US5114834A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist removal
Assignee: Oramir Semiconductor Equipment Ltd
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Filing: 1989-09-14
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Granted: 1992-05-19
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Expires: 2009-09-14
Abstract
Abstract A process and a system for the complete stripping of the photoresist layer from semiconductor wafers after each processing step (lithography step) in a multi-step production process. At the end of each such step the photoresist must be removed, preparing the wafer for the next step, and such removal is also required after the final processing step. Up to 15 or more steps are needed in such wafer production process. According to the invention a high intensity pulsed laser beam sweeps the wafer surface as a narrow, preferably rectangular and strip the photoresist by sweeping the entire surface of the wafer. Pulse duration is generally shorter than 500 nano-sec (nsec) and preferably about 10 to 100 nsec, with much larger time intervals between pulses. The interaction of the beam with the photoresist ablates the photoresist. The ablation proceeds stepwise, each pulse ablating a certain area of the photoresist to a certian depth, and this without any damage to the processed wafer. The sweep suffices to completely remove the photoresist, reading the wafer for the next process step; the overall duration of the removal being short.
Inventors
- 👤 Yehuda Nachshon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:57
CPC Classifications
B; B23; B23Q; B23Q7/00; B23Q7/003; B23Q7/04; B23Q7/041; B23Q7/042; B24; B24B; B24B41/00; B24B41/005; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
121 words
A process for removal of a patterned, post-baked photoresist layer from a semiconductor wafer performed in a dry atmosphere, comprising the steps of scanning a surface of the wafer by means of a narrow rectangular pulsed high energy beam so that each point of the wafer surface is exposed to a train of pulses, wherein each pulse has a duration of less that 100 nsec (nanoseconds), an energy from 50 mJ/cm 2 to 300 mJ/cm 2 and a wavelength between 150 nm and 400 nm, and wherein further each pulse of the beam ablates the post-baked photoresist layer to a certain depth, so that the train of pulses completely removes by ablation the entire post-bake photoresist layer without damaging the wafer.
Claim 2
Dependent Claim
121 words
A process for removal of a patterned, post-baked photoresist layer from a semiconductor wafer performed in a dry atmosphere, comprising the steps of scanning a surface of the wafer by means of a narrow rectangular pulsed high energy beam so that each point of the wafer surface is exposed to a train of pulses, wherein each pulse has a duration of less that 100 nsec (nanoseconds), an energy from 50 mJ/cm 2 to 300 mJ/cm 2 and a wavelength between 150 nm and 400 nm, and wherein further each pulse of the beam ablates the post-baked photoresist layer to a certain depth, so that the train of pulses completely removes by ablation the entire post-bake photoresist layer without damaging the wafer.
Claim 3
Dependent Claim
28 words
A process according to claim 1, where the source of the beam is an Excimer laser and the wavelength is in the 193 nm and 351 nm range.
Claim 4
Dependent Claim
24 words
The process of claim 1, wherein each area of the photoresist is scanned a number of times until the entire photoresist layer is ablated.
Claim 5
Dependent Claim
37 words
The process of claim 1, wherein the laser is an Excimer laser having a wavelength of 193 nm, 248 nm, 308 nm or 351 nm, the duration of each pulse being between 10 nsec and 50 nsec.
Claim 6
Dependent Claim
18 words
The process of claim 4, wherein the frequency of the pulses is from 10 Hz to 1,000 Hz.
Claim 7
Dependent Claim
18 words
The process of claim 1, wherein the ablation is effected while the wafer is in an reactive atmosphere.
Claim 8
Dependent Claim
119 words
A process for the complete stripping of a patterned, post-baked photoresist layer from a semiconductor wafer in a dry atmosphere, comprising the steps of sweeping an area of the wafer by means of an elongated narrow beam at its intersection with the wafer, wherein the beam is a high intensity beam of a laser, and wherein further the beam is pulsed at pulses of about less that 200 nsec duration, at a wavelength of from about 150 nm to about 400 nm, and applies per cm 2 of the wafer an energy of from about 50 mJ to about 300 mJ, so that the pulsed beam completely strips by ablation the entire post-baked photoresist layer without damaging the wafer.
Claim 9
Dependent Claim
119 words
A process for the complete stripping of a patterned, post-baked photoresist layer from a semiconductor wafer in a dry atmosphere, comprising the steps of sweeping an area of the wafer by means of an elongated narrow beam at its intersection with the wafer, wherein the beam is a high intensity beam of a laser, and wherein further the beam is pulsed at pulses of about less that 200 nsec duration, at a wavelength of from about 150 nm to about 400 nm, and applies per cm 2 of the wafer an energy of from about 50 mJ to about 300 mJ, so that the pulsed beam completely strips by ablation the entire post-baked photoresist layer without damaging the wafer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-05-19 | 1995-11-18 | 1996-05-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-05-19 | 1999-11-18 | 2000-05-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-05-19 | 2003-11-18 | 2004-05-19 | $7700.00 | Window Closed / Lapsed |