Device having superlattice structure, and method of and apparatus for manufacturing the same

Claim 1

An apparatus for manufacturing a fine structure device, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; a high intensity ion source; ion beam extraction electrodes for extracting a high intensity ion beam out of said high intensity ion source; a charged particle optical system for focusing said high intensity ion beam onto the specimen; a beam blanking means for serving to turn ON/OFF radiation of said high intensity ion beam on the specimen; deflection electrodes for scanning the focused high intensity ion beam on the specimen by deflecting the focused high intensity ion beam; secondary charged-particle detection means for detecting secondary charged-particles generated from a surface of said specimen; display means for visually observing said specimen by displaying the secondary charged-particle image detected by said secondary charged-particle detection means; and reactive gas assist etching means for forming a groove of sharp sectional shape having no redeposition material by reactive gas-assist-ion beam etching by projecting said focused ion beam scanned by said deflection electrodes on the surface of the specimen, said reactive gas assist etching means including means for supplying reactive gas onto the surface of the specimen in accordance with said secondary charged-particle image displayed on the display means.

Claim 2

An apparatus for manufacturing a fine structure device, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; a high intensity ion source; ion beam extraction electrodes for extracting a high intensity ion beam out of said high intensity ion source; a charged particle optical system for focusing said high intensity ion beam onto the specimen; a beam blanking means for serving to turn ON/OFF radiation of said high intensity ion beam on the specimen; deflection electrodes for scanning the focused high intensity ion beam on the specimen by deflecting the focused high intensity ion beam; secondary charged-particle detection means for detecting secondary charged-particles generated from a surface of said specimen; display means for visually observing said specimen by displaying the secondary charged-particle image detected by said secondary charged-particle detection means; and reactive gas assist etching means for forming a groove of sharp sectional shape having no redeposition material by reactive gas-assist-ion beam etching by projecting said focused ion beam scanned by said deflection electrodes on the surface of the specimen, said reactive gas assist etching means including means for supplying reactive gas onto the surface of the specimen in accordance with said secondary charged-particle image displayed on the display means.

Claim 8

An apparatus for manufacturing a fine structure, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; a high intensity ion source; ion beam extraction electrode for extracting a high intensity ion beam out of said high intensity ion source; a charged particle optical system for focusing said high intensity ion beam onto the specimen; a beam blanking means for serving to turn ON/OFF radiation of said high intensity ion beam on the specimen; deflection electrodes for scanning the focused high intensity ion beam on the specimen by deflecting the focused high intensity ion beam; processing means for processing the surface of the specimen by projecting said focused ion beam through said charged particle optical system from said high intensity ion source while said deflection electrodes are operated; and annealing means for attaining desired optical and/or electrical characteristics of the device, by annealing a defect part of the specimen, said annealing means including a laser for irradiating a laser beam onto the defect part, said laser providing the laser beam irradiation substantially coaxially to the axis of the focused ion beam.

Claim 9

An apparatus for manufacturing a fine structure, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; a high intensity ion source; ion beam extraction electrode for extracting a high intensity ion beam out of said high intensity ion source; a charged particle optical system for focusing said high intensity ion beam onto the specimen; a beam blanking means for serving to turn ON/OFF radiation of said high intensity ion beam on the specimen; deflection electrodes for scanning the focused high intensity ion beam on the specimen by deflecting the focused high intensity ion beam; processing means for processing the surface of the specimen by projecting said focused ion beam through said charged particle optical system from said high intensity ion source while said deflection electrodes are operated; and annealing means for attaining desired optical and/or electrical characteristics of the device, by annealing a defect part of the specimen, said annealing means including a laser for irradiating a laser beam onto the defect part, said laser providing the laser beam irradiation substantially coaxially to the axis of the focused ion beam.

Claim 15

An apparatus for manufacturing a fine structure device, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; a high intensity ion source; ion beam extraction electrode for extracting a high intensity ion beam out of said high intensity ion source; a charged particle optical system for focusing said high intensity ion beam onto the specimen; a beam blanking means for serving to turn ON/OFF radiation of said high intensity ion beam on the specimen; deflection electrodes for scanning the focused high intensity ion beam on the specimen by deflecting the focused high intensity ion beam; secondary charged-particle detection means for detecting secondary charged-particles generated from a surface of said specimen; display means for visually observing said specimen by displaying the secondary charged-particle image detected by said secondary charged-particle detection means; ion beam current detection means for detecting a high intensity ion beam current i(t) projected onto the specimen; current amount calculating means for calculating a projected ion beam current amount by integrating said high intensity ion beam current i(t) at time t detected by said ion beam current detection means; and controlling means for stopping the projection of said focused high intensity ion beam by operating said beam blanking means, when said projected ion beam current amount calculated by said current amount calculating means become equal to a target value determined in accordance with a target volume defined by (a) a predetermined depth of a groove formed or a thickness of a film formed, and (b) a scanned area of said focused high intensity ion beam scanned by said deflection electrode, and a sputtering or depositing rate of the specimen to be processed.

