US5169741A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent
Assignee: Panasonic Holdings Corp
•
Filing: 1991-05-03
•
Granted: 1992-12-08
•
Expires: 2011-05-03
Abstract
Abstract The present invention provides a method for forming resist patterns for exposure to a KrF excimer laser of 248.4 nm. The method includes supplying a pattern-forming material containing a photosensitive compound having a diazo group as a photosensitive group, an alkaline soluble polymer, and a solvent capable of solving the photosensitive compound and the polymer, with the pattern-forming material being adapted to a pH of 4 or less, onto a substrate to form a film. The pattern-forming material applied on the substrate is exposed to a light of about 248.4 nm. The exposed pattern-forming material is developed with an alkaline developing solution. The pattern-forming material contains a compound capable of releasing an acid when exposed to light of about 248.4 nm. The substrate is baked between the exposure and developing steps. The compound capable of releasing the acid is selected from an onium salt and a nitrobenzyl tosylate compound.
Inventors
- 👤 Yoshiyuki Tani
- 👤 Masayuki Endo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 05:36
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/0163; G03F7/022; G03F7/0226; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
136 words
A method for forming high sensitivity positive patterns, which comprises: forming on a substrate a film of a pattern-forming material, said pattern-forming material consisting of, in admixture, a photosensitively reactively effective amount of a photosensitive compound containing the following ##STR14## as a photosensitive group, a reactively effective amount of an alkaline-soluble polymer, a pH adjustingly effective amount of a compound capable of adjusting the pH of said pattern-forming material to 4 or less with or without exposure to light and a solvent capable of dissolving said photosensitive compound, said alkaline-soluble polymer and said compound capable of adjusting the pH of said pattern-forming material; exposing the pattern-forming material applied on said substrate to light of about 248.4 nm of accelerate the reactivity of a photosensitive compound; and developing the exposed pattern-forming material with an alkaline developing solution.
Claim 2
Independent Claim
136 words
A method for forming high sensitivity positive patterns, which comprises: forming on a substrate a film of a pattern-forming material, said pattern-forming material consisting of, in admixture, a photosensitively reactively effective amount of a photosensitive compound containing the following ##STR14## as a photosensitive group, a reactively effective amount of an alkaline-soluble polymer, a pH adjustingly effective amount of a compound capable of adjusting the pH of said pattern-forming material to 4 or less with or without exposure to light and a solvent capable of dissolving said photosensitive compound, said alkaline-soluble polymer and said compound capable of adjusting the pH of said pattern-forming material; exposing the pattern-forming material applied on said substrate to light of about 248.4 nm of accelerate the reactivity of a photosensitive compound; and developing the exposed pattern-forming material with an alkaline developing solution.
Claim 3
Dependent Claim
17 words
The method according to claim 1, wherein said light of about 248.4 nm is a KrF excimer.
Claim 4
Dependent Claim
31 words
The method according to claim 1, wherein said alkaline-soluble polymer is selected from the group consisting of a novolak resin, poly-p-vinylphenol and a half ester resin of styrene and maleic acid.
Claim 5
Dependent Claim
41 words
The method according to claim 1, wherein said compound capable of adjusting the pH of said pattern-forming material to 4 or less with or without exposure to light is selected from the group consisting of an onium salt and nitrobenzyl tosylate.
Claim 6
Dependent Claim
25 words
The method according to claim 1, wherein said solvent is selected from the group consisting of diethyleneglycol dimethyl ether, ethyl cellosolve acetate and ethyl acetate.
References Cited (Backward Citations)
US4036644A
Cited
US4284706A
Cited
US4499171A
Cited
US4624908A
Cited
US4837124A
Cited
US4912018A
Cited
US4873169A
Cited
US4808512A
Cited
US4910123A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-12-08 | 1996-06-08 | 1996-12-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-12-08 | 2000-06-08 | 2000-12-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-12-08 | 2004-06-08 | 2004-12-08 | $7700.00 | Window Closed / Lapsed |