Process and device for the deposition of thin layers and product made thereby

Claim 1

A process for the deposition of a protective layer comprising the steps of: providing an electrically grounded vacuum chamber; providing a substrate comprising an electrically conductive surface acting as an electrode, said substrate being fixed in position relative to said vacuum chamber; and depositing a material on said substrate by performing plasma chemical vapor deposition by applying an alternating current between said conductive surface of said substrate and said vacuum chamber wherein said alternating current is applied to said conductive surface of said substrate by at least one power lead-in, said power lead-in comprising a conductive element contacting said substrate along an entire edge and an insulating element covering said conductive element except where said conductive element contacts said substrate and except where a conductor for supplying said alternating current makes contact with the conductive element.