Claim 16

An apparatus for manufacturing a fine structure device, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; a high intensity ion source; ion beam extraction electrode for extracting a high intensity ion beam out of said high intensity ion source; a charged particle optical system for focusing said high intensity ion beam onto the specimen; a beam blanking means for serving to turn ON/OFF radiation of said high intensity ion beam on the specimen; deflection electrodes for scanning the focused high intensity ion beam on the specimen by deflecting the focused high intensity ion beam; secondary charged-particle detection means for detecting secondary charged-particles generated from a surface of said specimen; display means for visually observing said specimen by displaying the secondary charged-particle image detected by said secondary charged-particle detection means; ion beam current detection means for detecting a high intensity ion beam current i(t) projected onto the specimen; current amount calculating means for calculating a projected ion beam current amount by integrating said high intensity ion beam current i(t) at time t detected by said ion beam current detection means; and controlling means for stopping the projection of said focused high intensity ion beam by operating said beam blanking means, when said projected ion beam current amount calculated by said current amount calculating means become equal to a target value determined in accordance with a target volume defined by (a) a predetermined depth of a groove formed or a thickness of a film formed, and (b) a scanned area of said focused high intensity ion beam scanned by said deflection electrode, and a sputtering or depositing rate of the specimen to be processed.

Claim 23

An apparatus for manufacturing a fine structure device, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; an electron-ion hybrid source for extracting one of ion beam and electron beam from an identical tip of a needle, provided from liquid metal, melted by heating means, on the needle, the electron-ion hybrid source including first power supply means for supplying one of positive high-electric potential and negative high-electric potential as an accelerating voltage through a first switching means to said needle of said electron-ion hybrid source; extracting means for extracting said one of ion beam and electron beam from said electron-ion hybrid source by supplying one of negative electric potential and positive electric potential, respectively, to said extracting means through a second switching means from a second power supply means; a charged particle optical system for focusing said one of said ion beam and said electron beam onto the specimen by supplying one of a negative electric potential and a positive electric potential to said optical system through a third switching means from third power supplying means; a beam blanking means for serving to turn ON/OFF radiation of said one of said ion beam and said electron beam on the specimen; deflection electrodes for scanning one of the focused ion beam and the focused electron beam on the specimen by deflecting one of the focused ion beam and the focused electron beam; secondary charged-particle detection means for detecting one of secondary ions and secondary electrons generated from a surface of said specimen when said one of the focused ion beam and the focused electron beam is projected through said charged particle optical system from said electron-ion hybrid source by switching said first switching means, said second switching means and said third switching means; and means for observing the surface of the specimen by a secondary electron image detected by the secondary charged-particle detection means when said focused electron beam is projected through said charged particle optical system from said electron-ion hybrid source with said deflection electrodes being operated, after the surface of the specimen has been processed by projecting the focused ion beam on the surface of the specimen when said focused ion beam is projected through said charged particle optical system from said electron-ion hybrid source with said deflection electrodes being operated.

Claim 24

An apparatus for manufacturing a fine structure device, comprising: a specimen chamber formed inside a vacuum vessel; a table for mounting a specimen thereon, disposed inside said specimen chamber; an electron-ion hybrid source for extracting one of ion beam and electron beam from an identical tip of a needle, provided from liquid metal, melted by heating means, on the needle, the electron-ion hybrid source including first power supply means for supplying one of positive high-electric potential and negative high-electric potential as an accelerating voltage through a first switching means to said needle of said electron-ion hybrid source; extracting means for extracting said one of ion beam and electron beam from said electron-ion hybrid source by supplying one of negative electric potential and positive electric potential, respectively, to said extracting means through a second switching means from a second power supply means; a charged particle optical system for focusing said one of said ion beam and said electron beam onto the specimen by supplying one of a negative electric potential and a positive electric potential to said optical system through a third switching means from third power supplying means; a beam blanking means for serving to turn ON/OFF radiation of said one of said ion beam and said electron beam on the specimen; deflection electrodes for scanning one of the focused ion beam and the focused electron beam on the specimen by deflecting one of the focused ion beam and the focused electron beam; secondary charged-particle detection means for detecting one of secondary ions and secondary electrons generated from a surface of said specimen when said one of the focused ion beam and the focused electron beam is projected through said charged particle optical system from said electron-ion hybrid source by switching said first switching means, said second switching means and said third switching means; and means for observing the surface of the specimen by a secondary electron image detected by the secondary charged-particle detection means when said focused electron beam is projected through said charged particle optical system from said electron-ion hybrid source with said deflection electrodes being operated, after the surface of the specimen has been processed by projecting the focused ion beam on the surface of the specimen when said focused ion beam is projected through said charged particle optical system from said electron-ion hybrid source with said deflection electrodes being operated.