Fabrication of metal pillars in an electronic component using polishing

Claim 1

A method for fabricating metal pillars in an electronic component, comprising the following steps in the sequence set forth: providing a base with spaced vias in the top surface of the base; depositing an electrically conductive metal into the vias and over the top surface of the base so that a layer of the metal with an uneven top surface is formed over the top surface of the base; planarizing the top surface of the metal by polishing without removing all the metal over the top surface of the base; and removing metal above the top surface of the base between the vias, thereby forming separate metal pillars in the base which extend above the top surface of the base.

Claim 2

A method for fabricating metal pillars in an electronic component, comprising the following steps in the sequence set forth: providing a base with spaced vias in the top surface of the base; depositing an electrically conductive metal into the vias and over the top surface of the base so that a layer of the metal with an uneven top surface is formed over the top surface of the base; planarizing the top surface of the metal by polishing without removing all the metal over the top surface of the base; and removing metal above the top surface of the base between the vias, thereby forming separate metal pillars in the base which extend above the top surface of the base.

Claim 11

A method for fabricating metal pillars in a dielectric, comprising the following steps in the sequence set forth: providing a dielectric with spaced vias in a planar top surface; depositing an electrically conductive metal into the vias and over the top surface of the dielectric so that the deposited metal fills the vias and forms a layer with an uneven top surface over the dielectric; polishing the metal to planarize the top surface of the metal while leaving the metal over the top surface of the dielectric; and etching the metal to remove metal from the top surface of the dielectric between the vias, thereby forming separate metal pillars in the dielectric which extend above the top surface of the dielectric and have uniform heights.

Claim 12

A method for fabricating metal pillars in a dielectric, comprising the following steps in the sequence set forth: providing a dielectric with spaced vias in a planar top surface; depositing an electrically conductive metal into the vias and over the top surface of the dielectric so that the deposited metal fills the vias and forms a layer with an uneven top surface over the dielectric; polishing the metal to planarize the top surface of the metal while leaving the metal over the top surface of the dielectric; and etching the metal to remove metal from the top surface of the dielectric between the vias, thereby forming separate metal pillars in the dielectric which extend above the top surface of the dielectric and have uniform heights.

Claim 17

A method for fabricating metal pillars in an electrical interconnect, comprising the following steps in the sequence set forth: providing a planar radiation curable dielectric on a base; forming a plurality of vertical vias spaced from one another in the top of the dielectric; depositing an electrically conductive metal into the vias and on top of the dielectric so that the metal fills the vias and forms a metal layer with an uneven top over the top of the dielectric; applying a rotating pad and a slurry to the top of the metal to planarize the top of the metal without contacting the pad to the top of the dielectric; removing the pad and the slurry from the metal; applying a photoresist mask over the top of the metal; forming openings in the mask to expose portions of the metal between the vias; etching the exposed metal above the dielectric between the vias through the mask openings with a wet chemical etchant so that the unetched metal forms spaced metal pillars in the dielectric which extend above the top of the dielectric and have uniform heights; and stripping the mask.

Claim 18

A method for fabricating metal pillars in an electrical interconnect, comprising the following steps in the sequence set forth: providing a planar radiation curable dielectric on a base; forming a plurality of vertical vias spaced from one another in the top of the dielectric; depositing an electrically conductive metal into the vias and on top of the dielectric so that the metal fills the vias and forms a metal layer with an uneven top over the top of the dielectric; applying a rotating pad and a slurry to the top of the metal to planarize the top of the metal without contacting the pad to the top of the dielectric; removing the pad and the slurry from the metal; applying a photoresist mask over the top of the metal; forming openings in the mask to expose portions of the metal between the vias; etching the exposed metal above the dielectric between the vias through the mask openings with a wet chemical etchant so that the unetched metal forms spaced metal pillars in the dielectric which extend above the top of the dielectric and have uniform heights; and stripping the mask.

