3 or C 2 H 5 ,
Claim 2
Dependent Claim
46 words
A process for forming an image with a positive resist, said process comprising the steps of: 1. forming on a substrate a film of a composition comprising a polymer containing the structural unit ##EQU3## wherein R is H, CH 3 or C 2 H 5 ,
Claim 3
Dependent Claim
9 words
exposing said film in a predetermined pattern to radiation,
Claim 4
Dependent Claim
9 words
exposing said film in a predetermined pattern to radiation,
Claim 5
Dependent Claim
29 words
removing the radiation exposed portion of said film with a solvent. 2. A process as claimed in claim 1 wherein the radiation is by means of an electron beam.
Claim 6
Dependent Claim
15 words
A process as claimed in claim 1 wherein the radiation is by means of light.
Claim 7
Dependent Claim
11 words
A process as claimed in claim 1 wherein R is hydrogen.
Claim 8
Dependent Claim
13 words
A process as claimed in claim 1 wherein R is CH 3 .
Claim 9
Dependent Claim
15 words
A process as claimed in claim 1 wherein R is C 2 H 5 .
Claim 10
Dependent Claim
12 words
A process as claimed in claim 1 wherein the polymer is poly(dimethacrylimide).
Claim 11
Dependent Claim
20 words
A process as claimed in claim 1 wherein the polymer is a copolymer of dimethacrylimide and another vinyl type monomer.
Claim 12
Dependent Claim
18 words
A process as claimed in claim 1 wherein the polymer is a copolymer of dimethacrylimide and methyl methacrylate.
Claim 13
Dependent Claim
28 words
A process for the in situ preparation of a resist film, said process comprising heating a resist film containing dimethacrylic structures with ammonia, methyl amine or ethyl amine.
Claim 14
Dependent Claim
28 words
A process for the in situ preparation of a resist film, said process comprising heating a resist film containing dimethacrylic structures with ammonia, methyl amine or ethyl amine.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-06-22 | 1979-12-22 | 1980-06-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-06-22 | 1983-12-22 | 1984-06-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-06-22 | 1987-12-22 | 1988-06-22 | $7700.00 | Window Closed / Lapsed |