Claim 23

A method for fabricating metal pillars in a multilayer electrical interconnect, comprising the following steps in the sequence set forth: providing a planar layer of a first radiation curable dielectric on a base; forming a plurality of first vertical vias spaced from one another in the top of the first dielectric; depositing a first electrically conductive metal into the first vias; applying a first rotating pad and a first slurry to the top of the electrical interconnect until the top of the interconnect is planarized and the first metal completely fills the first vias; removing the first pad and the first slurry from the electrical interconnect; providing a planar layer of a second radiation curable dielectric on top of the electrical interconnect; forming a plurality of second vertical vias spaced from one another in the top of the second dielectric, wherein each second vertical via exposes at least a portion of the first metal in a single underlaying first vertical via; depositing a second electrically conductive metal into the second vias and on top of the second dielectric so that the second metal contacts the exposed first metal, fills the second vias and forms a second metal layer with an uneven top over the top of the second dielectric; applying a second rotating pad and a second slurry to the top of the second metal to planarize the top of the second metal without contacting the pad to the top of the second dielectric; removing the second pad and the second slurry from the second metal; applying a photoresist mask over the top of the second metal; forming openings in the mask to expose portions of the second metal between the second vias; etching the exposed second metal above the second dielectric between the second vias through the mask openings with a wet chemical etchant; and stripping the mask, wherein the first and unetched second metals form spaced vertical metal pillars in the first and second dielectrics which extend above the top of the second dielectric.

Claim 24

A method for fabricating metal pillars in a multilayer electrical interconnect, comprising the following steps in the sequence set forth: providing a planar layer of a first radiation curable dielectric on a base; forming a plurality of first vertical vias spaced from one another in the top of the first dielectric; depositing a first electrically conductive metal into the first vias; applying a first rotating pad and a first slurry to the top of the electrical interconnect until the top of the interconnect is planarized and the first metal completely fills the first vias; removing the first pad and the first slurry from the electrical interconnect; providing a planar layer of a second radiation curable dielectric on top of the electrical interconnect; forming a plurality of second vertical vias spaced from one another in the top of the second dielectric, wherein each second vertical via exposes at least a portion of the first metal in a single underlaying first vertical via; depositing a second electrically conductive metal into the second vias and on top of the second dielectric so that the second metal contacts the exposed first metal, fills the second vias and forms a second metal layer with an uneven top over the top of the second dielectric; applying a second rotating pad and a second slurry to the top of the second metal to planarize the top of the second metal without contacting the pad to the top of the second dielectric; removing the second pad and the second slurry from the second metal; applying a photoresist mask over the top of the second metal; forming openings in the mask to expose portions of the second metal between the second vias; etching the exposed second metal above the second dielectric between the second vias through the mask openings with a wet chemical etchant; and stripping the mask, wherein the first and unetched second metals form spaced vertical metal pillars in the first and second dielectrics which extend above the top of the second dielectric.

Claim 25

A method for fabricating metal pillars in a multilayer electrical interconnect, comprising the following steps in the sequence set forth: providing a planar layer of a first radiation curable dielectric on a base; forming a plurality of first vertical vias spaced from one another in the top of the first dielectric; depositing a first electrically conductive metal into the first vias and on top of the first dielectric so that the first metal fills the first vias and forms a first metal layer with an uneven top over the top of the first dielectric; applying a first rotating pad and a first slurry to the top of the first metal to remove all the first metal above the top of the first dielectric and to planarize the top of the electrical interconnect; removing the first pad and the first slurry from the electrical interconnect; providing a planar layer of a second radiation curable dielectric on top of the electrical interconnect; forming a plurality of second vertical vias spaced from one another in the top of the second dielectric, wherein each second vertical via exposes at least a portion of the first metal in a single underlaying first vertical via; depositing a second electrically conductive metal into the second vias and on top of the second dielectric so that the second metal contacts the exposed first metal, fills the second vias and forms a second metal layer with an uneven top over the top of the second dielectric; applying a second rotating pad and a second slurry to the top of the second metal to planarize the top of the second metal without contacting the pad to the top of the second dielectric; removing the second pad and the second slurry from the second metal; applying a photoresist mask over the top of the second metal; forming openings in the mask to expose portions of the second metal between the second vias; etching the exposed second metal above the second dielectric between the second vias through the mask openings with a wet chemical etchant; and stripping the mask, wherein the first and unetched second metals form spaced vertical metal pillars in the first and second dielectrics which extend above the top of the second dielectric and have uniform heights.

Claim 26

A method for fabricating metal pillars in a multilayer electrical interconnect, comprising the following steps in the sequence set forth: providing a planar layer of a first radiation curable dielectric on a base; forming a plurality of first vertical vias spaced from one another in the top of the first dielectric; depositing a first electrically conductive metal into the first vias and on top of the first dielectric so that the first metal fills the first vias and forms a first metal layer with an uneven top over the top of the first dielectric; applying a first rotating pad and a first slurry to the top of the first metal to remove all the first metal above the top of the first dielectric and to planarize the top of the electrical interconnect; removing the first pad and the first slurry from the electrical interconnect; providing a planar layer of a second radiation curable dielectric on top of the electrical interconnect; forming a plurality of second vertical vias spaced from one another in the top of the second dielectric, wherein each second vertical via exposes at least a portion of the first metal in a single underlaying first vertical via; depositing a second electrically conductive metal into the second vias and on top of the second dielectric so that the second metal contacts the exposed first metal, fills the second vias and forms a second metal layer with an uneven top over the top of the second dielectric; applying a second rotating pad and a second slurry to the top of the second metal to planarize the top of the second metal without contacting the pad to the top of the second dielectric; removing the second pad and the second slurry from the second metal; applying a photoresist mask over the top of the second metal; forming openings in the mask to expose portions of the second metal between the second vias; etching the exposed second metal above the second dielectric between the second vias through the mask openings with a wet chemical etchant; and stripping the mask, wherein the first and unetched second metals form spaced vertical metal pillars in the first and second dielectrics which extend above the top of the second dielectric and have uniform heights.

Claim 27

A method for fabricating metal pillars in an electronic component, comprising the following steps in the sequence set forth: providing a dielectric with spaced vias in a top surface; depositing an electrically conductive metal into the vias and over the top surface of the dielectric so that metal pillars form in the vias and a metal layer forms over the top surface of the dielectric; planarizing the metal by polishing so that the metal layer is removed and the planar tops of the metal pillars are in and aligned with the top surface of the dielectric; depositing a second dielectric on the metal pillars and the top surface of the dielectric; forming spaced second vias in the top surface of the second dielectric, wherein each second via exposes the top of a metal pillar and is wider than the exposed metal pillar; depositing a second electrically conductive metal in the second vias and over the top surface of the second dielectric so that second metal pillars form in the second vias and a second metal layer forms over the top surface of the second dielectric; and planarizing the second metal by polishing so that the second metal layer is removed, the planar tops of the second metal pillars are in and aligned with the top surface of the second dielectric, and each second metal pillar is electrically connected to an underlying first metal pillar.

Claim 28

A method for fabricating metal pillars in an electronic component, comprising the following steps in the sequence set forth: providing a dielectric with spaced vias in a top surface; depositing an electrically conductive metal into the vias and over the top surface of the dielectric so that metal pillars form in the vias and a metal layer forms over the top surface of the dielectric; planarizing the metal by polishing so that the metal layer is removed and the planar tops of the metal pillars are in and aligned with the top surface of the dielectric; depositing a second dielectric on the metal pillars and the top surface of the dielectric; forming spaced second vias in the top surface of the second dielectric, wherein each second via exposes the top of a metal pillar and is wider than the exposed metal pillar; depositing a second electrically conductive metal in the second vias and over the top surface of the second dielectric so that second metal pillars form in the second vias and a second metal layer forms over the top surface of the second dielectric; and planarizing the second metal by polishing so that the second metal layer is removed, the planar tops of the second metal pillars are in and aligned with the top surface of the second dielectric, and each second metal pillar is electrically connected to an underlying first metal pillar.